Polymers containing an acetoacetate moiety
US-9505862-B2 · Nov 29, 2016 · US
C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08F220/1811 |
| Official title | {C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate} |
| Display label | C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate |
| Total patents | 988 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 52 |
| 2016 | 56 |
| 2017 | 76 |
| 2018 | 72 |
| 2019 | 76 |
| 2020 | 122 |
| 2021 | 101 |
| 2022 | 108 |
| 2023 | 109 |
| 2024 | 101 |
| 2025 | 92 |
| 2026 | 23 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Multilayer polymer composite for encapsulating quantum dots
US-2016272885-A1 · Sep 22, 2016 · US
Photosensitive resin composition, protective film and element having the same
US-9422446-B2 · Aug 23, 2016 · US
Active energy ray curable resin composition, and cured product
US-2016222146-A1 · Aug 4, 2016 · US
(meth)acrylic polymer, (meth)acrylic resin composition, (meth)acrylic resin sheet, (meth)acrylic resin laminated article and composite sheet
US-2016137766-A1 · May 19, 2016 · US
Curable composition for imprints, patterning method and pattern
US-9335628-B2 · May 10, 2016 · US
Radiation-curable ink composition, ink jet recording method, and recorded matter
US-9243156-B2 · Jan 26, 2016 · US
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device
US-9235117-B2 · Jan 12, 2016 · US
Photosensitive resin composition, protective film and element having the same
US-2015376355-A1 · Dec 31, 2015 · US
Method of manufacturing polymer for lithography, method of manufacturing resist composition, and method of manufacturing substrate having pattern
US-9223213-B2 · Dec 29, 2015 · US
Anticorrosive, terminal-attached covered electric wire, and wiring harness
US-2015368389-A1 · Dec 24, 2015 · US
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device
US-9213237-B2 · Dec 15, 2015 · US
Ureido-functionalized aqueous polymeric dispersion
US-9212292-B2 · Dec 15, 2015 · US
Polymers polymerized from at least four monomers, and compositions and uses thereof
US-2015353663-A1 · Dec 10, 2015 · US
Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
US-9188862-B2 · Nov 17, 2015 · US
Immobilized flavorants for flavor delivery
US-9185925-B2 · Nov 17, 2015 · US
Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
US-9188865-B2 · Nov 17, 2015 · US
Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound
US-2015323866-A1 · Nov 12, 2015 · US
Immersion upper layer film forming composition and method of forming photoresist pattern
US-9182674-B2 · Nov 10, 2015 · US
Imprinting method and curable composition for imprinting
US-2015315322-A1 · Nov 5, 2015 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C08F220/1811?
- CPC C08F220/1811 is the Cooperative Patent Classification code for “C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate.”
- How many patents are filed under CPC C08F220/1811 (C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate)?
- Our database includes 988 publications tagged with this CPC code.
- Is patent activity under CPC C08F220/1811 growing?
- Publication counts under this code: 101 in 2024 vs 92 in 2025 (latest complete years).