Electroless nickel etch chemistry, method of etching and pretreatment

Patent metadata

Field	Value
Publication number	US-11932948-B2
Application number	US-202117512511-A
Country	US
Kind code	B2
Filing date	Oct 27, 2021
Priority date	Oct 28, 2020
Publication date	Mar 19, 2024
Grant date	Mar 19, 2024

Abstract

Etchant solutions, pretreatment and methods for etching electroless nickel on metallic materials are provided herein. More specifically, etchant solutions for selectively removing electroless nickel from the surface of metallic materials containing copper, and optionally as containing stainless steel, methods of etching and pretreatment are provided.

First claim

We claim:

1. A method of removing electroless nickel on at least one surface of a substrate, the substrate including copper and optionally stainless steel, comprising the steps of: exposing the substrate to an etchant solution comprising hydrogen peroxide, sodium m-nitrobenzoate (NBCA) and ethylenediamine tetra acetic acid (EDTA); and
etching the electroless nickel on the surface of the substrate to remove the electroless nickel.

2. The method of claim 1 wherein the etching step does not substantially remove the copper relative to removal of the electroless nickel.

3. The method of claim 1 wherein the etching step is carried out at a temperature from about 25 to about 55° C.

4. The method of claim 1 wherein the etching step is carried out for a time of about 1 to 15 minutes.

5. The method of claim 1 wherein the electroless nickel is etched at an etch rate of about to about 25 nm/min to about 150 nm/min at a pH of above 3.9.

6. The method of claim 1 wherein the etchant solution has a molar concentration in the range of about 3.0-4.0 M hydrogen peroxide, 0.4-0.5 M NBCA and 0.05-0.10M EDTA.

7. The method of claim 1 wherein the etchant solution wherein the has a concentration of about 1.9 vol % to 2.35 vol % hydrogen peroxide, 0.175M to 0.235M NBCA and 0.02M to 0.04M EDTA.

8. The method of claim 1 wherein the etchant solution has a concentration of about 15.0 wt % hydrogen peroxide, 8.5 wt % NBCA and 1.5 wt % EDTA.

9. The method of claim 1 wherein the substrate is exposed to the etchant solution by any one or more of: immersing, spraying or dipping.

Assignees

• Hutchinson Technology

Inventors

• Horner Matthew J
• Vangara Gowtham V
• Riemer Douglas P

Classifications

• C23F1/30 Primary

  for etching other metallic material · CPC title

• C23F1/44 Primary

  Compositions for etching metallic material from a metallic material substrate of different composition · CPC title

• C23F1/28

  for etching iron group metals · CPC title