Inline microwave batch degas chamber

Patent metadata

Field	Value
Publication number	US-11629409-B2
Application number	US-201916424302-A
Country	US
Kind code	B2
Filing date	May 28, 2019
Priority date	May 28, 2019
Publication date	Apr 18, 2023
Grant date	Apr 18, 2023

Abstract

Methods and apparatus for a substrate processing chamber are provided herein. In some embodiments, a substrate processing chamber includes a chamber body having sidewalls defining an interior volume having a polygon shape; a selectively sealable elongated opening disposed in an upper portion of the chamber body for transferring one or more substrates into or out of the chamber body; a funnel disposed at a first end of the chamber body, wherein the funnel increases in size along a direction from an outer surface of the chamber body to the interior volume; and a pump port disposed at a second end of the chamber body opposite the funnel.

First claim

The invention claimed is:

1. A substrate processing chamber, comprising:
a chamber body having sidewalls defining an interior volume having a polygon shape;
a selectively sealable elongated opening disposed in an upper portion of the chamber body for transferring one or more substrates into or out of the chamber body;
a funnel disposed in one of the sidewalls of the chamber body at a first end of the chamber body, wherein an opening of the funnel increases in size along a direction from an outer surface of the chamber body to the interior volume;
a plurality of openings disposed in the sidewalls adjacent to the funnel to flow gas into the interior volume; and
a pump port disposed at a second end of the chamber body and opposite the funnel.

2. The substrate processing chamber of claim 1 , wherein interior volume-facing surfaces of the funnel are arranged to form a rectangular cross-sectional funnel opening.

3. The substrate processing chamber of claim 1 , wherein the opening of the funnel, on a side facing the interior volume, extends to an adjacent one of the sidewalls of the chamber body.

4. The substrate processing chamber of claim 1 , wherein surfaces of the funnel include a plurality of gas openings.

5. The substrate processing chamber of claim 1 , further comprising:
an RF gasket groove disposed in an exterior surface of the chamber body and surrounding the selectively sealable elongated opening.

6. The substrate processing chamber of claim 1 , further comprising an O-ring groove disposed on a top surface of the chamber body and about the sidewalls and an RF gasket groove disposed between the sidewalls and the O-ring groove.

7. The substrate processing chamber of claim 1 , further comprising:
an opening on a chamber floor of the chamber body configured to accommodate a substrate support.

8. The substrate processing chamber of claim 1 , further comprising:
a second selectively sealable elongated opening opposite the selectively sealable elongated opening for transferring one or more substrates into or out of the chamber body.

9. A degas chamber, comprising:
a chamber body including an interior volume having a polygon shape, wherein the chamber body includes a selectively sealable elongated opening for transferring one or more substrates into or out of the chamber body;
a substrate support disposed in the interior volume and configured to support one or more substrates, wherein the substrate support is movable at least to a raised position aligned with the elongated opening and to a lowered position;
a heat source configured to heat the one or more substrates when disposed on the substrate support;
and
an exhaust port disposed in the chamber body, wherein the chamber body includes a funnel disposed opposite the exhaust port, wherein surfaces of the funnel include a plurality of gas openings.

10. The degas chamber of claim 9 , wherein the substrate support is configured to support a plurality of substrates and the heat source is a microwave source.

11. The degas chamber of claim 10 , wherein the funnel is coupled to the microwave source, wherein the funnel extends through a sidewall of the chamber body orthogonal to a support surface of the substrate support, and wherein an opening of the funnel increases in size along a direction toward the interior volume.

12. The degas chamber of claim 11 , wherein the funnel has a rectangular cross sectional shape.

13. The degas chamber of claim 10 , wherein the substrate support comprises a plurality of support members configured to support a plurality of substrates in a vertically spaced apart orientation.

14. The degas chamber of claim 10 , further comprising a mesh screen disposed between the chamber body and the exhaust port, wherein the mesh screen includes a plurality of openings configured to reduce or eliminate microwave leakage through the exhaust port.

15. The degas chamber of claim 9 , further comprising a temperature sensor disposed in a sidewall of the chamber body between the elongated opening and a chamber floor of the chamber body.

16. The degas chamber of claim 9 , wherein the funnel is a sole funnel of the chamber body.

17. The degas chamber of claim 9 , wherein the substrate support is configured to support one substrate and the heat source is a resistive heater embedded in the substrate support.

18. A microwave degas chamber, comprising:
a chamber body including an interior volume having sidewalls that define a regular polygon shape, wherein the chamber body includes a first selectively sealable elongated opening for transferring one or more substrates into the chamber body and a second selectively sealable elongated opening for transferring the one or more substrates out of the chamber body;
a substrate support disposed in the interior volume and configured to support a plurality of substrates in a vertically spaced apart orientation, the substrate support comprising a plurality of support members and a plurality of lift members configured to be controlled independently of the plurality of support members to selectively raise or lower the plurality of substrates onto or off of the plurality of support members;
a microwave source coupled to the chamber body at a first end of the chamber body;
a funnel disposed in one of the sidewalls of the chamber body at the first end of the chamber body;
a plurality of openings disposed in the sidewalls of the chamber body adjacent to the funnel to flow gas into the interior volume; and
a pump coupled to the chamber body at a second end of the chamber body opposite the first end.

19. The microwave degas chamber of claim 18 , wherein the microwave source provides microwaves to the chamber body at a frequency range of about 5.0 to 7.0 gigahertz.

20. The microwave degas chamber of claim 18 , wherein the microwave source provides microwaves having a given wavelength, and wherein the chamber body includes a funnel with an opening disposed at least two times the given wavelength away from a closest portion of the substrate support.

Assignees

• Applied Materials Inc

Inventors

• Gautam Ribhu
• Jupudi Ananthkrishna
• Koh Tuck Foong
• Rao Preetham P
• Ramachandran Vinodh
• Ow Yueh Sheng
• Wada Yuichi
• Tsai Cheng-Hsiung
• Liew Kai Liang

Classifications

• H10P72/0436 Primary

  mainly by radiation · CPC title

• H10P72/0408

  for drying · CPC title

• H10P72/0431 Primary

  Apparatus for thermal treatment · CPC title

• H01J37/32192

  Microwave generated discharge (H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence) · CPC title

• H05B6/806 Primary

  for laboratory use · CPC title