Injector configured for arrangement within a reaction chamber of a substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-11891696-B2
Application number	US-202117534604-A
Country	US
Kind code	B2
Filing date	Nov 24, 2021
Priority date	Nov 30, 2020
Publication date	Feb 6, 2024
Grant date	Feb 6, 2024

Abstract

The invention relates to an injector configured for arrangement within a reaction chamber of a substrate processing apparatus to inject gas in the reaction chamber. The injector may be elongated along a first axis and configured with an internal gas conduction channel extending along the first axis and provided with at least one gas entrance opening and at least one gas exit opening. The injector may have a width extending along a second axis perpendicular to the first axis substantially larger than a depth of the injector extending along a third axis perpendicular to the first and second axis. The wall of the injector may have a varying thickness.

First claim

What is claimed is:

1. An injector comprising:
a wall,
an internal gas conduction channel extending along a first axis,
at least one gas entrance opening, and
at least one gas exit opening;
wherein the injector is substantially elongated along the first axis,
wherein the injector has a width extending along a second axis perpendicular to the first axis substantially larger than a depth of the injector extending along a third axis perpendicular to the first and second axis,
wherein the wall of the injector has a varying thickness,
wherein the internal gas conduction channel has a substantially oval shaped cross section whereby the internal gas conduction channel extends along the second axis substantially larger than along the third axis, wherein the substantially oval shaped cross section is partially pinched off in the middle of a second direction by the wall having an increased thickness, and
wherein the substantially oval shaped cross section is partially pinched off in the middle of the second direction by a bulb provided to the wall and extending into the internal gas conduction channel.

2. The injector according to claim 1 , wherein the wall of the injector has the varying thickness along the second axis.

3. The injector according to claim 1 , wherein the wall of the injector has the varying thickness along the third axis.

4. The injector according to claim 1 , wherein the wall of the injector has the varying thickness over its circumference along the second and third axis.

5. The injector according to claim 1 , wherein the wall of the injector has the varying thickness along the first axis.

6. The injector according to claim 1 , wherein the surface of the bulb is partially following a circle, the circle shape having a constant radius with respect to an axis parallel to the first axis.

7. The injector according to claim 1 , wherein the at least one gas entrance opening of the gas injector is a single gas entrance opening at a first end of the injector.

8. The injector according to claim 7 , wherein the at least one gas exit opening of the gas injector is a single gas exit opening at a second end, opposite to the first end.

9. The injector according to claim 7 , wherein the injector has a plurality of gas exit holes along a length of the injector along the direction of a second end, opposite to the first end.

10. The injector according to claim 1 , wherein the depth of the injector in a third direction is decreasing towards a second end.

11. The injector according to claim 1 , wherein a horizontal inner cross-section area of the internal gas conduction channel inside the injector is between 100 and 1500 mm 2 .

12. A substrate processing apparatus comprising:
a tube;
a closed liner configured to extend in an interior of the tube;
a gas injector to provide a gas to the interior of the tube; and,

a gas exhaust duct to remove the gas from the interior, whereby the closed liner comprises: a substantially cylindrical wall delimited by a liner opening at a lower end, a top closure at a higher end, and being substantially closed for gases above the liner opening, wherein the gas injector is the injector according to claim 1 .

13. The substrate processing apparatus according to claim 12 , wherein the apparatus comprises a plurality of gas injectors and at least one of the gas injectors has a different length.

14. The substrate processing apparatus according to claim 13 , wherein the longest of the plurality of injectors extends within the interior to close to the top closure of the closed liner.

15. The substrate processing apparatus according to claim 13 , wherein one of the longest of the plurality of injectors has a single gas exit hole.

16. The substrate processing apparatus according to claim 13 , wherein one of the longest of the plurality of injectors has a plurality of gas exit holes.

17. The substrate processing apparatus according to claim 13 , wherein the shortest of the plurality of injectors has a plurality of gas exit hole.

18. The substrate processing apparatus according to claim 12 , wherein the liner is supported on a flange and a gas exhaust opening is constructed and arranged between the liner and the flange for removing gas from the circumferential space between the liner and the tube to the gas exhaust duct.

Assignees

• Asm Ip Holding Bv

Inventors

• Jdira Lucian C
• De Ridder Chris G M

Classifications

• H10P72/0431

  Apparatus for thermal treatment · CPC title

• H10P72/0436

  mainly by radiation · CPC title

• H10P72/0432

  mainly by conduction · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/12 Primary

  Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements · CPC title