Charged particle beam device

US10249474B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10249474-B2
Application numberUS-201715618203-A
CountryUS
Kind codeB2
Filing dateJun 9, 2017
Priority dateSep 26, 2013
Publication dateApr 2, 2019
Grant dateApr 2, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

First claim

Opening claim text (preview).

The invention claimed is: 1. A charged particle beam device, comprising: a deflector which scans a sample with a charged particle beam emitted from a charged particle source; an image memory which stores signals obtained by a scan of the charged particle beam for the sample; and a control device which controls the deflector, wherein the control device controls the deflector so that scan for sequentially irradiating the charged particle beam for generating an image at a sample position corresponding to each pixel of the image stored in the image memory is performed so that an interval between individual pixels is changed, thereby generating a plurality of images corresponding to a changed interval between the individual pixels, and thus determines a deflection condition of the deflector based on evaluation of the plurality of images. 2. The charged particle beam device according to claim 1 , wherein the control device controls the deflector so that scan of the charged particle beam between each of sample positions to be irradiated with the charged particle beam for generating the image is performed faster compared with when the charged particle beam irradiates each of the sample positions to be irradiated with the charged particle beam for generating the image. 3. The charged particle beam device according to claim 1 , wherein the control device determines the deflection condition based on index values obtained from the plurality of images. 4. The charged particle beam device according to claim 3 , wherein the control device determines the deflection condition based on at least one evaluation selected from signal amounts of the images, a contrast ratio, a contrast to noise ratio, or a shrinkage amount of a pattern. 5. The charged particle beam device according to claim 1 , wherein the control device generates the plurality of images by changing, for a scan region in a predetermined range, an interval between individual sample positions to be irradiated with the charged particle beam for generating the image. 6. The charged particle beam device according to claim 1 , wherein the control device divides the image into a plurality of blocks corresponding to an interval between the individual pixels, and controls the deflector so that the charged particle beam sequentially irradiates corresponding positions in the divided blocks. 7. The charged particle beam device according to claim 6 , wherein the control device changes the interval between the individual pixels by changing sizes of the blocks. 8. The charged particle beam device according to claim 1 , wherein the control device controls the deflector so that, when a region of interest (ROI) set in the image is scanned with the charged particle beam, scan of the charged particle beam is performed at such an irradiation point interval between the individual pixels becomes relatively smaller in comparison with that in a region outside the ROI. 9. An image generating method for generating an image using a signal obtained by scanning a sample with a charged particle beam emitted from a charged particle source, comprising: deflecting the charged particle beam so that scan of the charged particle beam for generating an image at a sample position corresponding to each pixel of the image is performed while an interval between individual pixels is changed, thereby generating a plurality of images corresponding to the changed interval between the individual pixels, and thus determining a deflection condition for deflecting the charged particle beam based on evaluation of the plurality of generated images. 10. The image generating method according to claim 9 , wherein scan of the charged particle beam between each of the sample positions to be irradiated with the charged particle beam for generating the image is performed faster compared with when the charged particle beam irradiates each of the sample positions to be irradiated with the charged particle beam for generating the image.

Assignees

Inventors

Classifications

  • Calibration · CPC title

  • Arrangements for directing or deflecting the discharge along a desired path ({H01J37/045 take precedence;} lenses H01J37/10) · CPC title

  • Deflection calibration · CPC title

  • Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title

  • Pattern inspection · CPC title

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What does patent US10249474B2 cover?
The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation p…
Who is the assignee on this patent?
Hitachi High Tech Corp
What technology area does this patent fall under?
Primary CPC classification H01J37/28. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 02 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).