CVD apparatus

Patent metadata

Field	Value
Publication number	US-11598021-B2
Application number	US-201615764276-A
Country	US
Kind code	B2
Filing date	Sep 29, 2016
Priority date	Oct 1, 2015
Publication date	Mar 7, 2023
Grant date	Mar 7, 2023

Abstract

A preheat ring (126) for use in a chemical vapor deposition system includes a first portion and a second portion selectively coupled to the first portion such that the first and second portions combine to form an opening configured to receive a susceptor therein. Each of the first and second portions is independently moveable with respect to each other.

First claim

What is claimed is:

1. A chemical vapor deposition system comprising:
a susceptor;
a preheat ring configured to form an opening for receiving the susceptor therein, wherein the susceptor is spaced from the preheat ring to form a substantially circular gap therebetween, the preheat ring having a top surface and a bottom surface and comprising:
a first portion;
a second portion selectively coupled to the first portion, wherein each of the first portion and the second portion is independently moveable along a horizontal axis with respect to each other to control a size of the gap; and
a first plurality of elongated grooves formed in the bottom surface of the first portion of the preheat ring, wherein the first plurality of elongated grooves consists of all of the elongated grooves formed in the bottom surface of the first portion of the preheat ring, each of the elongated grooves of the first plurality of elongated grooves having a major axis, the major axis of each elongated groove of the first plurality of elongated grooves being parallel to the major axis of the other elongated grooves of the first plurality of elongated grooves; and
a second plurality of elongated grooves formed in the bottom surface of the second portion of the preheat ring, wherein the second plurality of elongated grooves consists of all of the elongated grooves formed in the bottom surface of the second portion of the preheat ring, each of the elongated grooves of the second plurality of elongated grooves having a major axis, the major axis of each elongated groove of the second plurality of elongated grooves being parallel to the major axis of the other elongated grooves of the second plurality of elongated grooves; and

a ring support coupled to the preheat ring, the ring support including a plurality of posts, each post of the plurality of posts being received in one of the elongated grooves of the first or second plurality of elongated grooves.

2. The chemical vapor deposition system as set forth in claim 1 wherein the gap size is within a range of 1.0 millimeters (mm) and 10.0 mm.

3. The chemical vapor deposition system as set forth in claim 1 wherein the gap between the susceptor and the first portion is a first distance, and the gap between the susceptor and the second portion is a second distance different from the first distance.

4. The chemical vapor deposition system as set forth in claim 1 wherein the susceptor includes a first thickness and the preheat ring includes a second thickness substantially similar to the first thickness.

5. The chemical vapor deposition system as set forth in claim 1 wherein the susceptor includes a first thickness and the preheat ring includes a second thickness smaller than the first thickness.

6. The chemical vapor deposition system as set forth in claim 1 wherein the susceptor includes a first top surface and the preheat ring includes a second top surface substantially flush with the first top surface.

7. The chemical vapor deposition system as set forth in claim 1 wherein the susceptor includes a first top surface and the preheat ring includes a second top surface offset from the first top surface.

8. The chemical vapor deposition system as set forth in claim 1 wherein the preheat ring includes an inner surface including a groove defined therein.

9. The chemical vapor deposition system as set forth in claim 8 wherein:
the groove extends a distance within a range of 10.0 mm and 40.0 mm into the preheat ring; and
the preheat ring includes a first thickness at the inner surface that is one half to one third a thickness of the susceptor.

10. The chemical vapor deposition system as set forth in claim 1 wherein the plurality of posts are configured to slide along the elongated grooves of the first plurality and second plurality of elongated grooves to facilitate independently moving the first and second ring portions to adjust the size of the gap.

11. The chemical vapor deposition system as set forth in claim 1 wherein the ring support extends below the susceptor.

12. The chemical vapor deposition system as set forth in claim 1 further comprising an upper liner and a lower liner, the preheat ring not being supported by the lower liner.

Assignees

• Globalwafers Co Ltd

Inventors

• Thomas Shawn George
• Wang Gang

Classifications

• H10P72/0436

  mainly by radiation · CPC title

• H10P72/7611

  characterised by edge profile or support profile · CPC title

• C30B25/105

  by irradiation or electric discharge · CPC title

• C23C16/4585 Primary

  Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds · CPC title

• C30B25/12 Primary

  Substrate holders or susceptors · CPC title