Charged particle beam device

US11798780B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11798780-B2
Application numberUS-202117563186-A
CountryUS
Kind codeB2
Filing dateDec 28, 2021
Priority dateSep 26, 2013
Publication dateOct 24, 2023
Grant dateOct 24, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

First claim

Opening claim text (preview).

The invention claimed is: 1. A charged particle beam device, comprising: a deflector configured to scan a sample with a charged particle beam emitted from a charged particle source; and a control device configured to control the deflector; wherein the control device controls the deflector to scan with the charged particle beam a measurement portion in a field of view designated in the sample, extracts the measurement portion based on a measurement target pattern extracted from design data of the sample, the measurement target pattern including a field of view position for each combination of a plurality of scan speed conditions and a plurality of irradiation point interval conditions, and evaluates a state of the measurement portion based on a signal obtained by scanning the sample with the charged particle beam. 2. The charged particle beam device according to claim 1 , wherein the control device determines a size of a region of interest and a position of the region of interest according to an input by an operator. 3. A method for controlling a charged particle beam device, the method comprising: scanning, by a deflector, a sample with a charged particle beam emitted from a charged particle source; controlling the deflector to scan with the charged particle beam a measurement portion in a field of view designated in the sample; extracting the measurement portion based on a measurement target pattern extracted from design data of the sample, the measurement target pattern including a field of view position for each combination of a plurality of scan speed conditions and a plurality of irradiation point interval conditions; and evaluating a state of the measurement portion based on a signal obtained by scanning the sample with the charged particle beam. 4. The method according to claim 3 , further comprising: determining a size of a region of interest and a position of the region of interest according to an input by an operator. 5. A charged particle beam device, comprising: a deflector configured to scan a sample with a charged particle beam emitted from a charged particle source; and a control device configured to control the deflector; wherein the control device controls the deflector to scan with the charged particle beam a measurement portion in a field of view designated in the sample, extracts the measurement portion and the field of view based on design data of the sample, controls the deflector to scan the field of view with the charged particle beam, and evaluates a state of the measurement portion based on a signal obtained by the scan of the sample with the charged particle beam.

Assignees

Inventors

Classifications

  • H01J37/28Primary

    with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

  • Arrangements for directing or deflecting the discharge along a desired path ({H01J37/045 take precedence;} lenses H01J37/10) · CPC title

  • Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title

  • Optical {, image processing} or photographic arrangements associated with the tube · CPC title

  • characterised by the imaging method · CPC title

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What does patent US11798780B2 cover?
The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation p…
Who is the assignee on this patent?
Hitachi High Tech Corp
What technology area does this patent fall under?
Primary CPC classification H01J37/28. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 24 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).