Inductive plasma source with metallic shower head using b-field concentrator

Patent metadata

Field	Value
Publication number	US-11450509-B2
Application number	US-202016735494-A
Country	US
Kind code	B2
Filing date	Jan 6, 2020
Priority date	May 14, 2010
Publication date	Sep 20, 2022
Grant date	Sep 20, 2022

Abstract

A method and apparatus for plasma processing of substrates is provided. A processing chamber has a substrate support and a lid assembly facing the substrate support. The lid assembly has a plasma source that comprises a coil disposed within a conductive plate, which may comprise nested conductive rings. The coil is substantially coplanar with the conductive plate, and insulated therefrom by an insulator that fits within a channel formed in the conductive plate, or nests within the conductive rings. A field concentrator is provided around the coil, and insulated therefrom by isolators. The plasma source is supported from a conductive support plate. A gas distributor supplies gas to the chamber through a central opening of the support plate and plasma source from a conduit disposed through the conductive plate.

First claim

The invention claimed is:

1. A lid assembly for a plasma chamber, comprising:
a support plate comprising a metal and is conductive;
a gas conduit disposed through a central portion of the support plate;
a showerhead coupled to the gas conduit;
a plurality of holes formed through the showerhead, the plurality of holes in fluid communication with the gas conduit;
a first conductive ring disposed radially outward of the gas conduit, wherein the first conductive ring comprises a plurality of first openings;
a second conductive ring disposed radially outward of the first conductive ring, wherein the second conductive ring comprises a plurality of second openings, and wherein the support plate is in contact with the first conductive ring and the second conductive ring;
a first channel formed between the gas conduit and the first conductive ring;
a second channel formed between the first conductive ring and the second conductive ring;
an annular coil disposed in the first channel; and
a plenum formed through the support plate adjacent to the first conductive ring and the second conductive ring, the plenum in fluid communication with the plurality of first openings and the plurality of second openings.

2. The lid assembly of claim 1 , wherein the first channel is concentrically disposed with the second conductive ring.

3. The lid assembly of claim 2 , wherein the support plate is electrically coupled to the first conductive ring and the second conductive ring.

4. The lid assembly of claim 1 , wherein:
the support plate is electrically coupled to the first conductive ring and the second conductive ring;
the annular coil is electrically insulated from the support plate, the first conductive ring, and the second conductive ring; and
the annular coil is substantially coplanar with the first conductive ring and the second conductive ring.

5. The lid assembly of claim 1 , further comprising:
an isolator disposed in the first channel, the isolator having a recess into which the annular coil fits; and
an insulating liner at least partially disposed in the first channel.

6. The lid assembly of claim 5 , wherein the first conductive ring and the insulating liner form a flat surface.

7. The lid assembly of claim 5 , wherein the annular coil is substantially coplanar with the first conductive ring and the second conductive ring.

8. The lid assembly of claim 6 , wherein the annular coil is a toroidal tube.

9. The lid assembly of claim 1 , further comprising a field concentrator at least partially disposed in the first channel around the annular coil.

10. A lid assembly for a plasma chamber, comprising:
a support plate comprising a metal and is conductive;
a showerhead positioned concentrically with the support plate;
a first channel formed in the support plate, the first channel disposed radially outward from the showerhead;
a second channel formed in the support plate, the second channel disposed radially outward from the first channel;
a first conductive loop disposed in the first channel of the support plate;
a second conductive loop disposed in the second channel of the support plate;
a first insulating liner disposed in the first channel, the first insulating liner at least partially disposed around the first conductive loop;
a second insulating liner disposed in the second channel, the second insulating liner at least partially disposed around the second conductive loop;
a first field concentrator disposed in the first insulating liner at least partially disposed around the first conductive loop;
a second field concentrator disposed in the second insulating liner at least partially disposed around the second conductive loop; and
a plenum formed through the support plate radially outward of the showerhead to provide a process gas to a bottom of the support plate between the first channel and the second channel and radially outward of the second channel.

11. The lid assembly of claim 10 , wherein each of the first conductive loop and the second conductive loop is annular.

12. The lid assembly of claim 11 , wherein each of the first conductive loop and the second conductive loop comprises a plurality of annular coils, and wherein an isolator is disposed around each of the annular coils in each of the first conductive loop and the second conductive loop.

13. The lid assembly of claim 12 , wherein each of the annular coils is a toroidal tube.

14. The lid assembly of claim 10 , further comprising a separate source of RF power coupled to the first conductive loop and the second conductive loop.

15. The lid assembly of claim 10 , wherein the first insulating liner is in contact with the support plate.

16. The lid assembly of claim 15 , wherein the support plate at least partially defines a plurality of capture spaces, and wherein each of the first insulating liner and the second insulating liner has shoulder portions secured within the capture spaces.

17. A lid assembly for a plasma chamber, comprising:
a support plate electrode comprising a metal and is conductive;
a gas conduit disposed through a central portion of the support plate electrode, the gas conduit coupled to a showerhead;
a first conductive ring in contact with the support plate electrode;
a first plurality of openings formed in the first conductive ring;
a second conductive ring in contact with the support plate electrode;
a second plurality of openings formed in the second conductive ring;
a channel formed between the first conductive ring and the second conductive ring, the support plate electrode disposed adjacent to the channel;
a plenum formed through the support plate electrode and disposed adjacent to the first conductive ring and the second conductive ring, the plenum in fluid communication with the first plurality of openings and the second plurality of openings; and
an annular coil disposed in the channel and disposed at least partially in the support plate electrode, wherein the channel electrically insulates the annular coil from the first conductive ring and the second conductive ring.

18. The lid assembly of claim 17 , comprising:
an isolator disposed in the channel and comprising a dielectric, the isolator having a recess into which the annular coil fits;
a field concentrator disposed in the channel around the isolator and the annular coil, wherein the isolator is disposed at least partially between the annular coil and the field concentrator; and
a thermal control conduit disposed in the support plate electrode, wherein the thermal control conduit is disposed proximate the field concentrator so as to provide thermal control of the field concentrator.

19. The lid assembly of claim 17 , wherein the channel comprises an insulating liner, and wherein the insulating liner and the first conductive ring form a flat surface.

20. The lid assembly of claim 17 , further comprising a plurality of holes formed through the showerhead, the plurality of holes in fluid communication with the gas conduit.

Assignees

• Applied Materials Inc

Inventors

• Lai Canfeng
• Tobin Jeffrey
• Porshnev Peter I
• Marin Jose Antonio

Classifications

• C23C16/509

  using internal electrodes · CPC title

• H01J37/32532

  Electrodes · CPC title

• H01J37/3211 Primary

  Antennas, e.g. particular shapes of coils · CPC title

• H01J37/32541

  Shape · CPC title

• C23C16/45565

  Shower nozzles · CPC title