Synthesizing pet tracers using [f-18]sulfonyl fluoride as a source of [f-18]fluoride
US-2017197912-A1 · Jul 13, 2017 · US
Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method
US9152045B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9152045-B2 |
| Application number | US-201414300546-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 10, 2014 |
| Priority date | Sep 8, 2011 |
| Publication date | Oct 6, 2015 |
| Grant date | Oct 6, 2015 |
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Abstract
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According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.
First claim
Opening claim text (preview).
The invention claimed is: 1. A fluorine-containing sulfonate resin comprising a repeating unit of the following general formula (3): where A each independently represent a hydrogen atom, a fluorine atom or a trifluoromethyl group; n represents an integer of 1 to 10; W represents a divalent linking group, selected from the group consisting of substituted or unsubstituted m…
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Physics · mapped topic
Chemistry & Metallurgy · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US9152045B2 cover?
- According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incor…
- Who is the assignee on this patent?
- Central Glass Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification C07C303/22. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Oct 06 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).