Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography

Patent metadata

Field	Value
Publication number	US-8992992-B2
Application number	US-201313852683-A
Country	US
Kind code	B2
Filing date	Mar 28, 2013
Priority date	Dec 19, 2003
Publication date	Mar 31, 2015
Grant date	Mar 31, 2015

Abstract

The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.

First claim

What is claimed is:

1. A plurality of monodisperse micro or nano sized particles, comprising:
a pharmaceutically or therapeutically active agent, wherein said agent is present throughout the particle;
wherein each particle of the plurality has a substantially uniform three-dimensional engineered shape having parallel lateral surfaces and parallel top and bottom surfaces in cross-section, wherein;
the size of each particle of the plurality is less than about 100 micrometers in…

Assignees

• Univ North Carolina

Inventors

• Desimone Joseph M
• Rolland Jason P
• Maynor Benjamin W
• Euliss Larken E
• Rothrock Ginger Denison
• Dennis Ansley E
• Samulski Edward T
• Samulski R Jude

Classifications

• Y10T428/24273

  Cross-Sectional Technologies · mapped topic

• B81C99/0085

  Operations & Transport · mapped topic

• A61K47/34

  Human Necessities · mapped topic

• Y10T428/3154

  Cross-Sectional Technologies · mapped topic

• A61K9/0097 Primary

  Human Necessities · mapped topic