Apparatus including light source supplying light to wafer and window protector receiving a portion of chemical liquid

Patent metadata

Field	Value
Publication number	US-11482410-B2
Application number	US-202117398219-A
Country	US
Kind code	B2
Filing date	Aug 10, 2021
Priority date	Jan 15, 2021
Publication date	Oct 25, 2022
Grant date	Oct 25, 2022

Abstract

A wafer-cleaning apparatus includes an inner pin that supports a wafer. The wafer-cleaning apparatus further includes a nozzle disposed above the inner pin, a light source disposed under the inner pin, a window disposed between the light source and the wafer, and a window protector disposed between the wafer and the window. The nozzle supplies a chemical liquid to the wafer and the inner pin distributes a portion of the chemical liquid on an upper surface of the wafer by rotating the wafer. The window protector receives a portion of the chemical liquid that flows out of the wafer and the light source supplies the light to the wafer through the window protector and the window.

First claim

What is claimed is:

1. An apparatus, comprising:
an inner pin, wherein the inner pin supports a wafer;
a nozzle disposed above the inner pin and the wafer, wherein the nozzle supplies a chemical liquid to the wafer and wherein the inner pin distributes a portion of the chemical liquid on an upper surface of the wafer by rotating the wafer;
a bowl;
a light source disposed under the inner pin;
a window disposed between the light source and the wafer; and
a window protector disposed between the wafer and the window, and comprising:
a tank configured to store the portion of chemical liquid received by the window protector; and
a drain disposed on an edge of the tank to discharge an excess of the chemical liquid overflowing the tank into the bowl,

wherein the window protector receives a portion of the chemical liquid that flows out of the wafer and wherein the light source supplies light to the wafer through the window protector and the window.

2. The apparatus of claim 1 , further comprising:
an outer pin disposed on an edge of the wafer, wherein the outer pin supports the wafer.

3. The apparatus of claim 1 , wherein a hydrophobic film coats a surface of the drain.

4. The apparatus of claim 1 , further comprising a heat source, and wherein the heat source heats the drain.

5. The apparatus of claim 1 , wherein the drain includes a plurality of holes.

6. The apparatus of claim 1 , further comprising a support pin disposed on a reflector and supporting the window protector, and wherein at least one of the inner pin or the support pin discharges the excess of the chemical liquid from the drain by at least one of vibrating the drain or rotating the drain.

7. The apparatus of claim 1 , wherein the tank includes a hole in an upper portion of the tank,
wherein the hole penetrates an inner surface and an outer surface of the tank,
wherein the drain is a pipe that contacts the hole, and
wherein the drain discharges the excess of the chemical liquid to outside of the wafer-cleaning apparatus.

8. The apparatus of claim 7 , wherein the drain comprises a compressor configured to suction chemical liquid disposed in the hole.

9. The apparatus of claim 1 , wherein the window protector has a convex shape that curves toward the wafer.

10. An apparatus, comprising:
an inner pin, wherein the inner pin supports a wafer;
a nozzle disposed above the inner pin and the wafer, wherein the nozzle supplies a chemical liquid to the wafer and wherein the inner pin distributes a portion of the chemical liquid on an upper surface of the wafer by rotating the wafer;
an outer pin disposed under the nozzle and on an edge of the wafer, wherein the outer pin supports the wafer;
a bowl, wherein the bowl at least partially surrounds the outer pin and blocks outflow of the chemical liquid to outside of the wafer-cleaning apparatus;
a light source disposed under the inner pin;
a window disposed between the light source and the wafer;
a reflector connecting the light source and an edge of the window;
a window protector disposed between the wafer and the window, wherein the window protector receives a portion of the chemical liquid that flows out of the wafer and wherein the light source supplies light to the wafer through the window and the window protector; and
a support pin disposed between the window and the window protector,
wherein the support pin supports the window protector, and
wherein the window protector comprises:
a tank configured to store the portion of the chemical liquid that is received by the window protector; and
a drain disposed on an edge of the tank to discharge an excess of the chemical liquid overflowing the tank into the bowl.

11. The apparatus of claim 10 , wherein either a hydrophobic film coats a surface of the drain or the drain includes a plurality of holes, and
wherein at least one of the inner pin or the support pin discharges the excess of the chemical liquid from the drain by at least one of vibrating the drain or rotating the drain.

12. An apparatus, comprising:
an inner pin, wherein the inner pin supports a wafer;
a nozzle disposed above the inner pin and the wafer, wherein the nozzle supplies a chemical liquid to the wafer and wherein the inner pin distributes a portion of the chemical liquid on an upper surface of the wafer by rotating the wafer;
a light source disposed under the inner pin;
a window disposed between the light source and the wafer;
a window protector disposed between the wafer and the window, and
at least one support pin disposed between and connecting the window and the window protector and supporting the window protector,
wherein the window protector receives a portion of the chemical liquid that flows out of the wafer and wherein the light source supplies light to the wafer through the window protector and the window.

13. The apparatus of claim 12 , wherein:
the at least one support pin is disposed on the window.

14. The apparatus of claim 12 , further comprising:
a reflector connecting the light source and an edge of the window,
wherein the at least one support pin is disposed on the reflector.

15. The apparatus of claim 12 , further comprising:
a plurality of support pins including the at least one support pin, wherein the plurality of support pins is arranged in a circular shape.

16. The apparatus of claim 15 , wherein:
six support pins of the plurality of support pins are spaced apart from each other by about 60 degrees, eight support pins of the plurality of support pins are spaced apart from each other by about 45 degrees, or twelve support pins of the plurality of support pins are spaced apart from each other by about 30 degrees.

17. The apparatus of claim 12 , wherein:
the window protector includes a drain.

18. The apparatus of claim 17 , wherein:
at least one of the inner pin and the at least one support pin is configured to discharge the chemical liquid from the drain by vibrating the drain.

19. The apparatus of claim 17 , wherein:
at least one of the inner pin and the at least one support pin is configured to discharge the chemical liquid from the drain by rotating the drain.

20. The apparatus of claim 17 , further comprising:
a hydrophobic film covering the drain.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Jang Hunjae
• Shin Seungmin
• Lee Kuntack
• Kim Seungho
• Kim Younghoo
• Kim Taehong
• Park Sunghyun

Classifications

• H10P70/20 Primary

  Cleaning during device manufacture · CPC title

• H10P72/7614

  characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0436

  mainly by radiation · CPC title