Charged particle beam apparatus

Patent metadata

Field	Value
Publication number	US-11791124-B2
Application number	US-202117230650-A
Country	US
Kind code	B2
Filing date	Apr 14, 2021
Priority date	Mar 11, 2019
Publication date	Oct 17, 2023
Grant date	Oct 17, 2023

Abstract

An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens ( 7 ) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector ( 5 and 6 ) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit ( 3 and 4 ) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

First claim

The invention claimed is:

1. A method of positioning a visual field at a desired position on a specimen by using a visual field movement deflector that changes an arrival position of a beam emitted from a charged particle source, the method comprising:
deflecting the beam to a desired arrival position by using the visual field movement deflector;
adjusting a deflection condition of the visual field movement deflector so as to cancel an inclination of an incident beam when the beam is deflected to the desired arrival position;
and,
obtaining an amount of off-axis chromatic aberration generated according to an amount of visual field movement by the visual field movement deflector and an amount of off-axis chromatic aberration generated by setting the deflection condition of the visual field movement deflector so as to cancel the inclination of the incident beam, and adjusting an aberration correction unit disposed between the charged particle source and the visual field movement deflector so as to generate an amount of off-axis chromatic aberration that cancels the off-axis chromatic aberrations by the visual field movement deflector.

2. A charged particle beam apparatus comprising:
an objective lens configured to focus a beam emitted from a charged particle source and irradiate a specimen;
a visual field movement deflector configured to deflect an arrival position of the beam with respect to the specimen;
an aberration correction unit disposed between the visual field movement deflector and the charged particle source; and
a control device configured to control the visual field movement deflector and the aberration correction unit,
wherein the control device is configured to
deflect the beam to a desired arrival position by using the visual field movement deflector,
adjust a deflection condition of the visual field movement deflector so as to cancel an inclination of an incident beam when the beam is deflected to the desired arrival position,
obtain an amount of off-axis chromatic aberration generated according to an amount of visual field movement by the visual field movement deflector and an amount of off-axis chromatic aberration generated by setting the deflection condition of the visual field movement deflector so as to cancel the inclination of the incident beam, and
adjust the aberration correction unit so as to generate an amount of off-axis chromatic aberration that cancels the off-axis chromatic aberrations by the visual field movement deflector.

3. A charged particle beam apparatus comprising:
an objective lens configured to focus a beam emitted from a charged particle source and irradiate a specimen; and
a first lens disposed between the objective lens and the charged particle source;
a second lens;
a first deflector and a second deflector that deflect a beam passing through each lens; and
a control device configured to control the first lens, the second lens, the first deflector, and the second deflector,
wherein the control device is configured to generate off-axis chromatic aberration and off-axis coma aberration having the same amount as off-axis chromatic aberration and off-axis coma aberration generated by the objective lens, in a direction opposite to the off-axis chromatic aberration and off-axis coma aberration generated by the objective lens, in the first lens and the second lens by controlling the first deflector and the second deflector.

Assignees

• Hitachi High Tech Corp

Inventors

• Kawamoto Yuta
• Ikegami Akira
• Ebizuka Yasushi
• Fujinaga Nobuo

Classifications

• H01J37/153 Primary

  Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators · CPC title

• H01J37/10

  Lenses · CPC title

• H01J37/1472

  Deflecting along given lines · CPC title

• H01J2237/0473

  accelerating · CPC title

• H01J2237/1534

  Aberrations · CPC title