Cantilever, scanning probe microscope, and measurement method using scanning probe microscope

US11733264B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11733264-B2
Application numberUS-202017630698-A
CountryUS
Kind codeB2
Filing dateApr 30, 2020
Priority dateJul 31, 2019
Publication dateAug 22, 2023
Grant dateAug 22, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

To enhance the measurement sensitivity of a scanning probe microscope. In a cross sectional view, a cantilever includes a vertex portion that is a portion close to a sample and is covered by a metallic film, a ridge that is connected to the vertex portion and is covered by the metallic film, and an upper corner portion that is connected to the ridge. Here, the upper corner portion and a part of the ridge are portions to be irradiated with excitation light emitted from a light source of the scanning probe microscope.

First claim

Opening claim text (preview).

The invention claimed is: 1. A cantilever used in a scanning probe microscope, in a cross sectional view, the cantilever comprising: a vertex portion that is portion close to a sample and is covered by a metallic film; a ridge that is connected to the vertex portion and is covered by the metallic film; an upper corner portion that is connected to the ridge; a probe portion; and a beam portion that is connected to the probe portion from a lower surface and configured to hold the probe portion, wherein in the cross sectional view, the probe portion includes the vertex portion, a first line that connects the vertex portion and the beam portion, the ridge, the upper corner portion, and a second line that connects the upper corner portion and the beam portion, wherein the second line includes an extension line portion that is located on extension of the ridge, and a recessed portion that connects the upper corner portion and the extension line portion and is recessed toward the first line side, and wherein the upper corner portion and a part of the ridge are portions to be irradiated with excitation light emitted from a light source of the scanning probe microscope. 2. The cantilever according to claim 1 , further comprising: a probe portion; and a beam portion that is connected to the probe portion from a lower surface and configured to hold the probe portion, wherein in the cross sectional view, the probe portion includes the vertex portion, a first line that connects the vertex portion and the beam portion, the ridge, the upper corner portion, and a second line that connects the upper corner portion and the beam portion, each of the first line and the second line includes a straight portion directly connected to the beam portion, and an interval between the straight portion of the first line and the straight portion of the second line is the same or narrower as the straight portions approach the vertex portion. 3. The cantilever according to claim 1 , wherein the metallic film is a metallic film of any of a gold film, a silver film, a platinum film and an aluminum film, an alloy film, or a multilayer film of a plurality of metals, and a material of the cantilever is any of silicon, silicon oxide, and silicon nitride. 4. A scanning probe microscope, comprising: a sample holder that holds a sample; a light source that emits excitation light; and a cantilever that is to be irradiated with the excitation light, wherein in a cross sectional view, the cantilever includes a vertex portion that is a portion close to the sample and is covered by a metallic film, a ridge that is connected to the vertex portion and is covered by the metallic film, and an upper corner portion that is connected to the ridge, and the upper corner portion and a part of the ridge are portions to be irradiated with excitation light emitted from a light source of the scanning probe microscope. 5. The scanning probe microscope according to claim 4 , wherein the excitation light is emitted from an oblique direction with respect to the ridge. 6. The scanning probe microscope according to claim 4 , wherein a direction in which the excitation light is emitted to the cantilever is adjustable according to a length of the ridge of the cantilever to be used. 7. The scanning probe microscope according to claim 4 , wherein when a wavelength of the excitation light is λ, a length of the ridge is 5λ or less, the scanning probe microscope includes an incident optical system that condenses the excitation light into a spot shape and that irradiates the cantilever with the excitation light, and the incident optical system includes an angle adjusting mechanism capable of setting an incident angle formed by a horizontal line passing through the vertex portion and a center line of the incident optical system to 15 degrees or more and 90 degrees or less when the vertex portion is irradiated with a center of the spot shape. 8. The scanning probe microscope according to claim 4 , wherein when a wavelength of the excitation light is λ, a length of the ridge 3λ or less, the scanning probe microscope includes an incident optical system that condenses the excitation light into a spot shape and that irradiates the cantilever with the excitation light, and the incident optical system includes an angle adjusting mechanism capable of setting an incident angle formed by a horizontal line passing through the upper corner portion and a center line of the incident optical system to 15 degrees or more and 135 degrees or less when the upper corner portion is irradiated with a center of the spot shape. 9. The scanning probe microscope according to claim 4 , wherein when a wavelength of the excitation light is λ, a length of the ridge 5λ or less, the scanning probe microscope includes an incident optical system including a condensing lens that condenses the excitation light into a spot shape and irradiating the cantilever with the excitation light, and the incident optical system includes an optical path adjusting mechanism capable of changing an optical path configuration between a first optical path configuration in which a center of the excitation light coincides with a center of the condensing lens and a second optical path configuration in which the center of the excitation light passes through a position deviated from the center of the condensing lens. 10. The scanning probe microscope according to claim 9 , further comprising: an optical lever detection unit configured to detect deformation of the cantilever by detecting, using a photodetector via the condensing lens, reflected light, of light emitted to a beam portion of the cantilever via the condensing lens, from the beam portion of the cantilever. 11. The scanning probe microscope according to claim 4 , wherein when a wavelength of the excitation light is λ, a length of the ridge is 5λ or less, and the scanning probe microscope includes an adjusting unit configured to adjust a position of the cantilever so as to change an incident angle of the excitation light emitted to the cantilever. 12. The scanning probe microscope according to claim 4 , further comprising: a condensing optical component that condenses the excitation light into a spot shape and irradiates the cantilever, wherein the condensing optical component is formed of any component of a transmissive objective lens, a reflective objective lens, a parabolic mirror, and an integral mirror. 13. The scanning probe microscope according to claim 12 , further comprising: an optical lever detection unit configured to detect deformation of the cantilever by detecting, using a photodetector via the condensing optical component, reflected light, of light emitted to a beam portion of the cantilever via the condensing optical component, from the beam portion of the cantilever. 14. The scanning probe microscope according to claim 4 , wherein the excitation light has a wavelength in an infrared region, and the scanning probe microscope is configured to measure at a nano-resolution level any one of expansion of a sample surface, a change in reflectance, and a light induced force due to irradiation of the excitation light or irradiation of near-field light generated by the irradiation of the excitation light. 15. A measurement method using a scanning probe microscope, the method comprising: (a) a step of irradiating a cantilever with excitation light emitted from a light source; and (b) a step of detecting scattered light from a sample disposed opposite to the cantilever, wherein the ca

Assignees

Inventors

Classifications

  • G01Q10/045Primary

    Self-actuating probes, i.e. wherein the actuating means for driving are part of the probe itself, e.g. piezoelectric means on a cantilever probe · CPC title

  • by optical means · CPC title

  • Self-detecting probes, i.e. wherein the probe itself generates a signal representative of its position, e.g. piezoelectric gauge · CPC title

  • G01Q60/22Primary

    Probes, their manufacture, or their related instrumentation, e.g. holders · CPC title

  • G01N21/658Primary

    enhancement Raman, e.g. surface plasmons · CPC title

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What does patent US11733264B2 cover?
To enhance the measurement sensitivity of a scanning probe microscope. In a cross sectional view, a cantilever includes a vertex portion that is a portion close to a sample and is covered by a metallic film, a ridge that is connected to the vertex portion and is covered by the metallic film, and an upper corner portion that is connected to the ridge. Here, the upper corner portion and a part of…
Who is the assignee on this patent?
Hitachi High Tech Corp
What technology area does this patent fall under?
Primary CPC classification G01Q10/045. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 22 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).