In-situ deposition process

Patent metadata

Field	Value
Publication number	US-11521849-B2
Application number	US-201916391219-A
Country	US
Kind code	B2
Filing date	Apr 22, 2019
Priority date	Jul 20, 2018
Publication date	Dec 6, 2022
Grant date	Dec 6, 2022

Abstract

Embodiments of the present disclosure provide methods and apparatus for forming a desired material layer on a substrate between, during, prior to or after a patterning process. In one embodiment, a method for forming a material layer on a substrate includes pulsing a first gas precursor onto a surface of a substrate, attaching a first element from the first gas precursor onto the surface of the substrate, maintaining a substrate temperature less than about 110 degrees Celsius, pulsing a second gas precursor onto the surface of the substrate, and attaching a second element from the second gas precursor to the first element on the surface of the substrate.

First claim

We claim:

1. A method for forming a material layer on a substrate, comprising:
(a) pulsing a first gas precursor onto a surface of the substrate;
(b) attaching a first element from the first gas precursor onto the surface of the substrate wherein the surface of the substrate already contained the first element prior to pulsing the first gas precursor;
(c) supplying a purge gas between pulsing of the first and a second gas precursor;
(d) pulsing the second gas precursor onto the surface of the substrate and striking a plasma with a RF source power of between about 100 watts and about 2500 watts;
(e) attaching a second element from the second gas precursor to the first element on the surface of the substrate;
(f) selectively forming the material layer on a surface of a structure on the substrate; and
(g) maintaining the substrate at a temperature less than about 110 degrees Celsius throughout a-f.

2. The method of claim 1 , wherein pulsing the first gas precursor further comprises:
applying a RF source power while supplying the first gas precursor.

3. The method of claim 1 , wherein the substrate is placed in an etching processing chamber.

4. The method of claim 1 , wherein the first gas precursor is pulsed to the surface of the substrate without applying a RF source or bias power.

5. The method of claim 4 , wherein the temperature is maintained between about −20 degrees Celsius and about 50 degrees Celsius while pulsing the first gas precursor without applying the RF bias power.

6. The method of claim 1 , wherein the second gas precursor is pulsed to the surface of the substrate by cycling the RF bias power on and off.

7. The method of claim 1 , wherein pulsing the second gas precursor further comprises:
applying a RF source power and a RF bias power while supplying the second gas precursor.

8. The method of claim 1 , wherein the first gas precursor comprises a silicon containing gas.

9. The method of claim 8 , wherein the silicon containing gas is SiCl 4 .

10. The method of claim 1 , wherein the second gas precursor comprises a nitrogen or oxygen containing gas.

11. The method of claim 8 , wherein the second gas precursor is N 2 or O 2 .

12. The method of claim 1 , further comprising:
selectively forming a first material layer on a top surface of a structure on the substrate while forming a second material layer on a top surface of the substrate.

13. A method for forming a material layer on a substrate comprising:
(a) pulsing a first gas precursor comprising a first element to a substrate disposed in an etching processing chamber, wherein the substrate already contained the first element prior to pulsing the first gas precursor;
(b) supplying a purge gas between pulsing of the first and a second gas precursor;
(c) pulsing the second gas precursor comprising a second element and striking a plasma with a RF source power of between about 100 watts and about 2500 watts; and
wherein the second element from the second gas precursor attaches to the first element on the surface of the substrate disposed in the etching processing chamber;
forming the material layer on a surface of the substrate in the etching processing chamber, wherein the material layer comprises the first and the second elements; and
maintaining the substrate at a temperature less than about 110 degrees Celsius throughout a-c.

14. The method of claim 13 , wherein the first gas precursor is pulsed into the etching processing chamber without applying a RF source or bias power in the etching processing chamber.

15. The method of claim 13 , wherein the second gas precursor is pulsed into the etching processing chamber by cycling the RF bias power on and off in the etching processing chamber.

16. A method for forming a material layer on a substrate comprising:
sequentially pulsing a first and a second gas precursor to a surface of the substrate disposed in an etching process chamber wherein a purge gas is supplied between pulsing of the first and the second gas precursor while maintaining the substrate at a temperature of less than about 110 degrees Celsius, striking a plasma with a RF source power of between about 100 watts and about 2500 watts while maintaining the substrate at the temperature of less than about 110 degrees Celsius; and
forming a first layer with the first precursor gas on a first location of the substrate and a second layer with the second precursor gas on a second location of the substrate while maintaining the substrate at the temperature of less than about 110 degrees Celsius.

Assignees

• Applied Materials Inc

Inventors

• Park Sang Wook
• Srinivasan Sunil
• Dhindsa Rajinder
• KIM Jonathan Sungehul
• Yu Lin
• Yao Zhonghua
• Luere Olivier

Classifications

• H10P76/405

  characterised by their composition, e.g. multilayer masks · CPC title

• H10P14/69433

  the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz · CPC title

• H10P14/69215

  the material being a silicon oxide, e.g. SiO2 · CPC title

• H10P14/6336

  in the presence of a plasma [PECVD] · CPC title

• H10P14/6339 Primary

  deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD · CPC title