Deposition mask, deposition device, and deposition mask manufacturing method
US-2018002803-A1 · Jan 4, 2018 · US
Shadow mask with plasma resistant coating
US11566322B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11566322-B2 |
| Application number | US-201616096665-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 24, 2016 |
| Priority date | May 24, 2016 |
| Publication date | Jan 31, 2023 |
| Grant date | Jan 31, 2023 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
A mask assembly (100) includes a mask frame (102) and a mask screen (104), both of the mask frame (102) and the mask screen (104) made of a metallic material, and a metal coating (125) disposed on exposed surfaces of one or both of the mask frame (102) and the mask screen (104).
First claim
Opening claim text (preview).
We claim: 1. A mask assembly, comprising: a mask frame and a mask screen coupled to a first side of the mask frame, both of the mask frame and the mask screen made of a metallic material containing iron; and a fluorine plasma resistant metal coating disposed on all exposed surfaces of the mask screen, wherein the mask frame comprises one or more indexing features, and each of the indexing features include a blind hole positioned on a second side of the mask frame opposite to the first side on which the mask screen is coupled. 2. The mask assembly of claim 1 , wherein the metallic material comprise a nickel:iron alloy. 3. The mask assembly of claim 2 , wherein the metal coating comprises a nickel material. 4. The mask assembly of claim 2 , wherein the metal coating comprises a metal selected from platinum-group elements. 5. The mask assembly of claim 2 , wherein the metal coating is selected from the group consisting of a nickel alloy, ruthenium, rhodium, palladium and gold. 6. The mask assembly of claim 1 , wherein the metal coating comprises a thickness of about 1 micron to about 35 microns. 7. The mask assembly of claim 1 , wherein the metallic material comprises a metal having a low coefficient of thermal expansion. 8. The mask assembly of claim 7 , wherein the metal coating comprises a nickel material. 9. The mask assembly of claim 7 , wherein the metal coating comprises a metal selected from platinum-group elements. 10. The mask assembly of claim 7 , wherein the metal having a low coefficient of thermal expansion has a coefficient of thermal expansion less than or equal to 15 microns/meter/degrees Celsius. 11. The mask assembly of claim 10 , wherein the metal having a low coefficient of thermal expansion has a coefficient of thermal expansion less than or equal to 14 microns/meter/degrees Celsius. 12. The mask assembly of claim 11 , wherein the metal having a low coefficient of thermal expansion has a coefficient of thermal expansion less than or equal to 13 microns/meter/degrees Celsius. 13. The mask assembly of claim 12 , wherein the metal coating comprises a thickness of about 1 micron to about 35 microns.
Assignees
Inventors
Classifications
Cleaning of reactor or parts inside the reactor by using reactive gases · CPC title
- C23C16/042Primary
using masks · CPC title
Electricity · mapped topic
Electricity · mapped topic
Encapsulations · CPC title
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Frequently asked questions
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- What does patent US11566322B2 cover?
- A mask assembly (100) includes a mask frame (102) and a mask screen (104), both of the mask frame (102) and the mask screen (104) made of a metallic material, and a metal coating (125) disposed on exposed surfaces of one or both of the mask frame (102) and the mask screen (104).
- Who is the assignee on this patent?
- Applied Materials Inc
- What technology area does this patent fall under?
- Primary CPC classification C23C16/042. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Jan 31 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).