Curable composition for nanoimprinting and cured product

Patent metadata

Field	Value
Publication number	US-2016377976-A1
Application number	US-201615258662-A
Country	US
Kind code	A1
Filing date	Sep 7, 2016
Priority date	Mar 24, 2009
Publication date	Dec 29, 2016
Grant date	—

Abstract

Disclosed is a curable composition for nanoimprinting, which includes one or more polymerizable monomers, in which one or more monofunctional radically polymerizable monomers occupy 90 percent by weight or more of the one or more polymerizable monomers, and the one or more monofunctional radically polymerizable monomers give a polymer having a glass transition temperature of 25° C. or higher. The one or more monofunctional radically polymerizable monomers are preferably at least one compound selected from (meth)acrylic ester compounds, styrenic compounds, and vinyl ether compounds.

First claim

1 . A cured product obtained through curing of a curable composition for nanoimprinting,
wherein the curable composition for nanoimprinting comprises one or more polymerizable monomers, the one or more polymerizable monomers includes 90 percent by weight or more of one or more monofunctional radically polymerizable monomers, and the one or more monofunctional radically polymerizable monomers give a polymer having a glass transition temperature of 25° C. or higher.

2 . The cured product obtained through curing of a curable composition for nanoimprinting according to claim 1 ,
wherein the one or more monofunctional radically polymerizable monomers are at least one compound selected from the group consisting of (meth)acrylic ester compounds, styrenic compounds, and vinyl ether compounds.

3 . The cured product obtained through curing of a curable composition for nanoimprinting according to claim 1 or 2 ,
wherein the curable composition for nanoimprinting further comprises at least one radically polymerizable monomer intramolecularly having a cyclic structure as the one or more monofunctional radically polymerizable monomers.

4 . The cured product obtained through curing of a curable composition for nanoimprinting according to claim 3 ,
wherein the at least one radically polymerizable monomer intramolecularly having a cyclic structure is at least one compound selected from the group consisting of compounds represented by following Formulae (1) to (3):

wherein R 41 , R 42 , and R 43 are the same as or different from one another and each represent —H or —CH 3 .

5 . The cured product obtained through curing of a curable composition for nanoimprinting according to claim 1 or 2 ,
wherein the curable composition for nanoimprinting further comprises at least one radically polymerizable monomer having a hydrophilic group as the one or more monofunctional radically polymerizable monomers.

6 . The cured product obtained through curing of a curable composition for nanoimprinting according to claim 5 ,
wherein the hydrophilic group of the at least one radically polymerizable monomer having a hydrophilic group is hydroxyl group, carboxyl group, quaternary ammonium group, amino group, or a heterocyclic group.

7 . The cured product obtained through curing of a curable composition for nanoimprinting according to claim 1 ,
wherein the curable composition for nanoimprinting further comprises at least one polymer being obtained through polymerization of one or more monofunctional radically polymerizable monomers and having a glass transition temperature of 25° C. or higher.

8 . The cured product obtained through curing of a curable composition for nanoimprinting according to claim 1 ,
wherein the curable composition for nanoimprinting further comprises at least one radical-polymerization initiator.

9 . The cured product obtained through curing of a curable composition for nanoimprinting according to claim 1 ,
wherein the curable composition for nanoimprinting comprises two or more polymerizable monomers, the two or more polymerizable monomers include 90 percent by weight or more of two or more monofunctional radically polymerizable monomers, the two or more monofunctional radically polymerizable monomers give a polymer having a glass transition temperature of 25° C. or higher, the two or more monofunctional radically polymerizable monomers are at least two compounds selected from the group consisting of (meth)acrylic ester compounds, styrenic compounds, and vinyl ether compounds, the two or more monofunctional radically polymerizable monomers include at least one radically polymerizable monomer intramolecularly having a cyclic structure as the monofunctional radically polymerizable monomers, the at least one radically polymerizable monomer intramolecularly having a cyclic structure is at least one compound selected from the group consisting of compounds represented by following Formulae (1) to (3):

wherein R 41 , R 42 , and R 43 are the same as or different from one another and each represent —H or —CH 3 ,
the at least one radically polymerizable monomer intramolecularly having a cyclic structure occupies 40 percent by weight or more of the total weight of the polymerizable monomers in the curable composition,
with the proviso that the at least one radically polymerizable monomer intramolecularly having a cyclic structure includes a compound represented by Formula (1), the compound represented by Formula (1) occupies 40 percent by weight or more of the total weight of the polymerizable monomers, and at least one of the following conditions A, B, and C is met:
[A] the total weight of the compound represented by Formula (1) and the compound represented by Formula (3) occupies 90 percent by weight or more of the total weight of the polymerizable monomers;
[B] the total weight of the compound represented by Formula (1) and (meth)acrylic acid alkyl esters whose alkyl moiety has 1 to 10 carbon atoms occupies 90 percent by weight or more of the total weight of the polymerizable monomers;
[C] the total weight of the compound represented by Formula (1) and/or (3) and phenolic-hydroxyl-containing monofunctional radically polymerizable monomers and/or carboxyl-containing monofunctional radically polymerizable monomers occupies 90 percent by weight or more of the total weight of the polymerizable monomers, and the total weight of the phenolic-hydroxyl-containing monofunctional radically polymerizable monomers and the carboxyl-containing monofunctional radically polymerizable monomers occupies 10 percent by weight or more of the total weight of the polymerizable monomers.

10 . A method for producing a fine structure, comprising nanoimprinting a curable composition for nanoimprinting to give a fine structure,
wherein the curable composition for nanoimprinting comprises one or more polymerizable monomers, the one or more polymerizable monomers includes 90 percent by weight or more of one or more monofunctional radically polymerizable monomers, and the one or more monofunctional radically polymerizable monomers give a polymer having a glass transition temperature of 25° C. or higher.

11 . A method for producing a fine structure, comprising nanoimprinting a curable composition for nanoimprinting to give a fine structure,
wherein the curable composition for nanoimprinting comprises two or more polymerizable monomers, the two or more polymerizable monomers include 90 percent by weight or more of two or more monofunctional radically polymerizable monomers, the two or more monofunctional radically polymerizable monomers give a polymer having a glass transition temperature of 25° C. or higher, the two or more monofunctional radically polymerizable monomers are at least two compounds selected from the group consisting of (meth)acrylic ester compounds, styrenic compounds, and vinyl ether compounds, the two or more monofunctional radically polymerizable monomers include at least one radically polymerizable monomer intramolecularly having a cyclic structure as the monofunctional radically polymerizable monomers, the at least one radically polymerizable monomer intramolecularly having a cyclic structure is at least one compound selected from the group consisting of compounds represented by following Formulae (1) to (3):

wherein R 41 , R 42 ,

Assignees

• Daicel Corp

Inventors

• Miyake Hiroto
• Yukawa Takao
• Iyoshi Shuso

Classifications

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• C08F220/40

  Esters of unsaturated alcohols {, e.g. allyl (meth)acrylate} · CPC title

• C08F220/06

  Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof · CPC title