Vapor deposition mask substrate, vapor deposition mask substrate manufacturing method, vapor deposition mask manufacturing method, and display device manufacturing method

Patent metadata

Field	Value
Publication number	US-11499235-B2
Application number	US-202016887656-A
Country	US
Kind code	B2
Filing date	May 29, 2020
Priority date	Oct 13, 2017
Publication date	Nov 15, 2022
Grant date	Nov 15, 2022

Abstract

A metal sheet has a longitudinal direction and a width direction. The metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another. Each of the shapes is an undulated shape including protrusions and depressions repeating in the width direction of the metal sheet. A length in the width direction of a surface of the metal sheet is a surface distance. A minimum value of surface distances at different positions in the longitudinal direction of the metal sheet is a minimum surface distance. A ratio of a difference between a surface distance and the minimum surface distance to the minimum surface distance is an elongation difference ratio in the width direction. A maximum value of elongation difference ratios is less than or equal to 2×10−5.

First claim

The invention claimed is:

1. A vapor deposition mask substrate, comprising:
a metal sheet that has a shape of a strip and is configured to be etched to include a plurality of holes and used to manufacture a vapor deposition mask, wherein
the metal sheet has a longitudinal direction and a width direction,
the metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another,
each of the shapes comprises an undulated shape including protrusions and depressions repeating in the width direction of the metal sheet,
a length in the width direction of a surface of the metal sheet is a surface distance,
a minimum value of surface distances at different positions in the longitudinal direction of the metal sheet is a minimum surface distance,
a ratio of a difference between a surface distance and the minimum surface distance to the minimum surface distance is an elongation difference ratio in the width direction,
a maximum value of elongation difference ratios is less than or equal to 2×10 −5 , and
a thickness of the vapor deposition mask substrate is between 10 μm and 50 μm inclusive.

2. The vapor deposition mask substrate according to claim 1 , wherein the metal sheet is made of nickel or a nickel-iron alloy.

3. A method for manufacturing a vapor deposition mask substrate according to claim 1 , which comprises the metal sheet that has the shape of the strip and is configured to be etched to include the plurality of holes and used to manufacture the vapor deposition mask, the method comprising:
rolling a base material, and
obtaining the metal sheet by chemically or electrically polishing the rolled base material, wherein
the metal sheet has the longitudinal direction and the width direction,
the metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another,
each of the shapes comprises the undulated shape including protrusions and depressions repeating in the width direction of the metal sheet,
the length in the width direction of the surface of the metal sheet is the surface distance,
the minimum value of surface distances at different positions in the longitudinal direction of the metal sheet is the minimum surface distance,
the ratio of a difference between the surface distance and the minimum surface distance to the minimum surface distance is the elongation difference ratio in the width direction,
the maximum value of elongation difference ratios is less than or equal to 2×10 −5 , and
the thickness of the vapor deposition mask substrate is between 10 μm and 50 μm inclusive.

4. A method for manufacturing a vapor deposition mask substrate according to claim 1 , which comprises the metal sheet that has the shape of the strip and is configured to be etched to include the plurality of holes and used to manufacture the vapor deposition mask, the method comprising:
obtaining the metal sheet by conducting at least electrolysis, wherein
the metal sheet has the longitudinal direction and the width direction,
the metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another,
each of the shapes comprises the undulated shape including protrusions and depressions repeating in the width direction of the metal sheet,
the length in the width direction of the surface of the metal sheet is the surface distance,
the minimum value of surface distances at different positions in the longitudinal direction of the metal sheet is the minimum surface distance,
the ratio of a difference between the surface distance and the minimum surface distance to the minimum surface distance is the elongation difference ratio in the width direction,
the maximum value of elongation difference ratios is less than or equal to 2×10 −5 , and
the thickness of the vapor deposition mask substrate is between 10 μm and 50 μm inclusive.

5. The method according to claim 4 , further comprising chemically or electrically polishing the metal sheet after the electrolysis.

Assignees

• Toppan Printing Co Ltd

Inventors

• Shinno Mikio

Classifications

• C23C14/24

  Vacuum evaporation · CPC title

• C23C14/042 Primary

  using masks · CPC title

• C21D8/02

  during manufacturing of plates or strips (C21D8/12 takes precedence) · CPC title

• C23C16/56

  After-treatment · CPC title

• C23F1/02 Primary

  Local etching · CPC title