Copper alloy sheet, copper alloy sheet with plating film, and method for producing same

US11920228B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11920228-B2
Application numberUS-202017784062-A
CountryUS
Kind codeB2
Filing dateDec 8, 2020
Priority dateDec 10, 2019
Publication dateMar 5, 2024
Grant dateMar 5, 2024

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Providing a copper alloy plate, in which center Mg concentration at a center part in a plate thickness direction 0.1 mass % or more and less than 0.3 mass %, center P concentration is 0.001 mass % or more and 0.2 mass % or less, and the balance is composed of Cu and inevitable impurities; in which surface Mg concentration at a surface is 70% or less of the center Mg concentration; in which a surface layer part defined by a prescribed thickness from the surface has a concentration gradient of Mg of 0.05 mass %/μm or more and 5 mass %/μm or less increasing from surface toward center part of the plate thickness direction; and in which restraint of color change of the surface and increase of electrical contact resistance, and adhesiveness of a plating film are excellent due to maximum Mg concentration in the surface layer part is 90% of the center Mg concentration.

First claim

Opening claim text (preview).

The invention claimed is: 1. A copper alloy plate, wherein in a center part in a plate thickness direction, a center Mg concentration is 0.1 mass % or more and less than 0.3 mass %, a center P concentration is 0.001 mass % or more and 0.2 mass % or less, and the balance Cu and inevitable impurities, a surface Mg concentration on a surface is 70% or less of the center Mg concentration, and a surface layer part defined by a prescribed thickness from the surface has a concentration gradient of Mg concentration increasing from the surface toward the center part in the plate thickness direction at 0.05 mass %/μm or more and 5 mass %/μm or less, and Mg concentration in a deepest part is 90% of the center Mg concentration. 2. The copper alloy plate according to claim 1 wherein the thickness of the surface layer part is 5 μm or less. 3. A copper alloy plate with a plating film having the copper alloy plate described in claim 1 and a plating film formed on the surface layer part. 4. The copper alloy plate with a plating film according to claim 3 , wherein an average Mg concentration in the plating film is 10% or less of the center Mg concentration. 5. The copper alloy plate with a plating film according to claim 3 , wherein the plating film is configured from one or more layers selected from tin, copper, zinc, nickel, gold, silver, palladium, and alloy of two or more of them. 6. The copper alloy plate with a plating film according to claim 3 , wherein the thickness of the surface layer part is 5 μm or less. 7. A method of producing a copper alloy plate according to claim 1 , comprising Mg concentration treatment for a copper alloy plate material wherein Mg concentration is 0.1 mass % or more and less than 0.3 mass %, P concentration is 0.001 mass % or more and 0.2 mass % or less, and the balance is composed of Cu and inevitable impurities, forming a surface part where Mg is concentrated by diffusing Mg to a surface, and surface part removal treatment forming the surface layer part by removing the surface part where Mg is concentrated. 8. The method of producing a copper alloy plate according to claim 7 , wherein the thickness of the surface layer part formed by the surface part removal treatment is 5 μm or less.

Assignees

Inventors

Classifications

  • C22C9/00Primary

    Alloys based on copper · CPC title

  • of copper or alloys based thereon · CPC title

  • Pretreatment of metallic surfaces to be electroplated · CPC title

  • Electroplating with more than one layer of the same or of different metals (for bearings C25D7/10) · CPC title

  • Multi-step processes for surface treatment of metallic material involving at least one process provided for in class C23 and at least one process covered by subclass C21D or C22F or class C25 (coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups C23C2/00 - C23C26/00, or by combinations of methods providedfor in subclasses C23C and C25D, C23C28/00) · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11920228B2 cover?
Providing a copper alloy plate, in which center Mg concentration at a center part in a plate thickness direction 0.1 mass % or more and less than 0.3 mass %, center P concentration is 0.001 mass % or more and 0.2 mass % or less, and the balance is composed of Cu and inevitable impurities; in which surface Mg concentration at a surface is 70% or less of the center Mg concentration; in which a su…
Who is the assignee on this patent?
Mitsubishi Materials Corp
What technology area does this patent fall under?
Primary CPC classification C22C9/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 05 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).