Transparent conductive layer, a film comprising the layer, and a process for its production
US-2017251553-A1 · Aug 31, 2017 · US
US11735330B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11735330-B2 |
| Application number | US-202117329151-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 25, 2021 |
| Priority date | Aug 13, 2020 |
| Publication date | Aug 22, 2023 |
| Grant date | Aug 22, 2023 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
According to one aspect of the present invention, a silver nanowire mesh (Ag NW-mesh) electrode and a fabricating method thereof. The Ag NW-mesh electrode includes a flexible substrate; and a mesh pattern layer which is disposed on the flexible substrate and in which a plurality of first meal lines and a plurality of second metal lines are composed of Ag NWs and intersect each other in an orthogonal or diagonal direction to form a grid pattern, wherein the first metal lines and the second metal lines of the mesh pattern layer form an angle of 35 degrees to 55 degrees with respect to a bending direction.
Opening claim text (preview).
What is claimed is: 1. A silver nanowire-mesh (Ag NW-mesh) electrode comprising: a flexible substrate; and a mesh pattern layer which is disposed on the flexible substrate and in which a plurality of first metal lines and a plurality of second metal lines are composed of Ag NWs and intersect each other in an orthogonal or diagonal direction to form a grid pattern, wherein the first metal lines and the second metal lines of the mesh pattern layer form an angle of any one of 35 degrees to 55 degrees, 125 degrees to 145 degrees, 215 degrees to 235 degrees and 305 degrees to 325 degrees with respect to a bending direction of the first metal lines and the second metal lines. 2. The Ag NW-mesh electrode of claim 1 , wherein the first metal lines and the second metal lines are metal lines having the same line width and have a line width in the range of 8 μm to 14 μm. 3. The Ag NW-mesh electrode of claim 2 , wherein the first metal lines and the second metal lines have a line width in the range of 9 μm to 10 μm. 4. The Ag NW-mesh electrode of claim 1 , further comprising a polyurethane (PU) overcoat layer formed on the mesh pattern layer. 5. The Ag NW-mesh electrode of claim 1 , wherein, in the mesh pattern layer, the Ag NWs are bonded via selective laser welding to form a network. 6. The Ag NW-mesh electrode of claim 1 , wherein in the mesh pattern layer, the plurality of first metal lines are arranged in parallel to each other at the same interval and the plurality of second metal lines are arranged in parallel to each other at the same interval. 7. The Ag NW-mesh electrode of claim 1 , wherein the flexible substrate is a substrate of one polymer selected from a group consisting of polyimide (PI), polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyethersulfone (PES), nylon, polytetrafluoroethylene (PTFE), polyetheretherketone (PEEK), polycarbonate (PC), polyurethane (PU), and polyarylate (PAR). 8. The Ag NW-mesh electrode of claim 1 , wherein the first metal lines and the second metal lines have an area mass density (AMD) in the range of 70 mg/m 2 to 130 mg/m 2 . 9. A transparent electromagnetic wave shielding film comprising the Ag NW-mesh electrode of claim 1 . 10. A transparent heater comprising the Ag NW-mesh electrode of claim 1 . 11. The Ag NW-mesh electrode of claim 1 , wherein the Ag NW-mesh electrode is bent. 12. The Ag NW-mesh electrode of claim 11 , wherein the first metal lines and the second metal lines of the mesh pattern layer form the angle of 35 degrees to 55 degrees with respect to the bending direction of the first metal lines and the second metal lines. 13. The Ag NW-mesh electrode of claim 11 , wherein the first metal lines and the second metal lines of the mesh pattern layer form the angle of 125 degrees to 145 degrees with respect to the bending direction of the first metal lines and the second metal lines. 14. The Ag NW-mesh electrode of claim 11 , wherein the first metal lines and the second metal lines of the mesh pattern layer form the angle of 215 degrees to 235 degrees with respect to the bending direction of the first metal lines and the second metal lines. 15. The Ag NW-mesh electrode of claim 11 , wherein the first metal lines and the second metal lines of the mesh pattern layer form the angle of 305 degrees to 325 degrees with respect to the bending direction of the first metal lines and the second metal lines.
mainly consisting of metals or alloys · CPC title
Laser welding for purposes other than joining · CPC title
Laminated shielding materials · CPC title
the conductive material comprising metals or alloys · CPC title
Conductive pattern lay-out details not covered by sub groups H05K1/02 - H05K1/0295 (H05K1/11 takes precedence; lay-out adapted to mounted component configuration H05K1/18) · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.