Process of forming an electronic device including a doped gate electrode

Patent metadata

Field	Value
Publication number	US-11942326-B2
Application number	US-202017123264-A
Country	US
Kind code	B2
Filing date	Dec 16, 2020
Priority date	Dec 16, 2020
Publication date	Mar 26, 2024
Grant date	Mar 26, 2024

Abstract

A process to form a HEMT can have a gate electrode layer that initially has a plurality of spaced-apart doped regions. In an embodiment, any of the spaced-apart doped regions can be formed by depositing or implanting p-type dopant atoms. After patterning, the gate electrode can include an n-type doped region over the p-type doped region. In another embodiment a barrier layer can underlie the gate electrode and include a lower film with a higher Al content and thinner than an upper film. In a further embodiment, a silicon nitride layer can be formed over the gate electrode layer and can help to provide Si atoms for the n-type doped region and increase a Mg:H ratio within the gate electrode. The HEMT can have good turn-on characteristics, low gate leakage when in the on-state, and better time-dependent breakdown as compared to a conventional HEMT.

First claim

What is claimed is:

1. A process of forming an electronic device comprising:
forming a barrier layer;
forming a gate electrode layer over the barrier layer, wherein forming the gate electrode layer comprises:
forming a first film of the gate electrode layer, wherein the first film includes a first III-V material;
forming a first dopant region of the gate electrode layer, wherein the first dopant region has a first conductivity type;
forming a second film of the gate electrode layer overlying the first film of the gate electrode layer, wherein the second film includes a second III-V material and is formed after forming the first dopant region; and
forming a second dopant region of the gate electrode layer, wherein the second dopant region overlies the first dopant region and has the first conductivity type;

merging the first dopant region and the second dopant region together to form a diffused doped region by diffusing a dopant from each of the first dopant region and the second dopant region;
patterning the gate electrode layer to form a gate electrode; and
forming a gate interconnect over the gate electrode,
wherein after forming the gate interconnect, a first portion of the gate electrode contacts the barrier layer and is undoped or has an average dopant concentration of the first conductivity type that is at most 5×10 16 atoms/cm 3 .

2. The process of claim 1 , further comprising forming a channel layer having a major surface before forming the first film of the gate electrode layer, wherein, after forming the gate interconnect:
the diffused doped region has a dopant concentration profile in a direction substantially perpendicular to the major surface, and
the dopant concentration profile has at least two peak dopant concentrations, wherein one of the at least two peak dopant concentrations corresponds to the first dopant region, and another one of the at least two peak dopant concentrations corresponds to the second dopant region.

3. The process of claim 1 , wherein forming the first dopant region comprises forming spaced-apart droplets including atoms of a dopant over the first film before forming the second film.

4. The process of claim 1 , wherein forming the first dopant region or forming the second dopant region comprises using a Mg precursor that includes Mg, C, and H atoms and does not include a different metal or O atom as a dopant source.

5. The process of claim 1 , wherein forming the first dopant region or forming the second dopant region comprises implanting Mg into the first film or the second film of the gate electrode layer.

6. The process of claim 1 , wherein forming the gate electrode layer further comprises forming a third film of the gate electrode layer over the second film of the gate electrode layer, wherein after forming the gate interconnect, the third film includes a dopant having a second conductivity type opposite the first conductivity type.

7. The process of claim 1 , further comprising forming a third film of the gate electrode layer over the second film of the gate electrode layer, wherein the third film of the gate electrode layer is a polycrystalline Si film.

8. The process of claim 1 , further comprising forming a silicon nitride layer over the first film and the second film of the gate electrode layer, wherein some Si during formation of or from the silicon nitride layer migrates into the gate electrode layer to form a Si-doped region within the gate electrode layer.

9. The process of claim 8 , wherein patterning the gate electrode layer is performed after forming the silicon nitride layer.

10. The process of claim 1 , wherein forming the gate interconnect is performed such that the gate interconnect contacts a surface of the gate electrode to form a Schottky contact.

11. The process of claim 1 , wherein forming the gate interconnect is performed such that the gate interconnect contacts a surface of the gate electrode to form an ohmic contact.

12. The process of claim 1 , forming the barrier layer comprises:
forming a first film of the barrier layer; and
forming a second film of the barrier layer,
wherein:
forming the second film of the barrier layer is performed after forming the first film of the barrier layer and before forming the first film of the gate electrode layer, and
the first film of the barrier layer has a higher Al content and is thinner as compared to the second film of the barrier layer.

13. A process of forming an electronic device comprising:
forming a gate electrode layer comprising:
forming a first film of the gate electrode layer, wherein the first film includes a first III-V material;
forming a first dopant region of the gate electrode layer, wherein the first dopant region has a first conductivity type; and
forming a second film of the gate electrode layer overlying the first film of the gate electrode layer, wherein the second film includes a second III-V material;

forming a silicon nitride layer over the second film of the gate electrode layer, wherein:
forming the silicon nitride layer is performed using a silicon-containing gas and a nitrogen-containing gas at a temperature of at least 750° C., and
the silicon-containing gas includes SiH 4 , SiH 3 Cl, SiH 2 Cl 2 , or SiHCl 3 , and the nitrogen-containing gas includes NH 3 , N 2 , N 2 O, or N 2 H 4 ;

patterning the gate electrode layer to form a gate electrode;
thermally annealing the silicon nitride layer such that some Si from the silicon nitride layer migrates into the gate electrode layer or the gate electrode and forms a Si-doped region within the gate electrode layer or the gate electrode, and the Si-doped region has a second conductivity type that is opposite the first conductive type, wherein thermally annealing is performed after forming the silicon nitride layer; and
forming a gate interconnect that contacts the Si-doped region of the gate electrode.

14. The process of claim 13 , wherein forming the first dopant region comprises using a Mg precursor that includes Mg, C, and H atoms and does not include a different metal or O atom as a dopant source.

15. The process of claim 13 , wherein forming the gate interconnect is performed such that the contact between the gate interconnect and the gate electrode is a Schottky contact.

16. The process of claim 13 , further comprising:
forming a barrier layer before forming the first film;
forming a dielectric layer over the silicon nitride layer;
defining a gate contact opening extending through the dielectric layer and the silicon nitride layer to expose the gate electrode;
defining a source contact opening extending through the dielectric layer to expose the barrier layer;
forming a source interconnect that extends into the source contact opening and contacts a surface of the barrier layer to form an ohmic contact;
defining a drain contact opening extending through the dielectric layer to expose the barrier layer; and
forming a drain interconnect that extends into the drain contact opening and contacts the surface of the barrier layer to form an ohmic contact.

17. The process of claim 13 , further comprising:
forming a third film of the gate electrode layer after forming the first film of the gate electrode layer and before forming the second film of the gate electrode layer, wherein the third film includes a third III-V material, and
forming a second dopant region of the gate electrode layer, wherein the second dopant region overlies the first dopant region and has the first conductivity type.

18. The process of claim 17 , further compri

Assignees

• Semiconductor Components Ind Llc

Inventors

• Kostelnik Petr
• Novak Tomas
• Coppens Peter
• Moens Peter
• Banerjee Abhishek

Classifications

• H10P32/30

  Diffusion for doping of conductive or resistive layers · CPC title

• H10P14/69433

  the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz · CPC title

• H10D64/0124 Primary

  to Group III-V semiconductors · CPC title

• H10D64/64

  Electrodes comprising a Schottky barrier to a semiconductor · CPC title

• H10D62/8503

  Nitride Group III-V materials, e.g. AlN or GaN · CPC title