Plasma processing method

Patent metadata

Field	Value
Publication number	US-11450512-B2
Application number	US-201816754402-A
Country	US
Kind code	B2
Filing date	Sep 26, 2018
Priority date	Oct 10, 2017
Publication date	Sep 20, 2022
Grant date	Sep 20, 2022

Abstract

A plasma processing method according to an embodiment is performed in a state in which a substrate is placed on a support stage in an internal space of a chamber body. In the plasma processing method, a plasma treatment is performed on the substrate. Subsequently, a phase of a voltage of a lower electrode is relatively adjusted with respect to a phase of a voltage of an upper electrode by a phase adjustment circuit, such that a thickness of a sheath between the support stage and plasma without extinguishing the plasma generated in order to perform the plasma treatment. Thereafter, in a state in which supply of a high-frequency power is stopped, gases and particles in the internal space of the chamber body are discharged using an exhaust device.

First claim

What is claimed is:

1. A plasma processing method performed in a plasma processing apparatus,
wherein the plasma processing apparatus comprises:
a chamber body;
a gas supply configured to supply a gas to an internal space provided in the chamber body;
a support stage including a lower electrode and being provided in the internal space, the support stage being configured to support a substrate placed on the support stage;
an upper electrode provided above the support stage;
a high-frequency power supply configured to supply a high-frequency power so as to generate plasma in the internal space;
a phase adjustment circuit configured to relatively adjust a phase of a voltage of the lower electrode with respect to a phase of a voltage of the upper electrode; and
an exhaust device provided so as to be in communication with the internal space,

wherein the plasma processing method is performed in a state in which the substrate is placed on the support stage,
wherein the plasma processing method comprises:
a process of performing a plasma treatment on the substrate, in which the gas is supplied from the gas supply to the internal space, and the high-frequency power is supplied from the high-frequency power supply so as to excite the gas to generate plasma, such that the plasma treatment is performed;
a process of relatively adjusting the phase of the voltage of the lower electrode with respect to the phase of the voltage of the upper electrode by the phase adjustment circuit, such that a thickness of a sheath between the support stage and the plasma is increased without extinguishing the plasma generated in the process of performing the plasma treatment; and
a process of discharging gases and particles in the internal space using the exhaust device, after the process of adjusting the phase is performed and in a state in which supply of the high-frequency power is stopped,

wherein, in the process of adjusting the phase, the phase of the voltage of the lower electrode is relatively adjusted with respect to the phase of the voltage of the upper electrode by the phase adjustment circuit, such that the sheath has a thickness of 1.246 times or more of a thickness of the sheath during the process of performing the plasma treatment and before the process of adjusting the phase.

2. The plasma processing apparatus of claim 1 , wherein the upper electrode includes a first portion extending above the support stage and a second portion extending above a space between the support stage and a sidewall of the chamber body, and
wherein the second portion protrudes downward with respect to the first portion.

Assignees

• Tokyo Electron Ltd

Inventors

• Iwashita Shinya
• Kikuchi Takamichi
• Noro Naotaka
• Hasegawa Toshio
• Moriya Tsuyoshi

Classifications

• H10P50/242

  of Group IV materials · CPC title

• H10P14/60

  of insulating materials · CPC title

• H01J37/3244 Primary

  Gas supply means · CPC title

• H01J37/32174

  Circuits specially adapted for controlling the RF discharge · CPC title

• H01J37/32165 Primary

  Plural frequencies · CPC title