Image sensor for immersion lithography

Patent metadata

Field	Value
Publication number	US-11774868-B2
Application number	US-202017600631-A
Country	US
Kind code	B2
Filing date	Apr 7, 2020
Priority date	Apr 16, 2019
Publication date	Oct 3, 2023
Grant date	Oct 3, 2023

Abstract

An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.

First claim

The invention claimed is:

1. An image sensor for immersion lithography, the image sensor comprising:
a grating comprising protrusions;
an absorber layer on the grating, the absorber layer configured to absorb radiation; and
a liquidphobic coating at an upper surface of the image sensor;
a protective layer between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid, and
wherein the protective layer has a first thickness perpendicular to a top of the protrusions and a second thickness perpendicular to a side of the protrusions, the first thickness being at least half and at most twice the second thickness.

2. The image sensor of claim 1 , wherein the protective layer is formed of an oxide.

3. The image sensor of claim 1 , wherein the protective layer is formed of an inorganic material.

4. The image sensor of claim 1 , wherein the protective layer is formed of SiO 2 .

5. The image sensor of claim 1 , wherein the protective layer is optically at least semi-transparent.

6. The image sensor of claim 1 , wherein the protective layer comprises a denser sub-layer closer to the absorber layer and a more granular sub-layer closer to the liquidphobic coating.

7. The image sensor of claim 1 , further comprising an adhesion promoter between the protective layer and the liquidphobic coating.

8. A substrate table for immersion lithography, the substrate table comprising the image sensor of claim 1 mounted on it.

9. A lithographic apparatus comprising:
the substrate table of claim 8 ;
a projection system configured to project a pattern from a patterning device onto a substrate held by the substrate table; and
a liquid supply system configured to provide an immersion liquid to a space between the projection system and the substrate.

10. An image sensor for immersion lithography, the image sensor comprising:
a grating;
an absorber layer on the grating, the absorber layer configured to absorb radiation; and
a liquidphobic coating at an upper surface of the image sensor;
a protective layer between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid and the protective layer comprising a denser sub-layer closer to the absorber layer and a more granular sub-layer closer to the liquidphobic coating.

11. The image sensor of claim 10 , wherein the protective layer is formed of an oxide.

12. The image sensor of claim 10 , wherein the protective layer is formed of an inorganic material.

13. The image sensor of claim 10 , further comprising an adhesion promoter between the protective layer and the liquidphobic coating.

14. A substrate table for immersion lithography, the substrate table comprising the image sensor of claim 10 mounted on it.

15. A lithographic apparatus comprising:
the substrate table of claim 14 ;
a projection system configured to project a pattern from a patterning device onto a substrate held by the substrate table; and
a liquid supply system configured to provide an immersion liquid to a space between the projection system and the substrate.

16. An image sensor for immersion lithography, the image sensor comprising:
a grating;
an absorber layer on the grating, the absorber layer configured to absorb radiation; and
a liquidphobic coating at an upper surface of the image sensor;
a protective layer between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid,
wherein there is an adhesion promoter between the protective layer and the liquidphobic coating and/or the liquidphobic coating comprises a more adhesive sub-layer of the liquidphobic coating closer to the protective layer and a less adhesive sub-layer of the liquidphobic coating further away from the protective layer.

17. The image sensor of claim 16 , comprising the more adhesive sub-layer of the liquidphobic coating closer to the protective layer and the less adhesive sub-layer of the liquidphobic coating further away from the protective layer.

18. The image sensor of claim 16 , wherein the grating comprises protrusions and wherein the protective layer has a first thickness perpendicular to a top of the protrusions and a second thickness perpendicular to a side of the protrusions, wherein the first thickness is at least half and at most twice the second thickness.

19. A substrate table for immersion lithography, the substrate table comprising the image sensor of claim 16 mounted on it.

20. A lithographic apparatus comprising:
the substrate table of claim 19 ;
a projection system configured to project a pattern from a patterning device onto a substrate held by the substrate table; and
a liquid supply system configured to provide an immersion liquid to a space between the projection system and the substrate.

Assignees

• Asml Netherlands Bv

Inventors

• Banerjee Nirupam
• Beckers Johan Franciscus Maria
• Brakhage Peter
• Donkerbroek Arend Johannes
• Grimm Daniel
• Rathje Tim
• Tilke Martin
• Wricke Sandro

Classifications

• G03F7/7085 Primary

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• C23C14/34

  Sputtering · CPC title

• C23C14/5826

  Treatment with charged particles (C23C14/582 takes precedence) · CPC title

• C23C16/45525

  Atomic layer deposition [ALD] · CPC title

• G03F7/70341 Primary

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title