Cleaning method, method of manufacturing semiconductor device, and substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-11788188-B2
Application number	US-202016999345-A
Country	US
Kind code	B2
Filing date	Aug 21, 2020
Priority date	Feb 23, 2018
Publication date	Oct 17, 2023
Grant date	Oct 17, 2023

Abstract

There is provided a technique that includes: removing a deposit adhering to an inside of a process container by supplying a cleaning gas into the process container after performing a process of forming a film on a substrate in the process container, wherein the act of removing the deposit includes sequentially and repeatedly performing: a first process of supplying the cleaning gas into the process container until a predetermined first pressure is reached in the process container; a second process of stopping the supply of the cleaning gas and exhausting the cleaning gas and a reaction product generated by the cleaning gas remaining in the process container; and a third process of cooling an exhaust pipe that connects the process container and a vacuum pump, while maintaining a pressure inside the process container at a second pressure, which is lower than the first pressure, or lower.

First claim

What is claimed is:

1. A cleaning method, comprising:
removing a deposit adhering to an inside of a process container by supplying a cleaning gas into the process container after performing a process of forming a film on a substrate in the process container,
wherein the removing the deposit includes sequentially and repeatedly performing:
a first process of supplying the cleaning gas into the process container until a predetermined first pressure is reached in the process container;
a second process of stopping the supplying the cleaning gas and exhausting the cleaning gas and a reaction product generated by the cleaning gas remaining in the process container; and
a third process of cooling an exhaust pipe that connects the process container and a vacuum pump, while maintaining a pressure inside the process container at a second pressure, which is lower than the first pressure, or lower,

wherein the third process continuously performs the cooling the exhaust pipe until a temperature of the exhaust pipe becomes equal to or lower than a first temperature, when the temperature of the exhaust pipe at a time defined based on transition from the second process to the third process is higher than a second temperature that is higher than the first temperature,
wherein the third process terminates the cooling the exhaust pipe at a predetermined time when the temperature of the exhaust pipe at the time defined based on the transition is equal to or lower than the second temperature,
wherein the first process includes an operation of exhausting the cleaning gas with the vacuum pump to maintain the first pressure while continuing to supply the cleaning gas at a constant flow rate,
wherein the third process measures the temperature of the exhaust pipe by using a temperature detector installed at the exhaust pipe,
wherein the first process and the third process perform a pressure adjustment by using a pressure regulator installed at the exhaust pipe, and
wherein the process container includes:
a cylindrical portion having a closed upper end portion and an opened lower end portion;
a gas supply area formed outside one side wall of the cylindrical portion and connected to a gas supply system configured to supply the cleaning gas; and
a gas exhaust area formed outside the other side wall of the cylindrical portion facing the gas supply area and connected to an exhaust system configured to exhaust an atmosphere in the process container.

2. The cleaning method of claim 1 , wherein the second temperature is a temperature lower than a temperature at which the exhaust pipe is corroded.

3. The cleaning method of claim 1 , wherein in the third process, the exhaust pipe is naturally cooled, or the exhaust pipe is forcibly cooled by supplying an inert gas into the exhaust pipe.

4. The cleaning method of claim 1 , wherein the cleaning gas is a mixed gas of a fluorine gas and a nitric oxide gas, and
wherein the deposit is a silicon oxycarbonitride film.

5. The cleaning method of claim 2 , wherein in the third process, the exhaust pipe is naturally cooled, or the exhaust pipe is forcibly cooled by supplying an inert gas into the exhaust pipe.

6. The cleaning method of claim 1 , wherein the cleaning gas is a mixed gas of a fluorine gas and a nitric oxide gas, and
wherein the deposit is a silicon oxycarbonitride film.

Assignees

• Kokusai Electric Corp

Inventors

• Miyashita Naoya
• Kuribayashi Koei
• Taniyama Tomoshi

Classifications

• H10P14/6922

  the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P14/6339

  deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD · CPC title

• H10P14/6682

  the compound being a silane, e.g. disilane, methylsilane or chlorosilane · CPC title

• H10P72/0434 Primary

  mainly by convection · CPC title