Gas distribution system and reactor system including same

Patent metadata

Field	Value
Publication number	US-11718913-B2
Application number	US-201815997445-A
Country	US
Kind code	B2
Filing date	Jun 4, 2018
Priority date	Jun 4, 2018
Publication date	Aug 8, 2023
Grant date	Aug 8, 2023

Abstract

A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas distribution system coupled to a reaction chamber.

First claim

We claim:

1. A gas distribution system comprising:
a first gas supply line;
a first gas manifold coupled to the first gas supply line, wherein the first gas manifold comprises a plurality of first gas outlets;
a plurality of first gas flow sensors, wherein at least one of the plurality of first gas flow sensors is coupled to each of the plurality of first gas outlets;
a plurality of first gas valves, wherein at least one of the plurality of first gas valves is coupled to an outlet of each of the plurality of first gas flow sensors;
a first gas pressure-controlled vent line selectively fluidly coupled to an outlet of each of the plurality of first gas valves;
a second gas supply line;
a second gas manifold coupled to the second gas supply line, wherein the second gas manifold comprises a plurality of second gas outlets;
a plurality of second gas flow sensors, wherein at least one of the plurality of second gas flow sensors is coupled to each of the plurality of second gas outlets;
a plurality of second gas valves, wherein at least one of the plurality of second gas valves is coupled to an outlet of each of the plurality of second gas flow sensors;
a second gas pressure-controlled vent line selectively fluidly coupled to an outlet of each of the plurality of second gas valves;
a first pressure transducer configured to measure the pressure within the first gas pressure-controlled vent line;
a second pressure transducer configured to measure the pressure within the second gas pressure-controlled vent line;
a third pressure transducer configured to measure a reaction chamber pressure within the reaction chamber;
a vacuum source coupled to the first gas pressure-controlled vent line; and
a controller programmed to operate the vacuum source, during operations of the gas distribution system to provide a first gas via the first gas supply line to the first gas manifold or to provide a second gas via the second gas supply line to the second gas manifold, to maintain a pressure measured by the first and second pressure transducers in the first and second gas pressure-controlled vent lines within plus or minus ten percent of the reaction chamber pressure within the reaction chamber,
wherein the first gas pressure-controlled vent line is between the plurality of first gas valves and the reaction chamber,
wherein the second gas pressure-controlled vent line is between the plurality of second gas valves and the reaction chamber,
wherein the plurality of first gas valves is between the plurality of first gas flow sensors and the first gas pressure-controlled vent line.

2. The gas distribution system of claim 1 , further comprising a plurality of first gas selection valves, wherein an inlet of each of the plurality of first gas selection valves is coupled to an outlet of one of the plurality of first gas valves and the outlet of each of the plurality of first gas selection valves is coupled an inlet of the first gas pressure-controlled vent line.

3. The gas distribution system of claim 2 , wherein the outlet of each of the plurality of first gas selection valves is selectively coupled to the reaction chamber.

4. The gas distribution system of claim 2 , further comprising a plurality of second gas selection valves, wherein an inlet of each of the plurality of second gas selection valves is coupled to an outlet of one of the plurality of second gas valves and the outlet of each of the plurality of second gas selection valves is coupled to an inlet of the second gas pressure-controlled vent line.

5. The gas distribution system of claim 4 , wherein the outlet each of the plurality of second gas selection valves is selectively coupled to the reaction chamber.

6. The gas distribution system of claim 1 , wherein the plurality of second gas valves comprises a proportional valve.

7. The gas distribution system of claim 1 , further comprising:
a first relief valve configured to allow venting of the first gas manifold;
a second relief valve configured to allow venting of the second gas manifold;
a moisture sample panel;
an inert gas inlet valve; and
a plurality of channel purge valves.

8. The gas distribution system of claim 1 , further comprising a flange.

9. The gas distribution system of claim 8 , wherein the plurality of first gas valves and the plurality of second gas valves are fluidly coupled to gas flange channels formed within the flange.

10. The gas distribution system of claim 1 , further comprising a proportional-integral-derivative controller coupled to the plurality of first gas valves and to the plurality of second gas valves.

11. The gas distribution system of claim 1 , further comprising a plurality of second gas isolation valves, wherein each of the plurality of second gas isolation valves is coupled to an inlet of one of the plurality of second gas flow sensors.

12. The gas distribution system of claim 1 , wherein the plurality of first gas valves comprises a proportional valve.

13. The gas distribution system of claim 1 , wherein the plurality of first gas valves comprises a solenoid valve.

14. A reactor system comprising the gas distribution system of claim 1 .

15. The reactor system of claim 10 , wherein the proportional-integral-derivative controller is configured to independently adjust a flow in each of the first and second gas valves to desired set points.

16. The gas distribution system of claim 1 , wherein the pressure within the reaction chamber is within 1 percent of the pressure within the first gas pressure-controlled vent line during operations of the vacuum source.

17. A reactor system comprising the gas distribution system of claim 1 , wherein the pressure within the reaction chamber is maintained at about the same as a pressure within the second gas pressure-controlled vent line, wherein the vacuum source is coupled to the second gas pressure-controlled vent line and wherein the first gas pressure-controlled vent line and the second gas pressure-controlled vent line are maintained at the pressure by operations of the vacuum source by the controller.

18. The reactor system of claim 1 , wherein the controller is further programmed to operate the plurality of first gas valves and the plurality of first gas selection valves during operations of the gas distribution system, such that the first gas is continually flowing to the first gas pressure-controlled vent line or continually flowing to the reaction chamber.

19. A gas distribution system comprising:
a first gas supply line;
a first gas manifold coupled to the first gas supply line, wherein the first gas manifold comprises a plurality of first gas outlets;
a plurality of first gas flow sensors, wherein at least one of the plurality of first gas flow sensors is coupled to each of the plurality of first gas outlets;
a plurality of first gas valves each operable to control a flow rate of gas from the first gas supply line, wherein at least one of the plurality of first gas valves is coupled to an outlet of each of the plurality of first gas flow sensors;
a first gas pressure-controlled vent line selectively coupled to an outlet of each of the plurality of first gas valves, wherein the first gas pressure-controlled vent line is between the plurality of first gas valves and a reaction chamber;
a first pressure transducer configured to measure the pressure within the first gas pressure-controlled vent line;
a third pressure transducer configured to measure a reaction chamber pressure within the reaction chamber;
a plurality of first gas selection valve

Assignees

• Asm Ip Holding Bv

Inventors

• Sreeram Sonti
• Su Junwei
• Tran Loc Vinh

Classifications

• H10P72/0612

  Production flow monitoring, e.g. for increasing throughput · CPC title

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• C23C16/45587 Primary

  Mechanical means for changing the gas flow · CPC title

• C23C16/45557

  Pulsed pressure or control pressure · CPC title