Pulse shot-type flow rate control device, pulse shot-type flow rate control method, and program

US11829167B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11829167-B2
Application numberUS-202117799980-A
CountryUS
Kind codeB2
Filing dateMar 2, 2021
Priority dateMar 30, 2020
Publication dateNov 28, 2023
Grant dateNov 28, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A pulse shot-type flow rate control device including first and second shutoff valves, a tank, a pressure sensor, and a controller is caused to perform two or more processes. In each process, the controller repeats pulse shots of alternately causing the first shutoff valve and the second shutoff valve to open and close, changes a way of the pulse shots based on a pressure difference between the pressure after filling and the pressure after discharge, and controls a volume flow rate. In each process, the controller stores, as an optimal filling time, a filling time when the volume flow rate is controlled to a target flow rate, and opens and closes the first shutoff valve by using the optimal filling time in a first pulse shot in the next process.

First claim

Opening claim text (preview).

The invention claimed is: 1. A pulse shot-type flow rate control device comprising: a first shutoff valve connected to a gas source; a second shutoff valve connected to the first shutoff valve; a gas filling capacity between the first shutoff valve and the second shutoff valve; and a pressure sensor for measuring a pressure in the gas filling capacity, wherein two or more processes for controlling gas to a target flow rate are performed, the first shutoff valve, the second shutoff valve, and the pressure sensor are connected communicatively to a controller that controls operations of the pulse shot-type flow rate control device, in each of the processes, the controller executes a flow rate control processing of: repeating a pulse shot of causing the first shutoff valve to open and close and, after that, causing the second shutoff valve to open and close; calculating a volume flow rate of gas exhausted from the gas filling capacity based on a pressure after filling measured by use of the pressure sensor after the first shutoff valve is opened and closed to fill gas into the gas filling capacity and a pressure after discharge measured by use of the pressure sensor after the second shutoff valve is opened and closed to discharge gas from the gas filling capacity; and changing a manner of repeating the pulse shot to regulate the volume flow rate to the target flow rate, and the controller executes: an optimal pressure storage processing of storing, as an optimal pressure, the pressure after filling measured by the pressure sensor when the pulse shot that regulates the volume flow rate to the target flow rate is performed in the flow rate control processing, and the controller executes: before a first pulse shot is performed in a subsequent process to a process in which the optimal pressure storage processing is executed, a pressure control processing of regulating the pressure in the gas filling capacity to the optimal pressure stored in the optimal pressure storage processing, and then opening and closing the second shutoff valve. 2. The pulse shot-type flow rate control device according to claim 1 , wherein the optimal pressure storage processing is executed in a first-time process after power-on, and the pressure control processing is executed before the first pulse shot in a second or subsequent-time process after power-on. 3. The pulse shot-type flow rate control device according to claim 2 , wherein the controller executes the optimal pressure storage processing in the flow rate control processing in the process performed immediately after the pressure control processing, and updates the optimal pressure. 4. The pulse shot-type flow rate control device according to claim 1 , wherein the controller executes: an optimal filling time storage processing of: measuring an opening-operation maintaining time for keeping the first shutoff valve open in each pulse shot in the flow rate control processing; and storing, as an optimal filling time, the opening-operation maintaining time when the pulse shot that regulates the volume flow rate to the target flow rate is performed, and the controller further executes: for execution of the first pulse shot in the flow rate control processing in a subsequent process to the process in which the optimal filling time storage processing is executed, a filling time control processing of opening and closing the first shutoff valve with the optimal filling time stored in the optimal filling time storage processing. 5. The pulse shot-type flow rate control device according to claim 4 , wherein the optimal filling time storage processing is performed in the same process as that in which the optimal pressure storage processing is performed. 6. The pulse shot-type flow rate control device according to claim 4 , wherein the optimal filling time is stored in the first-time process after power-on and is used in the second or subsequent-time process after power-on. 7. The pulse shot-type flow rate control device according to claim 4 , wherein the controller executes the optimal filling time storage processing in the flow rate control processing in the process in which the filling time control processing is performed, and updates the optimal filling time. 8. A pulse shot-type flow rate control method, using a pulse shot-type flow rate control device comprising: a first shutoff valve connected to a gas source; a second shutoff valve connected to the first shutoff valve; a gas filling capacity between the first shutoff valve and the second shutoff valve; and a pressure sensor for measuring a pressure in the gas filling capacity, wherein operations of the pulse shot-type flow rate control device are controlled by a controller communicatively connected to the first shutoff valve, the second shutoff valve, and the pressure sensor, wherein the method causes the pulse shot-type flow rate control device to perform: two or more processes for controlling gas to a target flow rate; in each of the processes, a flow rate control step of: repeating a pulse shot of causing the first shutoff valve to open and close and, after that, causing the second shutoff valve to open and close; calculating a volume flow rate of gas exhausted from the gas filling capacity based on a pressure after filling measured by use of the pressure sensor after the first shutoff valve is opened and closed to fill gas into the gas filling capacity and a pressure after discharge measured by use of the pressure sensor after the second shutoff valve is opened and closed to discharge gas from the gas filling capacity; and changing a manner of repeating the pulse shot to regulate the volume flow rate to the target flow rate; an optimal pressure storage step of storing, as an optimal pressure, the pressure after filling measured by the pressure sensor when the pulse shot that regulates the volume flow rate to the target flow rate is performed in the flow rate control step; and before a first pulse shot is performed in a subsequent process to a process in which the optimal pressure storage processing is executed, a pressure control step of regulating the pressure in the gas filling capacity to the optimal pressure stored in the optimal pressure storage step. 9. A program installed in a controller for controlling operations of a pulse shot-type flow rate control device comprising: a first shutoff valve connected to a gas source; a second shutoff valve connected to the first shutoff valve; a gas filling capacity between the first shutoff valve and the second shutoff valve; and a pressure sensor for measuring a pressure in the gas filling capacity, wherein when the flow rate control device performs two or more processes for controlling gas to a target flow rate, the program causes the controller, in each of the processes, to execute: a flow rate control processing of: repeating a pulse shot of causing the first shutoff valve to open and close and, after that, causing the second shutoff valve to open and close; calculating a volume flow rate of gas exhausted from the gas filling capacity based on a pressure after filling measured by use of the pressure sensor after the first shutoff valve is opened and closed to fill gas into the gas filling capacity and a pressure after discharge measured by use of the pressure sensor after the second shutoff valve is opened and closed to discharge gas from the gas filling capacity; and changing a manner of repeating the pulse shot to regulate the volume flow rate to the target flow rate, and the program causes the controller to execute: an optimal pressure storage processing of storing, as an optimal pressure, the pressure after filling measured by the pressure sensor when the pulse shot that r

Assignees

Inventors

Classifications

  • G05D7/0647Primary

    the plurality of throttling means being arranged in series · CPC title

  • G01F3/38Primary

    having only one measuring chamber · CPC title

  • Valves (valves in general F16K) · CPC title

  • characterised by the use of electric means {(G05D7/005 takes precedence)} · CPC title

  • G05D7/0635Primary

    by action on throttling means (G05D7/0688, G05D7/0694 take precedence) · CPC title

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What does patent US11829167B2 cover?
A pulse shot-type flow rate control device including first and second shutoff valves, a tank, a pressure sensor, and a controller is caused to perform two or more processes. In each process, the controller repeats pulse shots of alternately causing the first shutoff valve and the second shutoff valve to open and close, changes a way of the pulse shots based on a pressure difference between the …
Who is the assignee on this patent?
Ckd Corp
What technology area does this patent fall under?
Primary CPC classification G05D7/0647. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Nov 28 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 10 related publications on this page (citations in our corpus or others sharing the same primary CPC).