Mask and method of manufacturing the same

US11864453B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11864453-B2
Application numberUS-202117452279-A
CountryUS
Kind codeB2
Filing dateOct 26, 2021
Priority dateFeb 5, 2021
Publication dateJan 2, 2024
Grant dateJan 2, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a mask including a mask frame including a base part in which cell openings are defined, and a coating part surrounding edges of the cell openings, covering at least a portion of an upper surface of the base part, and including a materials that is different from that of the base part, and unit masks on the mask frame, respectively corresponding to the cell openings, including a material that is different from that of the coating part, and in which openings are defined.

First claim

Opening claim text (preview).

What is claimed is: 1. A mask comprising: a mask frame comprising a base part in which cell openings are defined, and a coating part surrounding edges of the cell openings, covering at least a portion of an upper surface of the base part, and comprising a material composition that is different from that of the base part; and unit masks on the mask frame, respectively corresponding to the cell openings, comprising a material composition that is different from that of the coating part, and in which openings are defined. 2. The mask of claim 1 , wherein an absorption rate of the coating part for a laser is lower than an absorption rate of the base part for the laser. 3. The mask of claim 2 , wherein the coating part comprises magnesium or aluminum. 4. The mask of claim 1 , wherein a thickness of the coating part is at most about 1/20 of a thickness of the base part. 5. The mask of claim 1 , wherein the coating part covers an entirety of the upper surface of the base part. 6. The mask of claim 1 , wherein the coating part comprises a plurality of coating parts spaced apart from each other, and respectively surrounding the cell openings. 7. The mask of claim 1 , wherein edges of each of the unit masks overlaps the coating part on a plane. 8. The mask of claim 1 , further comprising a joining part joining one of the unit masks and the mask frame. 9. The mask of claim 8 , wherein the joining part joins the one of the unit masks and the coating part. 10. The mask of claim 8 , wherein the joining part joins the one of the unit masks and the base part, and wherein the coating part is spaced apart from the joining part.

Assignees

Inventors

Classifications

  • H10K71/00Primary

    Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

  • B23K26/244Primary

    Overlap seam welding · CPC title

  • using masks, e.g. half-tone masks · CPC title

  • for making a groove or trench, e.g. for scribing a break initiation groove · CPC title

  • C23C14/042Primary

    using masks · CPC title

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Frequently asked questions

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What does patent US11864453B2 cover?
Provided is a mask including a mask frame including a base part in which cell openings are defined, and a coating part surrounding edges of the cell openings, covering at least a portion of an upper surface of the base part, and including a materials that is different from that of the base part, and unit masks on the mask frame, respectively corresponding to the cell openings, including a mater…
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10K71/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 02 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).