Fluid droplet methodology and apparatus for imprint lithography

US11762295B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11762295-B2
Application numberUS-202017082803-A
CountryUS
Kind codeB2
Filing dateOct 28, 2020
Priority dateOct 28, 2020
Publication dateSep 19, 2023
Grant dateSep 19, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate, during a first pass, dispensing the formable material along a stitch line to form a first part of the fluid droplet pattern for an imprint field, where the stitch line runs from a first corner to a second corner of the imprint field. The method can also include offsetting the substrate and the fluid dispense ports relative to each other after dispensing the formable material during the first pass, and during a second pass, dispensing the formable material along the stitch line onto the substrate to form a second part of the fluid droplet pattern for the imprint field. An apparatus can be configured to carry out the method.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of generating a fluid droplet pattern on a substrate, the method comprising: providing a fluid dispense system having fluid dispense ports; determining a fluid droplet pattern of an imprint field for dispensing a formable material onto a substrate; during a first pass, dispensing the formable material onto the substrate along a stitch line to form a first part of the fluid droplet pattern for an imprint field, wherein the substrate and the fluid dispense ports move relative to each other in a translating direction, wherein the stitch line is a diagonal line that runs from a first corner to a second corner of the imprint field, and wherein the first corner and the second corner are on opposite sides of a congruent side of the imprint field; offsetting the substrate and the fluid dispense ports relative to each other in the translating direction and another direction, wherein offsetting the substrate and the fluid dispense ports relative to each other is performed after dispensing the formable material during the first pass; and during a second pass, dispensing the formable material along the stitch line onto the substrate to form a second part of the fluid droplet pattern for the imprint field, wherein dispensing the formable material during the second pass is performed after offsetting the substrate and the fluid dispense ports relative to each other. 2. The method of claim 1 , wherein the first corner and the second corner are on opposite sides of a diagonal of the imprint field. 3. The method of claim 1 , wherein the stitch line comprises more than one segment. 4. The method of claim 3 , wherein the stitch line comprises a horizontal segment. 5. The method of claim 3 , wherein stitch line comprises a vertical segment. 6. The method of claim 1 , wherein determining a substrate fluid drop pattern is for the imprint field. 7. The method of claim 1 , wherein dispensing the formable material onto the substrate field along a stitch line to form the first part of the fluid droplet pattern for the imprint field comprises starting to dispense formable material at a first edge of the field and ending at the stitch line. 8. The method of claim 1 , wherein dispensing the formable material onto the substrate along a stitch line to form the first part of the fluid droplet pattern for the imprint field comprises starting to dispense formable material at the stitch line and ending at a first edge of the imprint field. 9. The method of claim 8 , wherein dispensing the formable material onto the substrate along a stitch line to form the second part of the fluid droplet pattern for the imprint field comprises starting to dispense formable material at the stitch line and ending at a second edge of the imprint field, wherein the first edge is opposite the second edge. 10. The method of claim 9 , wherein dispensing the formable material onto the substrate along a stitch line to form the first part of the fluid droplet pattern for the imprint field comprises forming at least two rows of fluid droplets, wherein each row of fluid droplets has a different number of fluid droplets than the row either above or below it. 11. The method of claim 10 , wherein after dispensing the formable material onto the substrate along a stitch line to form the second part of the fluid droplet pattern for the imprint field, each of the at least two rows has substantially the same number of fluid droplets. 12. A method of manufacturing an article, the method comprising: providing a fluid dispense system having fluid dispense ports; determining a fluid droplet pattern of the imprint field for dispensing a formable material onto a substrate; during a first pass, dispensing the formable material onto the substrate along a stitch line to form a first part of the fluid droplet pattern for an imprint field, wherein the substrate and the fluid dispense ports move relative to each other in a translating direction, wherein the stitch line is a diagonal line that runs from a first corner to a second corner of the imprint field, and wherein the first corner and the second corner are on opposite sides of a congruent side of the imprint field; offsetting the substrate and the fluid dispense ports relative to each other in the translating direction and another direction, wherein offsetting the substrate and the fluid dispense ports relative to each other is performed after dispensing the formable material during the first pass; during a second pass, dispensing the formable material along the stitch line onto the substrate to form a second part of the fluid droplet pattern for the imprint field, wherein dispensing the formable material during the second pass is performed after offsetting the substrate and the fluid dispense ports relative to each other; contacting the formable material with a template having a surface; curing the formable material to form a layer corresponding to the surface of the template; forming a pattern on the substrate by the cured material on the substrate; processing the substrate on which the pattern has been formed; and manufacturing the article from the processed substrate.

Assignees

Inventors

Classifications

  • G03F7/0002Primary

    Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

  • G03F7/2012Primary

    using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps · CPC title

  • Patterns of chemical products used for a specific purpose, e.g. pesticides, perfumes, adhesive patterns; use of microencapsulated material; Printing on smoking articles · CPC title

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What does patent US11762295B2 cover?
A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate, during a first pass, dispensing the formable material along a stitch line to form a first part of the fluid droplet pattern for an imp…
Who is the assignee on this patent?
Canon Kk
What technology area does this patent fall under?
Primary CPC classification G03F7/0002. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Sep 19 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).