Refractory metal plates

Patent metadata

Field	Value
Publication number	US-9767999-B2
Application number	US-201514751224-A
Country	US
Kind code	B2
Filing date	Jun 26, 2015
Priority date	Aug 6, 2007
Publication date	Sep 19, 2017
Grant date	Sep 19, 2017

Abstract

A refractory metal plate is provided. The plate has a center, a thickness, an edge, a top surface and a bottom surface, and has a crystallographic texture (as characterized by through thickness gradient, banding severity; and variation across the plate, for each of the texture components 100//ND and 111//ND, which is substantially uniform throughout the plate.

First claim

What is claimed is:

1. A refractory metal plate having a center, a thickness, an edge, a top surface and a bottom surface, the refractory metal plate having a crystallographic texture as characterized by through thickness gradient, banding severity; and variation across the plate, for each of the texture components 100//ND and 111//ND using electron back-scatter diffraction with a 15 μm step in both the horizontal and vertical directions for each measurement, wherein the average through-thickness gradient is less than or equal to 3% per mm for 100//ND and 111//ND.

2. The refractory metal plate of claim 1 , wherein the metal plate is at least 99.95% pure refractory metal.

3. The refractory metal plate of claim 2 , wherein the metal plate has a grain size that is less than 60 μm.

4. The refractory metal plate of claim 3 , wherein the metal plate is at least 99.995% pure refractory metal.

5. The refractory metal plate of claim 4 , wherein the refractory metal is tantalum.

6. The refractory metal plate of claim 4 , wherein the refractory metal is niobium.

7. The refractory metal plate of claim 1 , wherein the metal plate is manufactured by ingot metallurgy and the metal plate is a sputtering target.

8. The refractory metal plate of claim 1 , wherein the metal plate is manufactured by powder metallurgy and the metal plate is a sputtering target.

9. The refractory metal plate of claim 8 , wherein the metal plate is manufactured using a process including rolling the plate asymmetrically, wherein the asymmetric rolling is carried out on an inclined plane having an angle of incline between 2 and 20 degrees.

10. The refractory metal plate of claim 8 , wherein the metal plate has a texture as characterized by through-thickness gradient, where the average through-thickness gradient for the texture components 100//ND and 111//ND is less than or equal to 2% per mm.

11. The refractory metal plate of claim 8 , wherein the metal plate has an average banding severity of 6% or less for 100//ND and 111//ND.

12. The refractory metal plate of claim 11 , wherein the metal plate has an average banding severity of 5% or less for 100//ND and 111//ND.

13. The refractory metal plate of claim 12 , wherein the metal plate has an average variation across the plate of less than or equal to 4%.

14. The refractory metal plate of claim 1 , wherein the texture is determined from grains maps with grains separately identified for 100 and 111 within 15° of the normal direction.

15. A refractory metal plate having a center, a thickness, an edge, a top surface and a bottom surface, the refractory metal plate having a crystallographic texture as characterized by
through thickness gradient;
banding severity; and
variation across the plate,
for the texture components 100//ND and 111//ND using electron back-scatter diffraction with a 15 μm step in both the horizontal and vertical directions for each measurement,
wherein the average banding severity is less than or equal to 6% for 100//ND and 111//ND;

wherein the refractory metal plate is manufactured by ingot metallurgy.

16. The refractory metal plate of claim 15 , wherein the metal plate is at least 99.95% pure refractory metal, the metal plate has a grain size that is less than 60 μm, and the metal plate is a sputtering target.

17. The refractory metal plate of claim 16 , wherein the refractory metal is tantalum or niobium, the metal plate is a sputtering target, and the metal plate has a purity of at least 99.995% refractory metal.

18. A refractory metal plate having a center, a thickness, an edge, a top surface and a bottom surface, the refractory metal plate having a crystallographic texture as characterized by
banding severity for the texture components 100//ND and 111//ND using electron back-scatter diffraction with a 15 μm step in both the horizontal and vertical directions for each measurement,
wherein the average banding severity is less than or equal to 5% for 100//ND and 111//ND.

19. The refractory metal plate of claim 18 , wherein the metal plate is manufactured by powder metallurgy and the average through-thickness gradient is less than 2%/mm for 100//ND and 111//ND.

20. The refractory metal plate of claim 19 , wherein the refractory metal is tantalum or niobium, the metal plate is a sputtering target, and the metal plate has a purity of at least 99.995% refractory metal.

Assignees

• Starck H C Inc

Inventors

• Jepson Peter R
• Bozkaya Dincer

Classifications

• B22F3/18

  by using pressure rollers · CPC title

• B21B1/227

  Surface roughening or texturing · CPC title

• B21B39/04

  Lifting or lowering work for conveying purposes, e.g. tilting tables arranged immediately in front of or behind the pass (turn-over or like manipulating means as such B21B39/20) · CPC title

• C23C14/3414

  Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

• H01J37/3426 Primary

  Material · CPC title