Method and apparatus to determine a patterning process parameter

Patent metadata

Field	Value
Publication number	US-11728224-B2
Application number	US-202117371380-A
Country	US
Kind code	B2
Filing date	Jul 9, 2021
Priority date	Mar 1, 2016
Publication date	Aug 15, 2023
Grant date	Aug 15, 2023

Abstract

A method of determining a parameter of a patterning process, the method including: obtaining a detected representation of radiation redirected by a structure having geometric symmetry at a nominal physical configuration, wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the structure; and determining, by a hardware computer system, a value of the patterning process parameter based on optical characteristic values from an asymmetric optical characteristic distribution portion of the detected radiation representation with higher weight than another portion of the detected radiation representation, the asymmetric optical characteristic distribution arising from a different physical configuration of the structure than the nominal physical configuration.

First claim

The invention claimed is:

1. A method comprising:
obtaining a representation of radiation, redirected by a structure that has geometric symmetry at a nominal physical configuration, detected by an optical measurement machine, wherein a different physical configuration of the structure than the nominal physical configuration causes an asymmetric optical characteristic distribution in the detected representation and a patterning process parameter measures change in the physical configuration; and
determining, by a hardware computer system, a value of the patterning process parameter at the different physical configuration from application of a reconstruction process that processes optical characteristic values derived from the detected representation, wherein the reconstruction process involves using a mathematical model of the structure to generate a simulated representation of radiation redirected by the structure for analysis with the optical characteristic values derived from the detected representation.

2. The method of claim 1 , further comprising processing the detected representation to subtract optical characteristic values across an axis of symmetry so as to reduce or eliminate the optical characteristic values of a symmetric optical characteristic distribution in the representation and the determining comprises determining the value of the patterning process parameter using a reconstruction process that processes optical characteristic values derived from the processed detected representation.

3. The method of claim 1 , wherein the mathematical model is based on a profile of the structure derived from measurements of instances of the structure.

4. The method of claim 1 , wherein the reconstruction process involves comparing the optical characteristic values derived from the detected representation against a library of simulated representations of radiation redirected by the structure.

5. A computer program product comprising a non-transitory computer-readable medium having instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least:
obtain a representation of radiation, redirected by a structure that has geometric symmetry at a nominal physical configuration, detected by an optical measurement machine, wherein a different physical configuration of the structure than the nominal physical configuration causes an asymmetric optical characteristic distribution in the detected representation and a patterning process parameter measures change in the physical configuration; and
determine a value of the patterning process parameter at the different physical configuration from application of a reconstruction process that processes optical characteristic values derived from the detected representation, wherein the reconstruction process involves using a mathematical model of the structure to generate a simulated representation of radiation redirected by the structure for analysis with the optical characteristic values derived from the detected representation.

6. The computer program product of claim 5 , wherein the instructions are further configured to cause the computer system to process the detected representation to subtract optical characteristic values across an axis of symmetry so as to reduce or eliminate the optical characteristic values of a symmetric optical characteristic distribution in the representation and the determination of the value of the patterning process comprises determination of the value of the patterning process parameter using a reconstruction process that processes optical characteristic values derived from the processed detected representation.

7. The computer program product of claim 5 , wherein the mathematical model is based on a profile of the structure derived from measurements of instances of the structure.

8. The computer program product of claim 5 , wherein the reconstruction process involves comparing the optical characteristic values derived from the detected representation against a library of simulated representations of radiation redirected by the structure.

9. The computer program product of claim 5 , wherein the detected radiation was primarily zeroth order radiation.

10. The computer program product of claim 5 , wherein the patterning process parameter is overlay and the different physical configuration is a shift of at least part of the structure relative to another part of the structure.

11. A method comprising:
obtaining a representation of radiation, redirected by a structure that has geometric symmetry at a nominal physical configuration, detected by an optical measurement machine, wherein a different physical configuration of the structure than the nominal physical configuration causes an asymmetric optical characteristic distribution in the detected representation and a patterning process parameter measures change in the physical configuration; and
determining, by a hardware computer system, a value of the patterning process parameter at the different physical configuration from application of a non-linear solver that processes optical characteristic values derived from the detected representation to solve for a coefficient of a function having one or more variable terms.

12. The method of claim 11 , wherein the non-linear solver solves a function wherein the one or more variable terms thereof consist only of one or more variable terms having the patterning process parameter as the variable to an odd power, and/or one or more variable terms having the patterning process parameter as the variable in combination with another parameter of the structure as a variable.

13. The method of claim 11 , further comprising processing the detected representation to subtract optical characteristic values across an axis of symmetry so as to reduce or eliminate the optical characteristic values of a symmetric optical characteristic distribution in the representation and the determining the value of the patterning process parameter using a non-linear solver processes optical characteristic values derived from the processed detected representation.

14. The method of claim 11 , wherein the detected radiation was primarily zeroth order radiation.

15. The method of claim 11 , wherein the patterning process parameter is overlay and the different physical configuration is a shift of at least part of the structure relative to another part of the structure.

16. A computer program product comprising a non-transitory computer-readable medium having instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least:
obtain a representation of radiation, redirected by a structure that has geometric symmetry at a nominal physical configuration, detected by an optical measurement machine, wherein a different physical configuration of the structure than the nominal physical configuration causes an asymmetric optical characteristic distribution in the detected representation and a patterning process parameter measures change in the physical configuration; and
determine a value of the patterning process parameter at the different physical configuration from application of a non-linear solver that processes optical characteristic values derived from the detected representation.

17. The computer program product of claim 16 , wherein the non-linear solver solves a function wherein the one or more variable terms thereof consist only of one or more variable terms having the patterning process parameter as the variable to an odd power, and/or one

Assignees

• Asml Netherlands Bv

Inventors

• Van Leest Adriaan Johan
• Tsiatmas Anagnostis
• Hinnen Paul Christiaan
• Mcnamara Elliott Gerard
• Verma Alok
• Theeuwes Thomas
• Cramer Hugo Augustinus Joseph

Classifications

• H10P74/203 Primary

  Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects · CPC title

• H10P50/691

  for Group V materials or Group III-V materials · CPC title

• G03F7/706851

  Detection branch, e.g. detector arrangements, polarisation control, wavelength control or dark/bright field detection · CPC title

• G03F7/706847

  Production of measurement radiation, e.g. synchrotron, free-electron laser, plasma source or higher harmonic generation [HHG] · CPC title

• G06F2119/18

  Manufacturability analysis or optimisation for manufacturability · CPC title