Antenna apparatus and fabrication method

US11870130B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11870130-B2
Application numberUS-202016939392-A
CountryUS
Kind codeB2
Filing dateJul 27, 2020
Priority dateJul 27, 2020
Publication dateJan 9, 2024
Grant dateJan 9, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A semiconductor device includes a semiconductor die comprising a radio frequency (RF) circuit, a first dielectric layer disposed over a first surface of the semiconductor die, an antenna layer disposed over a surface of the first dielectric layer, and an antenna feeding structure coupling the antenna layer to the RF circuit of the semiconductor die, wherein the semiconductor die comprises a via, and the antenna feeding structure comprises a first portion arranged within the opening of the semiconductor die and extending to the first surface of the semiconductor die, and a second portion arranged through the first dielectric layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A semiconductor device comprising: a semiconductor die comprising a radio frequency (RF) circuit; a first dielectric layer disposed over a first surface of the semiconductor die; an antenna layer disposed over a surface of the first dielectric layer; and an antenna feeding structure coupling the antenna layer to the RF circuit of the semiconductor die, wherein: the semiconductor die comprises an opening; and the antenna feeding structure comprises: a first portion comprising a first via arranged within the opening of the semiconductor die and extending to the first surface of the semiconductor die, a second portion comprising a second via arranged through the first dielectric layer and extending from the first surface of the semiconductor die to the antenna layer, and a third portion comprising a planar conductive feature disposed on the first surface of the semiconductor die, the third portion conductively connecting the first portion to the second portion. 2. The semiconductor device of claim 1 , wherein: the first surface of the semiconductor die is a backside of the semiconductor die. 3. The semiconductor device of claim 2 , further comprising: a redistribution structure over a second surface of the semiconductor die, wherein the redistribution structure is electrically coupled to the RF circuit, and the second surface of the semiconductor die is a front side of the semiconductor die; and a plurality of input/output connectors electrically coupled to the semiconductor die through the redistribution structure. 4. The semiconductor device of claim 3 , wherein: the redistribution structure comprises a redistribution layer and a second dielectric layer, and wherein the redistribution layer is embedded in the second dielectric layer. 5. The semiconductor device of claim 1 , wherein: the first via extends partially through the semiconductor die; and a bottommost end of the first via is connected to a contact embedded in the semiconductor die. 6. The semiconductor device of claim 1 , wherein: the antenna layer extends over a sidewall of the semiconductor device, and wherein a bottommost level of a portion of the antenna layer extending over the sidewall of the semiconductor device is higher than the first surface of the semiconductor die. 7. The semiconductor device of claim 1 , wherein: the semiconductor device is an antenna-in-package (AiP) device. 8. A method of using a semiconductor device comprising: a semiconductor die comprising a radio frequency (RF) circuit; a first dielectric layer disposed over a first surface of the semiconductor die; an antenna layer disposed over a surface of the first dielectric layer; and an antenna feeding structure coupling the antenna layer to the RF circuit of the semiconductor die, wherein the semiconductor die comprises an opening, and the antenna feeding structure comprises: a first portion comprising a first via arranged within the opening of the semiconductor die and extending to the first surface of the semiconductor die, a second portion comprising a second via arranged through the first dielectric layer and extending from the first surface of the semiconductor die to the antenna layer, and a third portion comprising a planar conductive feature disposed on the first surface of the semiconductor die, the third portion conductively connecting the first portion to the second portion, the method comprising: generating a first RF signal using the RF circuit of the semiconductor die; and coupling the first RF signal to the antenna layer via the antenna feeding structure. 9. The method of claim 8 , further comprising transmitting the first RF signal via the antenna layer. 10. The method of claim 8 , further comprising: receiving a second RF signal via the antenna layer; and coupling the second RF signal to the RF circuit of the semiconductor die via the antenna feeding structure. 11. The method of claim 8 , wherein the first surface of the semiconductor die is a backside of the semiconductor die. 12. The method of claim 11 , wherein the semiconductor device further comprises: a redistribution structure over a second surface of the semiconductor die, wherein the redistribution structure is electrically coupled to the RF circuit, and the second surface of the semiconductor die is a front side of the semiconductor die; and a plurality of input/output connectors electrically coupled to the semiconductor die through the redistribution structure. 13. The method of claim 12 , wherein: the redistribution structure comprises a redistribution layer and a second dielectric layer, and wherein the redistribution layer is embedded in the second dielectric layer. 14. The method of claim 8 , wherein: the first via extends partially through the semiconductor die; and a bottommost end of the first via is connected to a contact embedded in the semiconductor die. 15. The method of claim 8 , wherein: the antenna layer extends over a sidewall of the semiconductor device, and wherein a bottommost level of a portion of the antenna layer extending over the sidewall of the semiconductor device is higher than the first surface of the semiconductor die. 16. The method of claim 8 , wherein the semiconductor device is an antenna-in-package (AiP) device. 17. A method of forming a semiconductor device, the method comprising: providing a semiconductor die comprising a radio frequency (RF) circuit; forming a first dielectric layer disposed over a first surface of the semiconductor die; forming an antenna layer disposed over a surface of the first dielectric layer; and forming an antenna feeding structure coupling the antenna layer to the RF circuit of the semiconductor die, wherein: the semiconductor die comprises an opening; and the antenna feeding structure comprises: a first portion comprising a first via arranged within the opening of the semiconductor die and extending to the first surface of the semiconductor die, a second portion comprising a second via arranged through the first dielectric layer and extending from the first surface of the semiconductor die to the antenna layer, and a third portion comprising a planar conductive layer disposed on the first surface of the semiconductor die, the third portion conductively connecting the first portion to the second portion. 18. The method of claim 17 , wherein the first surface of the semiconductor die is a backside of the semiconductor die. 19. The method of claim 18 , further comprising: forming a redistribution structure over a second surface of the semiconductor die, wherein the redistribution structure is electrically coupled to the RF circuit, and the second surface of the semiconductor die is a front side of the semiconductor die; and forming a plurality of input/output connectors electrically coupled to the semiconductor die through the redistribution structure. 20. The method of claim 19 , wherein: the redistribution structure comprises a redistribution layer and a second dielectric layer, and wherein the redistribution layer is embedded in the second dielectric layer.

Assignees

Inventors

Classifications

  • for antennas · CPC title

  • characterised by the relative positions of pads or connectors relative to package parts · CPC title

  • of vias therein · CPC title

  • Connecting or disconnecting other interconnections thereto or therefrom, e.g. connecting bond wires or bumps · CPC title

  • of insulating or insulated package substrates, or of interposers, or of redistribution layers (manufacture or treatment of leadframes H10W70/04) · CPC title

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What does patent US11870130B2 cover?
A semiconductor device includes a semiconductor die comprising a radio frequency (RF) circuit, a first dielectric layer disposed over a first surface of the semiconductor die, an antenna layer disposed over a surface of the first dielectric layer, and an antenna feeding structure coupling the antenna layer to the RF circuit of the semiconductor die, wherein the semiconductor die comprises a via…
Who is the assignee on this patent?
Infineon Technologies Ag
What technology area does this patent fall under?
Primary CPC classification H10W44/20. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 09 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).