Textured processing chamber components and methods of manufacturing same

Patent metadata

Field	Value
Publication number	US-11685990-B2
Application number	US-201715836391-A
Country	US
Kind code	B2
Filing date	Dec 8, 2017
Priority date	Dec 8, 2017
Publication date	Jun 27, 2023
Grant date	Jun 27, 2023

Abstract

Processing chamber components and methods of manufacture of same are provided herein. In some embodiments, a component part body includes a component part body having a base plane and at least one textured surface region, wherein the at least one textured surface region comprises a plurality of independent surface features having a first side having at least a 45 degree angle with respect to the base plane. In at least some embodiments, the textured surface includes a plurality of independent surface features which are pore free.

First claim

The invention claimed is:

1. A chamber component for a processing chamber, comprising:
a coil spacer for a processing chamber having a base plane and at least one textured surface region perpendicular to the base plane,
wherein the at least one textured surface region comprises a plurality of independent surface features extending axially outward from and equally spaced on an external surface of the coil spacer and having a first side with a linear edge closest to the base plane that forms at least a 45 degree to approximately 75 degree angle with respect to the base plane, and wherein the base plane is configured to be parallel to an outer vertical shield of a process volume of a plasma vapor deposition (PVD) chamber when the coil spacer is installed in the PVD chamber,
wherein the at least one textured surface region of the coil spacer is a curved surface connecting a wider base plane to a narrower top plane and the independent surface features all have their first side linear edge parallel to each other and all forming an angle between 45 to approximately 75 degrees with the base plane.

2. The chamber component of claim 1 , wherein the first side is a downwardly facing surface towards the base plane and wherein only the first side is porous and has a porosity of greater than zero and less than approximately one percent.

3. The chamber component of claim 1 , wherein the plurality of independent surface features comprise protrusions having a diameter of about 1.1 to about 1.8 millimeters.

4. The chamber component of claim 1 , wherein the plurality of independent surface features comprise protrusions having a heights of about 0.70 to about 1.30 millimeters.

5. The chamber component of claim 1 , wherein the plurality of independent surface features comprise protrusions spaced upon the coil spacer by about 0.70 to about 1.30 millimeters.

6. The chamber component of claim 1 , wherein each feature of the plurality of independent surface features has a center, and each center is about 1.3 to about 2.5 millimeters from any adjacent feature.

7. The chamber component of claim 1 , wherein the plurality of independent surface features include a predetermined repetitive pattern of cylindrical protrusions.

8. The chamber component of claim 1 , wherein the independent surface features are equally sized and equally spaced cylindrical protrusions.

9. The chamber component of claim 1 , wherein the independent surface features have a flat top.

10. The chamber component of claim 1 , wherein the coil spacer comprises at least two textured surface regions.

11. The chamber component of claim 1 , further comprises:
an interior surface having a plurality of heat transfer fins; and an exterior surface on which the at least one textured surface region is formed.

12. A coil spacer for a processing chamber, comprising:
a top portion;
a bottom portion;
an opening disposed in the top portion and extending through the bottom portion, wherein the top portion is configured to receive a tab of an inductive coil of a plasma vapor deposition (PVD) chamber and wherein the bottom portion is configured to receive a tab receptor for the inductive coil of the PVD chamber;
an exterior surface;
an interior surface disposed adjacent the opening; and
a cup region disposed between the top portion and bottom portion, wherein the cup region has an exterior portion, wherein at least one textured surface region is perpendicular to a base plane of the coil spacer and is disposed upon the exterior portion of the cup region, wherein the at least one textured surface region comprises a plurality of independent surface features extending axially outward from and equally spaced on the exterior surface and having a first side with a linear edge closest to the base plane that forms at least a 45 degree to approximately 75 degree angle with respect to the base plane, wherein the base plane extends as a plane across the bottom portion, and wherein the base plane is configured to be parallel to an outer vertical shield of a process volume of the PVD chamber when the coil spacer is installed in the PVD chamber,
wherein the at least one textured surface region of the coil spacer is a curved surface connecting a wider bottom portion to a narrower top portion and the independent surface features all have their first side linear edge parallel to each other and all forming an angle between 45 to approximately 75 degrees with the base plane.

13. The coil spacer of claim 12 , wherein each of the plurality of independent surface features has an upper fillet radius of approximately 0.25 millimeters and a bottom fillet radius of approximately 0.10 mm.

14. The coil spacer of claim 12 , wherein the first side is a downwardly facing surface towards the base plane and wherein only the first side is porous and has a porosity of greater than zero and less than approximately one percent.

15. The coil spacer of claim 12 , wherein a top portion is disposed adjacent the cup region, wherein the top portion comprises a plurality of features.

16. The coil spacer of claim 12 , comprising an outer lip proximate the top portion and disposed between the exterior surface and the interior surface.

17. The coil spacer of claim 12 made by:
(a) depositing a metal powder in an amount sufficient to form a layer having a thickness of 20-40 micrometers;
(b) melting the metal powder to form a layer; and
(c) repeating (a) and (b) until chamber component is fabricated substantially free of pores.

18. The coil spacer of claim 17 ,
wherein the metal powder is stainless steel powder having a size in an amount of 35-45 micrometers.

Assignees

• Applied Materials Inc

Inventors

• Baduvamanda Cariappa
• Yen Ong Pang
• Lam Lit Ping

Classifications

• H10P72/70

  for supporting or gripping · CPC title

• H01L21/683

  Electricity · mapped topic

• H01J37/32816

  Pressure · CPC title

• C23C14/54 Primary

  Controlling or regulating the coating process · CPC title

• H01L21/203

  Electricity · mapped topic