Gas hub for plasma reactor

US11728141B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11728141-B2
Application numberUS-202217590681-A
CountryUS
Kind codeB2
Filing dateFeb 1, 2022
Priority dateMar 15, 2013
Publication dateAug 15, 2023
Grant dateAug 15, 2023

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  1. Title

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  2. Abstract

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A gas distribution hub for a plasma chamber. The hub has a nozzle including a plurality of inner gas injection passage and a plurality of outer gas injection passages. The first plurality of gas injection passages are angularly spaced-apart arcuate channels at a first radial distance from a center of the hub, and the second plurality of gas injection passages are angularly spaced apart arcuate channels at a different second radial distance from the center of the hub.

First claim

Opening claim text (preview).

What is claimed is: 1. A gas distributor for a plasma reactor chamber, comprising: a hub having formed therein a gas nozzle including a plurality of inner gas injection passage and a plurality of outer gas injection passages, each gas injection passage of the plurality of inner gas injection passages and plurality of outer gas injection passages being open at a bottom surface of the hub, wherein the plurality of inner gas injection passages are angularly spaced-apart arcuate channels at a first radial distance from a center of the hub, and the plurality of outer gas injection passages are angularly spaced apart arcuate channels at a different second radial distance from the center of the hub, a first plurality of radial elevated feed lines having respective input ends at a periphery of the hub to receive gas and respective output ends overlying the inner gas injection passage, a first plurality of axial drop lines connected between the respective output ends of the first plurality of radial elevated feed lines and the inner gas injection passage, a second plurality of radial elevated feed lines having respective input ends at the periphery of the hub and respective output ends overlying the outer gas injection passage, and a second plurality of axial drop lines connected between the respective output ends of the plurality of radial elevated feed lines and the outer gas injection passages. 2. The gas distributor of claim 1 , wherein the plurality of inner gas injection passages and the plurality of outer gas injection passages lie along concentric circles. 3. The gas distributor of claim 1 , wherein: each of the first plurality of axial drop lines intersects a different gas injection passage of the plurality of inner injection passages, and each of the second plurality of axial drop lines intersects a different gas injection passage of the plurality of outer gas injection passages. 4. The gas distributor of claim 3 , wherein: each of the first plurality of axial drop lines intersects a midpoint of the gas injection passage of the plurality of inner injection passages, and each of the second plurality of axial drop lines intersects a midpoint of the gas injection passage of the plurality of outer gas injection passages. 5. The gas distributor of claim 1 , wherein the plurality of inner injection passages extend vertically. 6. The gas distributor of claim 1 , wherein the plurality of gas outer injection passages are angled outwardly. 7. The gas distributor of claim 1 , further comprising: a first plurality of gas supply ports evenly spaced around the periphery of the gas nozzle; and a second plurality of gas supply ports evenly spaced around the periphery of the gas nozzle, and offset from the first plurality of gas supply ports. 8. The gas distributor of claim 7 , wherein the first plurality of supply ports are connected to respective pairs of the first plurality of radial elevated feed lines, and the second plurality of supply ports are connected to respective pairs of the second plurality of radial elevated feed lines.

Assignees

Inventors

Classifications

  • Gas supply means · CPC title

  • Perforated rings · CPC title

  • Gas plumbing upstream of the reaction chamber · CPC title

  • Elongated nozzles, tubes with holes · CPC title

  • Radio frequency generated discharge (H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence) · CPC title

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What does patent US11728141B2 cover?
A gas distribution hub for a plasma chamber. The hub has a nozzle including a plurality of inner gas injection passage and a plurality of outer gas injection passages. The first plurality of gas injection passages are angularly spaced-apart arcuate channels at a first radial distance from a center of the hub, and the second plurality of gas injection passages are angularly spaced apart arcuate …
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H01J37/3244. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 15 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).