Mask Assembly
US-2020057394-A1 · Feb 20, 2020 · US
Mask protective module, pellicle having the same, and lithography apparatus having the same
US11940726B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11940726-B2 |
| Application number | US-202217851580-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 28, 2022 |
| Priority date | Sep 12, 2016 |
| Publication date | Mar 26, 2024 |
| Grant date | Mar 26, 2024 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
A lithography apparatus comprises a light source for emitting light; a mask mounting zone where a mask for reflecting the light is disposed; and a mask protective module disposed on the mask to transmit the light from the light source toward the mask. The mask protective module comprises a frame and a membrane supported by the frame, wherein the membrane includes a penetration region for transmitting the light and a peripheral region of which a light transmittance is lower than that of the penetration region.
First claim
Opening claim text (preview).
What is claimed is: 1. A lithography apparatus comprising: a light source for emitting light; a mask mounting zone where a mask for reflecting the light is disposed; and a mask protective module disposed on the mask to transmit the light from the light source toward the mask, and a penetration region replacing device, wherein the penetration region replacing device comprises: a rod; and a penetration region mounting unit connected to an end of the rod and configured to turn on the rod as an axis, wherein the penetration region mounting unit comprises a plurality of penetration region modules providing a penetration region of a membrane and turns to provide a new penetration region module not used on the mask protective module, wherein the mask protective module comprises, a frame; and the membrane supported by the frame, wherein the membrane includes the penetration region for transmitting the light and a peripheral region of which a light transmittance is lower than that of the penetration region. 2. The lithography apparatus of claim 1 , wherein the light comprises extreme ultraviolet light. 3. The lithography apparatus of claim 1 , wherein the peripheral region surrounds the penetration region, and wherein mechanical strength or heat conductivity of the peripheral region is higher than that of the penetration region. 4. The lithography apparatus of claim 1 , wherein the penetration region comprises a first penetration region and a second penetration region which are spaced apart from each other, and the peripheral region surrounds the first and second penetration regions.
Assignees
Inventors
Classifications
Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography · CPC title
- G03F1/66Primary
Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof · CPC title
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof · CPC title
- G03F1/62Primary
Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof · CPC title
Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title
Patent family
Related publications grouped by family.
External sources
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US11940726B2 cover?
- A lithography apparatus comprises a light source for emitting light; a mask mounting zone where a mask for reflecting the light is disposed; and a mask protective module disposed on the mask to transmit the light from the light source toward the mask. The mask protective module comprises a frame and a membrane supported by the frame, wherein the membrane includes a penetration region for transm…
- Who is the assignee on this patent?
- Univ Hanyang Ind Univ Coop Found
- What technology area does this patent fall under?
- Primary CPC classification G03F1/66. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 26 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).