Variable height slanted grating method

US11480724B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11480724-B2
Application numberUS-201917257767-A
CountryUS
Kind codeB2
Filing dateJul 1, 2019
Priority dateJul 19, 2018
Publication dateOct 25, 2022
Grant dateOct 25, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An apparatus with a grating structure and a method for forming the same are disclosed. The grating structure includes forming a recess in a grating layer. A plurality of channels is formed in the grating layer to define slanted grating structures therein. The recess and the slanted grating structures are formed using a selective etch process.

First claim

Opening claim text (preview).

What is claimed is: 1. A structure for use in a waveguide, comprising: a substrate having a grating layer thereon, wherein a recessed structure is formed in the grating layer, the recessed structure comprising: a first end; a second end; and a depth, wherein the depth changes from the first end to the second end; and a plurality of channels formed in the grating layer below the recessed structure, each channel partially defining a portion of a plurality of grating structures, wherein: bottom ends of the plurality of channels are coplanar; top surfaces of the plurality of grating structures are coplanar and partially define the changing depth of the recessed structure; and a depth of the plurality of grating structures changes from the first end to the second end defined by the recessed structure. 2. The structure of claim 1 , wherein the depth of the plurality of grating structures changes linearly from the first end to the second end. 3. The structure of claim 1 , wherein each grating structure has a depth between about 5 nm and about 700 nm. 4. The structure of claim 1 , wherein each grating structure is slanted at an angle between about 0 degrees and about 70 degrees. 5. The structure of claim 1 , wherein the grating layer is formed from an optically transparent material having a refractive index of about 1.3 or higher. 6. A structure for use in a waveguide, comprising: a substrate having a grating layer thereon; a recess formed in the grating layer, wherein the recess has a depth that changes a first direction, a second direction, and a third direction to define a three dimensional shape; and a plurality of channels formed in the grating layer below the recess, each channel partially defining a portion of a plurality of grating structures, wherein bottom ends of the plurality of channels are coplanar, and wherein a depth of the plurality of grating structures changes in the first direction, the second direction, and the third direction as defined by the recess. 7. The structure of claim 6 , wherein the recess has a saddle-point shape. 8. The structure of claim 6 , wherein the recess has a positive curvature. 9. The structure of claim 6 , wherein the recess has a negative curvature. 10. The structure of claim 6 , wherein the grating layer is formed from an optically transparent material having a refractive index of about 1.3 or higher. 11. The structure of claim 6 , wherein each grating structure has a depth between about 5 nm and about 700 nm. 12. The structure of claim 6 , wherein each grating structure is slanted at an angle between about 0 degrees and about 70 degrees. 13. A structure for use in a waveguide, comprising: a substrate having a grating layer thereon, wherein a recessed structure is formed in the grating layer, the recessed structure comprising: a first end; a second end; and a depth, wherein the depth of the recessed structure changes from the first end to the second end; and a plurality of channels formed in the grating layer below the recessed structure, each channel partially defining a portion of a plurality of grating structures, wherein bottom ends of the plurality of channels are coplanar, and wherein a depth of the plurality of grating structures changes non-linearly from the first end to the second end as defined by the recessed structure. 14. The structure of claim 13 , wherein the depth of the plurality of grating structures oscillates from the first end to the second end. 15. The structure of claim 13 , wherein the depth of the recess changes in the first direction and the second direction to define a curved shape. 16. The structure of claim 13 , wherein each grating structure has a depth between about 5 nm and about 700 nm. 17. The structure of claim 13 , wherein each grating structure is slanted at an angle between about 0 degrees and about 70 degrees. 18. The structure of claim 13 , wherein the grating layer is formed from an optically transparent material having a refractive index of about 1.3 or higher.

Assignees

Inventors

Classifications

  • G02B5/1857Primary

    using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams · CPC title

  • G02B6/0045Primary

    by shaping at least a portion of the light guide · CPC title

  • Linear indentations or grooves, e.g. arc-shaped grooves or meandering grooves, extending over the full length or width of the light guide · CPC title

  • Grooves, prisms, gratings, scattering particles or rough surfaces · CPC title

  • characterised by optical features · CPC title

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What does patent US11480724B2 cover?
An apparatus with a grating structure and a method for forming the same are disclosed. The grating structure includes forming a recess in a grating layer. A plurality of channels is formed in the grating layer to define slanted grating structures therein. The recess and the slanted grating structures are formed using a selective etch process.
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification G02B5/1857. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Oct 25 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).