Substrate treating apparatus

Patent metadata

Field	Value
Publication number	US-11765793-B2
Application number	US-202016932286-A
Country	US
Kind code	B2
Filing date	Jul 17, 2020
Priority date	Jul 18, 2019
Publication date	Sep 19, 2023
Grant date	Sep 19, 2023

Abstract

An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a liquid supply unit for supplying treating liquid to the substrate supported on the support unit, and a heating unit disposed in the support unit for heating the substrate supported on the support unit, wherein the heating unit includes a plurality of lamps to heat the substrate, and a window disposed above the lamps to transmit light emitted from the lamps, wherein the window includes a base in a form of a plate, and light adjustment means formed on the base to spread or converge light emitted from the lamps.

First claim

What is claimed is:

1. An apparatus for treating a substrate, the apparatus comprising:
a process chamber having a treatment space defined therein;
a support unit for supporting the substrate in the treatment space;
a liquid supply unit for supplying treating liquid to the substrate supported on the support unit; and
a plurality of lamps disposed in the support unit for heating the substrate supported on the support unit,
wherein the support unit includes:
a rotatable chuck stage disposed below the lamps to rotate the substrate; and
a window disposed above the lamps to transmit light emitted from the lamps, wherein the window includes:
a base in a form of a plate; and
a light adjuster formed on the base to adjust a direction or an amount of light emitted from the lamps, and

wherein the rotatable chuck stage and the window are disposed on opposing sides of the lamps.

2. The apparatus of claim 1 , wherein the light adjuster includes an edge convex portion protruding from the base, wherein a position of the edge convex portion corresponds to an edge region of the substrate placed on the support unit.

3. The apparatus of claim 1 , wherein the light adjuster includes a central convex portion protruding from the base, wherein a position of the central convex portion corresponds to a central region of the substrate placed on the support unit.

4. The apparatus of claim 1 , wherein the light adjuster includes:
an edge convex portion protruding from the base, wherein a position of the edge convex portion corresponds to an edge region of the substrate placed on the support unit; and
a central convex portion protruding from the base, wherein a position of the central convex portion corresponds to a central region of the substrate placed on the support unit.

5. The apparatus of claim 1 , wherein the support unit includes:
a support pin extending from a top surface of the window to a bottom surface of the substrate; and
a chuck pin extending from a top surface of the rotatable chuck stage to a side surface of the substrate, and
wherein the support pin is installed on the base of the window away from the light adjuster.

6. The apparatus of claim 2 , wherein the edge convex portion has an inward portion and an outward portion, wherein the inward portion has a top inclined face having a smaller inclination than an inclination of a top inclined face of the outward portion.

7. The apparatus of claim 2 , wherein the edge convex portion extends in a ring shape.

8. The apparatus of claim 4 , wherein a width of the central convex portion is larger than a width of the edge convex portion.

9. The apparatus of claim 4 , wherein a region of the window between the edge convex portion and the central convex portion is flat.

10. The apparatus of claim 4 , wherein the light adjuster further includes a concave portion recessed in the base, wherein the concave portion is disposed between the edge convex portion and the central convex portion to spread light emitted from the lamps.

11. The apparatus of claim 1 , wherein an outermost lamp among the lamps is located inwardly of an end of the substrate placed on the support unit when viewed from above.

12. The apparatus of claim 1 , wherein the light adjuster is formed on a top surface of the window.

13. The apparatus of claim 1 , wherein the light adjuster is formed on a bottom surface of the window.

14. The apparatus of claim 1 , wherein each of the lamps extends in a ring shape, and the lamps are concentric with each other.

15. The apparatus of claim 1 , wherein the base and the light adjuster are integrally formed with each other.

16. The apparatus of claim 1 , wherein the treating liquid includes phosphoric acid.

17. The apparatus of claim 1 , wherein the window is made of quartz.

18. An apparatus for treating a substrate, the apparatus comprising:
a support member for supporting the substrate;
a lamp for heating the substrate placed on the support member; and
a window placed between the lamp and the substrate placed on the support member to transmit light emitted from the lamp,
wherein the window includes:
a base in a form of a plate; and
a light adjuster formed on the base to converge or spread light emitted from the lamp,

wherein the support member includes a rotatable chuck stage disposed below the lamp to rotate the substrate, and
wherein the rotatable chuck stage and the window are disposed on opposing sides of the lamp.

19. The apparatus of claim 18 , wherein the light adjuster includes:
an edge convex portion protruding from the base, wherein a position of the edge convex portion corresponds to an edge region of the substrate placed on the support member; and
a central convex portion protruding from the base, wherein a position of the central convex portion corresponds to a central region of the substrate placed on the support unit.

20. The apparatus of claim 19 , wherein a region of the window between the edge convex portion and the central convex portion is flat.

Assignees

• Semes Co Ltd

Inventors

• Lee Muhyeon
• Park Gui Su
• Bang Byungsun
• Choi Jungbong
• Lee Youngil
• Yun Kangseop
• Na Seung Eun
• Choi Ye Jin
• Kim Kyounghwan

Classifications

• H10P72/0436 Primary

  mainly by radiation · CPC title

• H10P72/00

  Handling or holding of wafers, substrates or devices during manufacture or treatment thereof · CPC title

• H10P72/7604

  the wafers being placed on a susceptor, stage or support · CPC title

• H10P72/0424

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/70

  for supporting or gripping · CPC title