Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same

US10679880B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10679880-B2
Application numberUS-201715717562-A
CountryUS
Kind codeB2
Filing dateSep 27, 2017
Priority dateSep 27, 2016
Publication dateJun 9, 2020
Grant dateJun 9, 2020

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. In one embodiment, a method of achieving improved transient response in apparatuses for controlling gas flow is disclosed. Specifically, by providing a command to the apparatus to deliver a predetermined mass flow rate at a future turn on time, the apparatus is able to pre-pressurize a P1 volume so that the response time of the apparatus is no longer dependent on the speed of the apparatus's control valves and the limitations of the control loop.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of delivering a gas at a predetermined flow rate, the method comprising: a) providing a gas flow control apparatus comprising: a gas flow path extending from a gas inlet to a gas outlet; a proportional valve operably coupled to the gas flow path; an on/off valve operably coupled to the gas flow path downstream of the proportional valve, a volume of the gas flow path being defined between the proportional valve and the on/off valve; and a flow restrictor having a flow impedance located downstream of the proportional valve; b) pressurizing the volume with the gas to a target pre-flow pressure by opening the proportional valve while the on/off valve is in an off-state, the target pre-flow pressure selected, in view of the flow impedance of the flow restrictor, to achieve the predetermined flow rate; and c) opening the on/off valve by moving the on/off valve to an on-state, thereby delivering the gas to the gas outlet at the predetermined flow rate; wherein a delivered flow rate of gas from the gas outlet stabilizes within 2% of the predetermined flow rate within 100 milliseconds after step c). 2. The method according to claim 1 , further comprising a controller, the controller generating a gas flow activation signal at a first time prior to step b), the gas flow activation signal comprising data instructing the controller to open the on/off valve upon receipt of a trigger signal, step c) occurring at a turn on time in response to the trigger signal. 3. The method according to claim 1 , wherein after step b) and prior to step c), the volume is pressurized to the target pre-flow pressure and the proportional valve is closed. 4. The method according to claim 1 , wherein step c) occurs as soon as the volume reaches the target pre-flow pressure. 5. The method according to claim 4 , wherein the proportional valve has a flow rate substantially equal to the predetermined flow rate when step c) occurs. 6. The method according to claim 1 , wherein the gas flow control apparatus further comprises a bleed valve and a bleed outlet, the bleed valve configured to vent gas from the volume to the bleed outlet when the bleed valve is in an on state and wherein the bleed valve is transitioned to an on state during step b). 7. The method according to claim 6 , wherein the proportional valve has a flow rate substantially equal to the predetermined flow rate when step c) occurs. 8. The method according to claim 1 , wherein step b) further comprises pressurizing the volume with the gas such that a pressure within the volume rises linearly. 9. The method according to claim 1 , wherein in step b), a pressure within the volume increases according to a pressurization profile, the pressurization profile being different for a plurality of different predetermined flow rates. 10. A method of delivering a gas at a predetermined flow rate, the method comprising: a) providing a gas flow control apparatus comprising: a gas flow path extending from a gas inlet to a gas outlet; a proportional valve operably coupled to the gas flow path; an on/off valve operably coupled to the gas flow path downstream of the proportional valve, a volume of the gas flow path being defined between the proportional valve and the on/off valve; and a flow restrictor having a flow impedance located downstream of the proportional valve; b) pressurizing the volume with the gas to a target pre-flow pressure by opening the proportional valve while the on/off valve is in an off-state, the target pre-flow pressure selected, in view of the flow impedance of the flow restrictor, to achieve the predetermined flow rate; and c) opening the on/off valve by moving the on/off valve to an on-state, thereby delivering the gas to the gas outlet at the predetermined flow rate; wherein the gas flow control apparatus further comprises a controller, the controller generating a gas flow activation signal at a first time prior to step b), the gas flow activation signal comprising data identifying a turn on time, step c) occurring at the turn on time. 11. The method according to claim 10 , wherein the controller comprises an apparatus controller and a system controller, the system controller transmitting the gas flow activation signal to the apparatus controller. 12. The method according to claim 10 , wherein the gas flow activation signal further comprises data identifying the predetermined flow rate. 13. A method of delivering a gas at a predetermined flow rate, the method comprising: a) generating, with a controller, a gas flow activation signal at a first time that comprises data identifying a second time at which the gas is to be delivered from a gas outlet of a gas flow path at the predetermined flow rate, the first time being prior to the second time and a priming period being defined between the first and second times; b) upon receipt of the gas flow activation signal, the controller adjusting one or more components of a gas flow control apparatus to achieve a primed condition of the gas in a volume of the gas flow path during the priming period, the primed condition selected to achieve the predetermined flow rate, the gas being prohibited from exiting the gas outlet of the gas flow path during the priming period; and c) delivering the gas from the volume at the second time via the gas outlet of the gas flow path. 14. The method according to claim 13 , wherein a delivered flow rate of gas from the gas outlet stabilizes within 2% of the predetermined flow rate within 100 milliseconds after step c). 15. The method according to claim 13 , wherein the controller comprises an apparatus controller and a system controller, the system controller transmitting the gas flow activation signal to the apparatus controller.

Assignees

Inventors

Classifications

  • Electricity · mapped topic

  • Electricity · mapped topic

  • Flow or presssure regulators, i.e. non-electric unitary devices comprising a sensing element, e.g. a piston or a membrane, and a controlling element, e.g. a valve · CPC title

  • Electromagnetically actuated valves · CPC title

  • Lift valves {or globe valves}, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces ({in combination with sliding valves F16K3/246, F16K3/267} ; diaphragm valves F16K7/00) · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10679880B2 cover?
Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. In one embodiment, a method of achieving improved transient response in apparatuses for controlling gas flow is disclosed. Specifically, by providing a command to the apparatus to deliver a predetermined mass flow rate at a future turn on time, the apparatus is able to pre-p…
Who is the assignee on this patent?
Reno Tech Inc, Ichor Systems Inc
What technology area does this patent fall under?
Primary CPC classification H01L21/67253. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 09 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).