Electrodeposited copper foil and copper clad laminate

Patent metadata

Field	Value
Publication number	US-11492718-B1
Application number	US-202217583236-A
Country	US
Kind code	B1
Filing date	Jan 25, 2022
Priority date	Jun 16, 2021
Publication date	Nov 8, 2022
Grant date	Nov 8, 2022

Abstract

An electrodeposited copper foil includes a bulk copper foil. When a weight of the electrodeposited copper foil is increased to 105.0 wt % during a thermogravimetric analysis (TGA) performed on the electrodeposited copper foil at a heating rate of 5° C./min and an air flow rate of 95 mL/min, a heating temperature of the TGA is defined as T 105.0 wt % and in a range of 550° C. to 750° C.

First claim

What is claimed is:

1. An electrodeposited copper foil, comprising a bulk copper foil, wherein while a weight of the electrodeposited copper foil is increased to 105.0 wt % during a thermogravimetric analysis (TGA) performed on the electrodeposited copper foil at a heating rate of 5° C./min and an air flow rate of 95 mL/min, a heating temperature of the TGA is defined as T 105.0 wt % and in a range of 550° C. to 750° C.

2. The electrodeposited copper foil of claim 1 , wherein T 105.0 wt % is in a range of 600° C. to 750° C.

3. The electrodeposited copper foil of claim 1 , wherein while the weight of the electrodeposited copper foil is increased to 100.1 wt % during the TGA, the heating temperature of the TGA is defined as T 100.1 wt % and in a range of 300° C. to 400° C.

4. The electrodeposited copper foil of claim 3 , wherein T 100.1 wt % is in a range of 330° C. to 400° C.

5. The electrodeposited copper foil of claim 3 , wherein the electrodeposited copper foil has a onset temperature (T onset ) during the TGA, wherein T onset is greater than T 100.1 wt % , and T onset is smaller than T 105.0 wt % .

6. The electrodeposited copper foil of claim 5 , wherein T onset is in a range of 400° C. to 600° C.

7. The electrodeposited copper foil of claim 1 , wherein the electrodeposited copper foil has an inflection temperature (T IF ) during the TGA, wherein T IF is in a range of 750° C. to 1000° C.

8. The electrodeposited copper foil of claim 1 , further comprising a first surface treatment layer comprising nickel, wherein the product of a specific surface area (μm 2 /μm 2 ) of the outer surface of the first surface treatment layer and a nickel content (μg/dm 2 ) of the first surface treatment layer is in a range of 10 μg/dm 2 to 100 μg/dm 2 .

9. The electrodeposited copper foil of claim 8 , wherein the product of the specific surface area (μm 2 /μm 2 ) of the outer surface of the first surface treatment layer and the nickel content (μg/dm 2 ) of the first surface treatment layer is in a range of 10 μg/dm 2 to 60 μg/dm 2 .

10. The electrodeposited copper foil of claim 1 , further comprising a first surface treatment layer and a second surface treatment layer, wherein the first surface treatment layer is disposed on a first side of the electrodeposited copper foil, and the second surface treatment layer is disposed on a second side of the electrodeposited copper foil opposite to the first side of the electrodeposited copper foil, wherein the first surface treatment layer and the second surface treatment layer each comprises at least one sub-layer respectively, and the at least one sub-layer is selected from the group consisting of a barrier layer and a antirust layer.

11. The electrodeposited copper foil of claim 10 , wherein the barrier layer comprises at least one metal, and the metal is selected from the group consisting of nickel, zinc, chromium, cobalt, molybdenum, iron, tin, vanadium, tungsten and titanium.

12. The electrodeposited copper foil of claim 10 , wherein the first surface treatment layer further comprises at least one another sub-layer, and the at least one another sub-layer is selected from the group consisting of a roughening layer and a coupling layer.

13. A copper-clad laminate, comprising:
a board; and
the electrodeposited copper foil of claim 1 , wherein the electrodeposited copper foil is disposed on the board.

Assignees

• Chang Chun Petrochemical Co Ltd

Inventors

• Lai Yao-Sheng
• Chou Jui-Chang

Classifications

• B32B15/01 Primary

  all layers being exclusively metallic {(making layered metal workpieces by pressure cladding B23K20/22; making coatings with a metallic material characterised by its composition C23C30/00)} · CPC title

• C25D1/04 Primary

  Wires; Strips; Foils · CPC title

• H05K3/14

  using spraying techniques to apply the conductive material {, e.g. vapour evaporation} · CPC title

• C25D5/12

  at least one layer being of nickel or chromium · CPC title

• B32B2457/08

  PCBs, i.e. printed circuit boards · CPC title