Electroless palladium plating solution

US11946144B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11946144-B2
Application numberUS-201816753395-A
CountryUS
Kind codeB2
Filing dateOct 3, 2018
Priority dateOct 6, 2017
Publication dateApr 2, 2024
Grant dateApr 2, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An object of the present invention is to provide an electroless Pd plating solution which enables formation of a Pd plating film forming a plating film having excellent wire bondability even after a high-temperature thermal history. An electroless Pd plating solution of the present invention includes: a Palladium compound, a reducing agent, a complexing agent, and at least one selected from a group consisting of Ge and rare earth element.

First claim

Opening claim text (preview).

The invention claimed is: 1. An electroless Pd plating solution consisting of: a Palladium compound; a reducing agent; a complexing agent; a compound or metal containing at least one selected from the group consisting of Ge, Ce, Sm, and Y; water; and optionally, a sulfur-containing compound as a stabilizer, wherein a pH of the electroless Pd plating solution is from 4 to 10, and a total amount of the at least one selected from the group consisting of Ge, Ce, Sm, and Y in the electroless Pd plating solution is 1 g/L to 10 g/L. 2. The electroless Pd plating solution according to claim 1 , wherein the complexing agent is at least one selected from the group consisting of ammonia and an amine compound. 3. The electroless Pd plating solution according to claim 1 , wherein the reducing agent is at least one selected from the group consisting of formic acid, hydrazine, hypophosphorous compounds, phosphorous compounds, amine borane compounds, and hydroboron compounds. 4. The electroless Pd plating solution according to claim 1 , wherein the sulfur-containing compound is present. 5. The electroless Pd plating solution according to claim 1 , wherein the pH of the electroless Pd plating solution is from 4 to 8.

Assignees

Inventors

Classifications

  • C23C18/44Primary

    using reducing agents · CPC title

  • Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced {(electrically insulating plastics, resins or waxes H01B3/30)}; Filling pastes · CPC title

  • characterised by the additives · CPC title

  • Two or more layers only obtained by electroless plating · CPC title

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What does patent US11946144B2 cover?
An object of the present invention is to provide an electroless Pd plating solution which enables formation of a Pd plating film forming a plating film having excellent wire bondability even after a high-temperature thermal history. An electroless Pd plating solution of the present invention includes: a Palladium compound, a reducing agent, a complexing agent, and at least one selected from a g…
Who is the assignee on this patent?
Uemura Kogyo Kk
What technology area does this patent fall under?
Primary CPC classification C23C18/44. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 02 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).