Massively-parallel micronozzle array for direct write electrodeposition of high-density microstructure arrays

US11639556B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11639556-B2
Application numberUS-201715857362-A
CountryUS
Kind codeB2
Filing dateDec 28, 2017
Priority dateDec 28, 2017
Publication dateMay 2, 2023
Grant dateMay 2, 2023

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A micronozzle assembly, comprising a reservoir, an array of structures comprising micronozzles, a porous structure positioned between the reservoir and the array, and an electrode within the reservoir, wherein the electrode comprises any of a mesh, a frame along the perimeter of the cavity of the reservoir, or a rod extending into a cavity of the reservoir.

First claim

Opening claim text (preview).

What is claimed is: 1. A microelectrodeposition assembly for parallel direct writing of a two-dimensional (2D) array of discrete metal microstructures, the assembly comprising: an electrolyte reservoir comprising a cavity surrounded by a wall, wherein a bottom of the electrolyte reservoir comprises a porous structure; a 2D array of structures comprising micronozzles in fluid communication with the electrolyte reservoir through the porous structure, wherein the 2D array of structures comprises at least 10,000 micronozzles having a center-to-center pitch substantially equal to a center-to-center pitch of individual ones of the 2D array of discrete metal microstructures to be deposited in parallel by corresponding individual ones of the micronozzles; and an electrode within the electrolyte reservoir, wherein the electrode is separated from the 2D array of structures by the porous structure and wherein the electrode comprises any of a mesh, a frame along a perimeter of the cavity of the electrolyte reservoir, or a rod extending into the cavity of the electrolyte reservoir. 2. The assembly of claim 1 , wherein the 2D array of structures comprising micronozzles is integral with the porous structure, and wherein the wall of the electrolyte reservoir is integral with the porous structure. 3. The assembly of claim 1 , wherein the porous structure comprises tortuous pores. 4. The assembly of claim 1 , wherein the porous structure comprises straight pores in an ordered array. 5. The assembly of claim 1 , wherein the porous structure comprises a ceramic material or an organic material, and wherein the micronozzles comprise an epoxy resin. 6. The assembly of claim 1 , wherein the 2D array of structures comprises between 10,000 micronozzles and 1,500,00 micronozzles, the center-to-center pitch is 100 microns or less, and each of the micronozzles comprises an orifice of a diameter substantially equal to, or greater than, a diameter of individual ones of the metal microstructures. 7. The assembly of claim 1 , wherein the porous structure comprises a plurality of orifices within an area overlapping an area of each of the micronozzles. 8. A microelectrodeposition system for parallel direct writing of a two-dimensional (2D) array of discrete metal microstructures, the system, comprising: a micronozzle assembly, comprising: an electrolyte reservoir coupled to a fluid path, wherein the electrolyte reservoir comprises a cavity surrounded by a wall and a bottom of the electrolyte reservoir comprises a porous structure; a 2D array of structures comprising between 10,000 and 1,500,000 micronozzles in fluid communication with the electrolyte reservoir through the porous structure, the micronozzles having a center-to-center pitch of 100 microns or less and substantially equal to a center-to-center pitch of individual ones of the 2D array of discrete metal microstructures to be deposited in parallel by corresponding individual ones of the micronozzles; an electrode within the electrolyte reservoir, wherein the electrode is separated from the 2D array of structures by the porous structure and wherein the electrode comprises any of a mesh, a frame along a perimeter of the cavity of the electrolyte reservoir, or a rod extending into the cavity of the electrolyte reservoir; a power source coupled to the electrode; and a motion actuator to displace the micronozzle assembly vertically relative to the 2D array of microstructures during the direct writing. 9. The system of claim 8 , wherein the fluid path includes an interface to couple the fluid path to a vessel for containing electrolyte. 10. The system of claim 8 , wherein the fluid path includes an interface to couple the fluid path to a pressure source. 11. The system of claim 8 , further comprising an interface to couple the micronozzle assembly to the motion actuator. 12. The system of claim 8 , further comprising a substrate mount, wherein the substrate mount includes an interface to couple the substrate mount to the motion actuator. 13. The system of claim 8 , wherein the porous structure comprises tortuous pores. 14. The system of claim 8 , wherein the porous structure comprises straight pores in an ordered array. 15. The system of claim 8 , wherein the porous structure comprises a ceramic material or an organic material, and wherein the micronozzles comprise an epoxy resin. 16. The system of claim 15 , wherein the porous structure comprises the organic material and the organic material is one of cellulose acetate, mixed cellulose ester, polycarbonate, polyether ether ketone (PEEK), polyethersulfone (PES), polyester, polypropylene, polytetrafluoroethylene (PTFE), or polyvinylidene difluoride (PVDF). 17. The system of claim 8 , wherein each of the micronozzles comprises a conical interior cavity. 18. The system of claim 8 , wherein the center-to-center pitch of the micronozzles is 30 microns, or less.

Assignees

Inventors

Classifications

  • Apparatus for manufacturing bump connectors · CPC title

  • in solid form, e.g. by using a powder or by stud bumping · CPC title

  • 3D structures, e.g. superposed patterned layers · CPC title

  • C25D5/026Primary

    using locally applied jets of electrolyte · CPC title

  • Electroplating, e.g. finish plating · CPC title

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What does patent US11639556B2 cover?
A micronozzle assembly, comprising a reservoir, an array of structures comprising micronozzles, a porous structure positioned between the reservoir and the array, and an electrode within the reservoir, wherein the electrode comprises any of a mesh, a frame along the perimeter of the cavity of the reservoir, or a rod extending into a cavity of the reservoir.
Who is the assignee on this patent?
Intel Corp
What technology area does this patent fall under?
Primary CPC classification C25D5/026. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 02 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).