Conductive laminate and method for manufacturing the same

US11745469B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11745469-B2
Application numberUS-202217719551-A
CountryUS
Kind codeB2
Filing dateApr 13, 2022
Priority dateSep 28, 2018
Publication dateSep 5, 2023
Grant dateSep 5, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for manufacturing a conductive laminate and a conductive laminate are provided. The method for manufacturing the conductive laminate includes steps of: providing a substrate having a surface; immersing the substrate into a modifying solution including a silane with a hydrophilic group to form a discontinuous modified layer on the surface of the substrate; forming a barrier layer on the surface of the substrate and the discontinuous modified layer, and forming a conductive layer on a surface of the barrier layer. The barrier layer includes a polymer, and the polymer is selected from the group consisting of: polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acid, polyethylene glycol, and any combination thereof.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for manufacturing a conductive laminate, comprising: providing a substrate having a surface; immersing the substrate into a modifying solution including a silane with a hydrophilic group to form a discontinuous modified layer on the surface of the substrate; forming a barrier layer on the surface of the substrate and the discontinuous modified layer, wherein the barrier layer including a polymer, and the polymer is selected from the group consisting of: polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acid, polyethylene glycol, and any combination thereof; and forming a conductive layer on a surface of the barrier layer. 2. The method according to claim 1 , wherein the silane includes an amino group. 3. The method according to claim 2 , wherein an amount of the silane in the modification solution ranges from 0.1 volume percent to 5 volume percent. 4. The method according to claim 2 , wherein the silane is selected from the group consisting of (3-aminopropyl)triethoxysilane, N-(3-(trimethoxysilyl)propyl)ethylenediamine, 3-2-(2-aminoethylamino)ethylamino propyl trimethoxysilane, and any combination thereof. 5. The method according to claim 1 , wherein a polymer solution to form the barrier layer further includes a catalytic material that is encapsulated in the polymer. 6. The method according to claim 5 , wherein a weight ratio of the polymer to the catalytic material ranges from 0.175:1 to 2:1. 7. The method according to claim 5 , wherein the catalytic material includes a plurality of metallic nanoparticles. 8. The method according to claim 7 , wherein the plurality of metallic nanoparticles includes palladium nanoparticles. 9. The method according to claim 1 , wherein a modifying time required for the step of immersing the substrate into the modifying solution is less than 30 minutes. 10. The method according to claim 1 , wherein a modifying time required for the step of immersing the substrate into the modifying solution is equal to or less than 5 minutes. 11. The method according to claim 1 , wherein, before the step of immersing the substrate into a modifying solution, the method further comprises immersing the substrate into a pretreating solution selected from the group consisting of isopropanol, toluene, acetone, ethanol, and any combination thereof. 12. The method according to claim 11 , wherein the pretreating solution and the modifying solution includes a same component. 13. The method according to claim 12 , wherein the same component is isopropanol. 14. A conductive laminate, comprising: a substrate having a surface; a diffusion barrier structure disposed on the substrate, the diffusion barrier structure including a discontinuous modified layer and a barrier layer, wherein the discontinuous modified layer is disposed on the surface of the substrate and formed by immersing the substrate into a modifying solution including a silane with a hydrophilic group, and the barrier layer includes a polymer selected from the group consisting of: polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acid, polyethylene glycol, and any combination thereof; and a conductive layer disposed on the diffusion barrier structure. 15. The conductive laminate according to claim 14 , wherein the silane includes an amino group. 16. The conductive laminate according to claim 15 , wherein the silane is selected from the group consisting of: (3-aminopropyl)triethoxysilane, N-(3-(trimethoxysilyl)propyl)ethylenediamine), 3-2-(2-aminoethylamino)ethylamino propyl trimethoxysilane, and any combination thereof. 17. The conductive laminate according to claim 14 , wherein the barrier layer includes metallic nanoparticles that are encapsulated in the polymer. 18. The conductive laminate according to claim 17 , wherein the metallic nanoparticles include palladium nanoparticles. 19. The conductive laminate according to claim 17 , wherein a weight ratio of the polymer to the metallic nanoparticles is from 0.175:1 to 2:1. 20. The conductive laminate according to claim 14 , wherein the discontinuous modified layer includes a plurality of island-shaped modified layers formed on the surface of the substrate.

Assignees

Inventors

Classifications

  • of conductive barrier, adhesion or liner layers · CPC title

  • for electroless plating · CPC title

  • of dielectric parts comprising thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers · CPC title

  • H10W20/425Primary

    Barrier, adhesion or liner layers · CPC title

  • B32B15/20Primary

    comprising aluminium or copper {(B32B15/016 and B32B15/017 take precedence)} · CPC title

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What does patent US11745469B2 cover?
A method for manufacturing a conductive laminate and a conductive laminate are provided. The method for manufacturing the conductive laminate includes steps of: providing a substrate having a surface; immersing the substrate into a modifying solution including a silane with a hydrophilic group to form a discontinuous modified layer on the surface of the substrate; forming a barrier layer on the…
Who is the assignee on this patent?
Univ Nat Tsing Hua
What technology area does this patent fall under?
Primary CPC classification H10W20/425. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 05 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).