Refractory metal plates

US11443929B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11443929-B2
Application numberUS-202117155254-A
CountryUS
Kind codeB2
Filing dateJan 22, 2021
Priority dateAug 6, 2007
Publication dateSep 13, 2022
Grant dateSep 13, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A refractory metal plate is provided. The plate has a center, a thickness, an edge, a top surface and a bottom surface, and has a crystallographic texture (as characterized by through thickness gradient, banding severity; and variation across the plate, for each of the texture components 100//ND and 111//ND, which is substantially uniform throughout the plate.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of forming a refractory metal plate, the method comprising: (A) providing a workpiece having a size suitable for a target plate, the workpiece comprising a refractory metal; (B) asymmetrically rolling the workpiece one or more times at an angle of incline between 2° and 20° relative to horizontal, thereby forming a rolled plate; and (C) annealing the rolled plate to achieve substantially full recrystallization. 2. The method of claim 1 , wherein providing the workpiece comprises separating the workpiece from an ingot. 3. The method of claim 2 , wherein the ingot is an electron-beam-melted ingot. 4. The method of claim 1 , wherein providing the workpiece comprises separating the workpiece from a powder-metallurgy billet. 5. The method of claim 4 , further comprising providing the powder-metallurgy billet by a process comprising: (a) cold isostatically pressing a refractory metal powder to a density of 60%-90% to form a preform; (b) hot isostatically pressing the preform to a density of approximately 100% to form a billet; and (c) annealing the billet. 6. The method of claim 1 , wherein the angle of incline is between 3° and 7°. 7. The method of claim 1 , wherein the workpiece is asymmetrically rolled a plurality of times during step (B). 8. The method of claim 7 , wherein the workpiece is rotated at a predetermined angle about a vertical axis between rolling passes. 9. The method of claim 7 , wherein the workpiece is flipped between rolling passes. 10. The method of claim 1 , further comprising, after step (C), bonding the plate to a backing plate. 11. The method of claim 1 , wherein after step (C): the plate has a crystallographic texture as characterized by through thickness gradient, banding severity, and variation across the plate for at least one of the texture components 100//ND or 111//ND, using electron back-scatter diffraction with a 15 μm step in both the horizontal and vertical directions for each measurement; an average through-thickness gradient is less than or equal to 6% per mm for 111//ND; and a maximum through-thickness gradient is less than or equal to 13% per mm for 111//ND. 12. The method of claim 1 , wherein after step (C): the plate has a crystallographic texture as characterized by through thickness gradient banding severity, and variation across the plate for at least one of the texture components 100//ND or 111//ND, using electron back-scatter diffraction with a 15 μm step in both the horizontal and vertical directions for each measurement; and an average banding severity is less than or equal to 6% per mm for 111//ND. 13. The method of claim 1 , wherein, after step (C): the plate has a crystallographic texture as characterized by through thickness gradient, banding severity, and variation across the plate for at least one of the texture components 100//ND or 111//ND, using electron back-scatter diffraction with a 15 μm step in both the horizontal and vertical directions for each measurement; and a maximum banding severity is less than or equal to 8% per mm for 111//ND. 14. The method of claim 1 , further comprising, after step (C): providing a substrate; and sputtering the plate to form a film on the substrate, the film comprising the refractory metal. 15. The method of claim 1 , wherein the refractory metal comprises tantalum. 16. The method of claim 1 , further comprising annealing the workpiece before step (B). 17. The method of claim 1 , further comprising applying a lubricant to top and bottom surfaces of the workpiece before asymmetrically rolling the workpiece.

Assignees

Inventors

Classifications

  • by using pressure rollers · CPC title

  • asymmetric rolling · CPC title

  • B21B1/22Primary

    for rolling {plates, strips,} bands or sheets of indefinite length (B21B1/42 takes precedence) · CPC title

  • Lifting or lowering work for conveying purposes, e.g. tilting tables arranged immediately in front of or behind the pass (turn-over or like manipulating means as such B21B39/20) · CPC title

  • High-melting or refractory metals or alloys based thereon · CPC title

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What does patent US11443929B2 cover?
A refractory metal plate is provided. The plate has a center, a thickness, an edge, a top surface and a bottom surface, and has a crystallographic texture (as characterized by through thickness gradient, banding severity; and variation across the plate, for each of the texture components 100//ND and 111//ND, which is substantially uniform throughout the plate.
Who is the assignee on this patent?
Starck H C Inc, Materion Newton Inc
What technology area does this patent fall under?
Primary CPC classification B21B1/22. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 13 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).