Curable composition

US11945893B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11945893-B2
Application numberUS-202017038491-A
CountryUS
Kind codeB2
Filing dateSep 30, 2020
Priority dateSep 30, 2020
Publication dateApr 2, 2024
Grant dateApr 2, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A curable composition can comprise a polymerizable material including a monomer of Formula (1), with R being H or alkyl or alkylaryl, n being 1-4, m being 0-6, X1 being C1-C6 substituted or unsubstituted alkyl, X2 being CH3 or H,After forming a cured layer of the curable composition, the cured layer can have an excellent etch resistance.

First claim

Opening claim text (preview).

What is claimed is: 1. A curable composition comprising: a polymerizable material consisting essentially of a monomer of Formula (1): wherein R is H or alkyl or alkylaryl, n being 1-4, m is 0-6, X 1 is C 1 -C 6 alkyl, X 2 is CH 3 or H; and at least one second acrylate monomer different from the monomer of Formula (1), wherein an amount of the monomer of Formula (1) is at least 5 wt % and not greater than 30 wt % based on the total weight of the curable composition; an amount of the at least one second monomer is at least 50 wt % based on the total weight of the curable composition; and a viscosity of the curable composition is not greater than 20 mPa s. 2. The curable composition of claim 1 , wherein the monomer of Formula (1) includes a di-functional acrylate monomer. 3. The curable composition of claim 2 , wherein the di-functional acrylate monomer includes a structure of Formula (2): 4. The curable composition of claim 1 , wherein an amount of the polymerizable material is at least 80 wt % and not greater than 98 wt % based on the total weight of the curable composition. 5. The curable composition of claim 1 , wherein the at least one second acrylate monomer is selected from the group consisting of benzyl acrylate (BA), or isobornyl acrylate (IBOA), or neopentyl glycol diacrylate (A-NPG), and any combination thereof. 6. The curable composition of claim 1 , wherein the composition has a viscosity not greater than 15 mPa s. 7. The curable composition of claim 1 , further comprising a photo-initiator. 8. The curable composition of claim 1 , wherein the curable composition is adapted for use as a resist in a nanoimprint lithographic process. 9. The curable composition of claim 1 , wherein an Ohnishi number of the curable composition after curing is not greater than 3.6. 10. A laminate comprising a substrate and a cured layer overlying the substrate, wherein the cured layer is formed from the curable composition of claim 1 . 11. The laminate of claim 10 , wherein the cured layer has an Ohnishi number of not greater than 3.6. 12. A method of forming a cured layer on a substrate, comprising: applying a curable composition on a substrate, wherein the curable composition comprises a polymerizable material including a monomer having a structure of Formula (1): wherein R is H or alkyl or alkylaryl, n is 1-4, m is 0-6, X 1 is C 1 -C 6 alkyl, X 2 is CH 3 or H; and at least one second acrylate monomer different from the monomer of Formula (1), wherein an amount of the monomer of Formula (1) is at least 5 wt % and not greater than 30 wt % based on the total weight of the curable composition, an amount of the at least one second monomer is at least 50 wt % based on the total weight of the curable composition, and a viscosity of the curable composition is not greater than 20 mPa s; bringing the curable composition into contact with a superstrate; curing the curable composition with light and/or heat to form a cured layer; and removing the superstrate from the cured layer. 13. The method of claim 12 , wherein a viscosity of the curable composition is not greater than 15 mPa s. 14. The method of claim 12 , wherein the monomer of Formula (1) includes a structure of Formula (2) 15. A method of manufacturing an article, comprising: applying a curable composition on a substrate, wherein the curable composition comprises a polymerizable material including a monomer having a structure of Formula (1): wherein R is H or alkyl or alkylaryl, n is 1-4, m is 0-6, X 1 is C 1 -C 6 alkyl, X 2 is CH 3 or H; and at least one second acrylate monomer different from the monomer of Formula (1), wherein an amount of the monomer of Formula (1) is at least 5 wt % and not greater than 30 wt % based on the total weight of the curable composition, an amount of the at least one second monomer is at least 50 wt % based on the total weight of the curable composition, and a viscosity of the curable composition is not greater than 20 mPa s; bringing the curable composition into contact with a superstrate; curing the curable composition with light and/or heat to form a cured layer; and removing the superstrate from the cured layer; removing the superstrate from the photo-cured layer; and processing the substrate with the photo-cured layer to make the article. 16. The method of claim 15 , wherein the viscosity of the curable composition is not greater than 15 mPa·s.

Assignees

Inventors

Classifications

  • C08F222/10Primary

    Esters · CPC title

  • with sensitising agents · CPC title

  • C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate · CPC title

  • C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate · CPC title

  • unconjugated · CPC title

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Frequently asked questions

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What does patent US11945893B2 cover?
A curable composition can comprise a polymerizable material including a monomer of Formula (1), with R being H or alkyl or alkylaryl, n being 1-4, m being 0-6, X1 being C1-C6 substituted or unsubstituted alkyl, X2 being CH3 or H,After forming a cured layer of the curable composition, the cured layer can have an excellent etch resistance.
Who is the assignee on this patent?
Canon Kk
What technology area does this patent fall under?
Primary CPC classification C08F222/10. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 02 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).