Acid generator, chemically amplified resist composition, and patterning process
US-9223205-B2 · Dec 29, 2015 · US
US11465402B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11465402-B2 |
| Application number | US-202016858474-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 24, 2020 |
| Priority date | Jun 2, 2015 |
| Publication date | Oct 11, 2022 |
| Grant date | Oct 11, 2022 |
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A photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and a process of making the photosensitive element are disclosed. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features, and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.
Opening claim text (preview).
We claim: 1. A printing form precursor comprising: a photopolymerizable layer comprising a first binder, a monomer, and a photoinitiator; an infrared ablation layer that is ablatable by infrared radiation and opaque to non-infrared actinic radiation, the infrared ablation layer comprising: (i) at least one infrared absorbing material; (ii) a radiation opaque material, wherein (i) and (ii) can be the same or different; and (iii) at least one second binder; a coversheet; and a pattern layer that is disposed between the infrared ablation layer and the coversheet, and comprises a plurality of features in which each feature has an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation; wherein the infrared ablation layer is for forming an in-situ mask by infrared ablation during the conversion of the printing form precursor to a printing form. 2. The printing form precursor of claim 1 wherein the pattern layer is printed onto a surface of the coversheet, and the infrared ablation layer is formed by coating over the printed pattern layer to form an assembly. 3. The printing form precursor of claim 2 wherein the assembly is ablated by exposure to infrared radiation, and is applied by lamination to a surface of the photopolymerizable layer that is opposite a support.
Forme preparation · CPC title
Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing · CPC title
Masking pattern being obtained by thermal means, e.g. laser ablation · CPC title
Sympathetic, colour changing or similar inks · CPC title
Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title
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