Shaped aperture set for multi-beam array configurations

Patent metadata

Field	Value
Publication number	US-11615939-B2
Application number	US-202117211018-A
Country	US
Kind code	B2
Filing date	Mar 24, 2021
Priority date	Mar 24, 2021
Publication date	Mar 28, 2023
Grant date	Mar 28, 2023

Abstract

An aperture array for a multi-beam array system and a method of selecting a subset of a beam from a multi-beam array system are provided. The aperture array comprises an array body arranged proximate to a beam source. The array body comprises a plurality of apertures, at least two of the apertures having different geometries. The array body is movable, via an actuator, relative to an optical axis of the beam source, such that a subset of a beam from the beam source is selected based on the geometry of the aperture that is intersected by the optical axis.

First claim

What is claimed is:

1. An aperture array for a multi-beam array system with multiple beams, comprising:
an array body arranged proximate to a beam source, the array body comprising a plurality of apertures, wherein at least two of the apertures have different geometries, wherein each of the apertures has a dimension less than a beam dimension of the beams, and wherein at least one of the plurality of apertures is hexagonal;
wherein the array body is movable, via an actuator, relative to an optical axis of the beam source, such that a subset of a beam from the beam source is selected based on the geometry of the aperture that is intersected by the optical axis and such that when the aperture intersected by the optical axis is hexagonal, the actuator is configured to perform a step and settle operation on a portion of a wafer positioned in the optical axis downstream of the array body.

2. The aperture array of claim 1 , wherein at least one of the plurality of apertures is circular.

3. The aperture array of claim 1 , wherein at least one of the plurality of apertures is rectangular.

4. The aperture array of claim 1 , wherein two of the plurality of apertures have a same shape with different sizes.

5. The aperture array of claim 1 , wherein the plurality of apertures are arranged one dimensionally in the array body.

6. The aperture array of claim 5 , wherein the actuator comprises:
a linear actuator configured to move the array body relative to the optical axis of the beam source in an X direction;
wherein the X direction is perpendicular to the optical axis.

7. The aperture array of claim 5 , wherein the actuator comprises:
a rotary actuator configured to rotate the array body relative to the optical axis of the beam source about a rotational axis;
wherein the rotational axis is parallel to the optical axis.

8. The aperture array of claim 1 , wherein the plurality of apertures are arranged two dimensionally in the array body.

9. The aperture array of claim 8 , wherein the actuator comprises:
a pair of linear actuators configured to move the array body relative to the optical axis of the beam source in an X direction and a Y direction, respectively;
wherein the X direction and the Y direction are perpendicular to the optical axis and perpendicular to each other.

10. The aperture array of claim 1 , wherein the array body is comprised of aluminum nitride, polycrystalline diamond, graphite, molybdenum, or tungsten.

11. The aperture array of claim 1 , further comprising:
a heat dissipation device disposed on the array body, the heat dissipation device being configured to actively or passively dissipate heat from the array body.

12. The aperture array of claim 1 , wherein a distance between the array body and the beam source is from 10 cm to 20 cm.

13. The aperture array of claim 1 , wherein the beam source is an electron beam source.

14. A method of selecting a subset of a beam from a multi-beam array system with multiple electron beams, the method comprising:
providing an array body proximate to a beam source, the array body comprising a plurality of apertures, wherein at least two of the apertures have different geometries, wherein each of the apertures has a dimension less than a beam dimension of the electron beams, and wherein at least one of the plurality of apertures is hexagonal;
moving the array body, via an actuator, relative to an optical axis of the beam source such that one of the apertures is intersected by the optical axis;
generating the electron beams about the optical axis using the beam source;
directing one of the electron beams through the array body to select a subset of the electron beam based on a shape of the aperture intersected by the optical axis; and
performing a step and settle operation on a portion of a wafer positioned in the optical axis, downstream of the array body when the aperture intersected by the optical axis is hexagonal.

15. The method of claim 14 , wherein at least one of the plurality of apertures is circular, and when the aperture intersected by the optical axis is circular, the method further comprises:
performing a hot spot inspection operation on a portion of a wafer positioned in the optical axis, downstream of the array body.

16. The method of claim 14 , wherein at least one of the plurality of apertures is rectangular, and when the aperture intersected by the optical axis is rectangular, the method further comprises:
performing a swathing operation on a portion of a wafer positioned in the optical axis, downstream of the array body.

17. The method of claim 14 , further comprising:
moving the array body, via the actuator, relative to the optical axis of the beam source such that a different one of the apertures is intersected by the optical axis; and
directing the electron beam through the array body to select a different subset of the electron beam based on a shape of the different one of the apertures intersected by the optical axis.

18. The method of claim 14 , wherein a distance between the array body and the beam source is from 10 cm to 20 cm.

Assignees

• Kla Corp

Inventors

• Plettner Tomas
• Escorcia Ernesto
• Shriyan Sameet K
• Lee Jeong Ho

Classifications

• H01J37/09 Primary

  Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields · CPC title

• H01J2237/0451

  with fixed aperture · CPC title

• H01J37/226 Primary

  Optical arrangements for illuminating the object; optical arrangements for collecting light from the object · CPC title

• H01J37/28 Primary

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• G01N2223/646

  flaws, defects · CPC title