Imprint compositions with passivated nanoparticles and materials and processes for making the same

Patent metadata

Field	Value
Publication number	US-11868043-B2
Application number	US-202117527819-A
Country	US
Kind code	B2
Filing date	Nov 16, 2021
Priority date	Nov 18, 2020
Publication date	Jan 9, 2024
Grant date	Jan 9, 2024

Abstract

Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more atomic layer deposition (ALD) materials, one or more block copolymers, or one or more silicon-containing compounds.

First claim

What is claimed is:

1. An imprint composition, comprising:
a plurality of passivated nanoparticles, wherein:
each passivated nanoparticle comprises a core and a shell;
the core comprises a metal oxide;
the shell comprises a passivation material comprising a block copolymer, wherein the block copolymer comprises polystyrene-bloc k-poly(4-vinylpyridine) (PS-b-P4VP), polystyrene b-polyethylene oxide (PS-b-PEO), polystyrene-b-polybutadiene (PS-b-PB), polystyrene b-polymethylmethacrylate (PS-b-PMMA), polystyrene-block-polybutadiene-bloc k-poly-styrene, a poloxamer, poly(isoprene-block-dimethylaminoethyl methacrylate) (PI-b-PDMAEMA), poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) (PEO-PPO-PEO), or any combination thereof; and
the shell has a thickness of about 0.1 nm to about 50 nm;

one or more solvents;
a surface ligand;
an additive; and
an acrylate.

2. The imprint composition of claim 1 , wherein the core comprises titanium oxide, niobium oxide, zirconium oxide, hafnium oxide, dopants thereof, or any combination thereof.

3. The imprint composition of claim 1 , wherein each passivated nanoparticle has a spherical or oval geometry.

4. The imprint composition of claim 1 , wherein the core has a diameter of about 2 nm to about 50 nm.

5. The imprint composition of claim 4 , wherein the shell has a thickness of about 1 nm to about 25 nm.

6. An imprint composition, comprising:
a plurality of passivated nanoparticles, wherein:
each passivated nanoparticle comprises a core and a shell, and has a spherical or oval geometry;
the core comprises a metal oxide; and
the shell comprises a passivation material comprising a block copolymer, wherein the block copolymer comprises polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP), polystyrene b-polyethylene oxide (PS-b-PEO), polystyrene-b-polybutadiene (PS-b-PB), polystyrene b-polymethylmethacrylate (PS-b-PMMA), polystyrene-block-polybutadiene-block-poly-styrene, a poloxamer, poly(isoprene-block-dimethylaminoethyl methacrylate) (PI-b-PDMAEMA), poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) (PEO-PPO-PEO), or any combination thereof;

one or more solvents;
a surface ligand;
an additive; and
an acrylate.

7. The imprint composition of claim 1 , wherein the block copolymer comprises polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP).

8. The imprint composition of claim 1 , wherein the block copolymer comprises polystyrene b-polyethylene oxide (PS-b-PEO), polystyrene-b-polybutadiene (PS-b-PB), or any combination thereof.

9. The imprint composition of claim 1 , wherein the block copolymer comprises polystyrene b-polymethylmethacrylate (PS-b-PMMA), polystyrene-block-polybutadiene-block-poly-styrene, or any combination thereof.

10. The imprint composition of claim 1 , wherein the block copolymer comprises a poloxamer.

11. The imprint composition of claim 1 , wherein the block copolymer comprises poly(isoprene-block-dimethylaminoethyl methacrylate) (PI-b-PDMAEMA), poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) (PEO-PPO-PEO), or any combination thereof.

12. The imprint composition of claim 6 , wherein the block copolymer comprises polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP).

13. The imprint composition of claim 6 , wherein the block copolymer comprises polystyrene b-polyethylene oxide (PS-b-PEO), polystyrene-b-polybutadiene (PS-b-PB), or any combination thereof.

14. The imprint composition of claim 6 , wherein the block copolymer comprises polystyrene b-polymethylmethacrylate (PS-b-PMMA), polystyrene-block-polybutadiene-block-poly-styrene, or any combination thereof.

15. The imprint composition of claim 6 , wherein the block copolymer comprises a poloxamer.

16. The imprint composition of claim 6 , wherein the block copolymer comprises poly(isoprene-block-dimethylaminoethyl methacrylate) (PI-b-PDMAEMA), poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) (PEO-PPO-PEO), or any combination thereof.

17. An imprint composition, comprising:
a plurality of passivated nanoparticles, wherein:
each passivated nanoparticle comprises a core and a shell;
the core comprises a metal oxide;
the core has a diameter of about 2 nm to about 50 nm;
the shell comprises a passivation material comprising a block copolymer, wherein the block copolymer comprises polystyrene-bloc k-poly(4-vinylpyridine) (PS-b-P4VP), polystyrene b-polyethylene oxide (PS-b-PEO), polystyrene-b-polybutadiene (PS-b-PB), polystyrene b-polymethylmethacrylate (PS-b-PMMA), polystyrene-block-polybutadiene-block-poly-styrene, a poloxamer, poly(isoprene-block-dimethylaminoethyl methacrylate) (PI-b-PDMAEMA), poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) (PEO-PPO-PEO), or any combination thereof; and
the shell has a thickness of about 0.1 nm to about 50 nm;

one or more solvents;
a surface ligand; and
an additive.

18. The imprint composition of claim 17 , wherein the block copolymer comprises polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP), polystyrene b-polyethylene oxide (PS-b-PEO), polystyrene-b-polybutadiene (PS-b-PB), polystyrene b-polymethylmethacrylate (PS-b-PMMA), polystyrene-block-polybutadiene-block-poly-styrene, or any combination thereof.

19. The imprint composition of claim 17 , wherein the block copolymer comprises a poloxamer, poly(isoprene-block-dimethylaminoethyl methacrylate) (PI-b-PDMAEMA), poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) (PEO-PPO-PEO), or any combination thereof.

Assignees

• Applied Materials Inc

Inventors

• Joshi Amita
• Ceballos Andrew
• Ohno Kenichi
• Hourani Rami
• Godet Ludovic

Classifications

• C08K9/08

  Ingredients agglomerated by treatment with a binding agent · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• C09D7/62

  modified by treatment with other compounds · CPC title

• C09D7/65

  macromolecular (C09D7/41-C09D7/48 take precedence) · CPC title

• C09D7/67

  Particle size smaller than 100 nm · CPC title