Metrology method and associated metrology tool
US-2024288782-A1 · Aug 29, 2024 · US
Metrology method and apparatus, lithographic apparatus, and device manufacturing method
US9110385B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9110385-B2 |
| Application number | US-86741509-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 23, 2009 |
| Priority date | Feb 29, 2008 |
| Publication date | Aug 18, 2015 |
| Grant date | Aug 18, 2015 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
A metrology apparatus includes first ( 21 ) and second ( 22 ) radiation sources which generate first (iB 1 ) and second (iB 2 ) illumination beams of different spatial extent and/or angular range. One of the illumination beams is selected, e.g. according to the size of target to be measured. The beam selection can be made by a tillable mirror ( 254 ) at a back-projected substrate plane in a Kohler illumination setup.
First claim
Opening claim text (preview).
The invention claimed is: 1. A metrology apparatus configured to measure a property of a target on a substrate, the apparatus comprising: a first source configured to emit a first illumination beam of radiation; a second source configured to emit a second illumination beam of radiation wherein the first illumination beam of radiation differs from the second illumination beam of radiation in at least one of spot size and angular distribution; an aperture plate having first and…
Assignees
Inventors
Classifications
- G03F7/70633Primary
Physics · mapped topic
- G03F7/70625Primary
Physics · mapped topic
- G01J3/18Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US9110385B2 cover?
- A metrology apparatus includes first ( 21 ) and second ( 22 ) radiation sources which generate first (iB 1 ) and second (iB 2 ) illumination beams of different spatial extent and/or angular range. One of the illumination beams is selected, e.g. according to the size of target to be measured. The beam selection can be made by a tillable mirror ( 254 ) at a back-projected substrate plane in a Koh…
- Who is the assignee on this patent?
- Den Boef Arie Jeffrey, Asml Netherlands Bv
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70633. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Aug 18 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).