Refractory metal plates with improved uniformity of texture

US10236164B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10236164-B2
Application numberUS-201715682605-A
CountryUS
Kind codeB2
Filing dateAug 22, 2017
Priority dateAug 6, 2007
Publication dateMar 19, 2019
Grant dateMar 19, 2019

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  1. Title

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A refractory metal plate is provided. The plate has a center, a thickness, an edge, a top surface and a bottom surface, and has a crystallographic texture (as characterized by through thickness gradient, banding severity; and variation across the plate, for each of the texture components 100//ND and 111//ND, which is substantially uniform throughout the plate.

First claim

Opening claim text (preview).

What is claimed is: 1. A refractory metal plate having a center, a thickness, an edge, a top surface, and a bottom surface, the refractory metal plate having a crystallographic texture as characterized by through thickness gradient, banding severity, and variation across the plate for at least one of the texture components 100//ND or 111//ND, using electron back-scatter diffraction with a 15 μm step in both the horizontal and vertical directions for each measurement, wherein: an average through-thickness gradient is less than or equal to 6% per mm for 111//ND, and a maximum through-thickness gradient is less than or equal to 13% per mm for 111//ND. 2. The refractory metal plate of claim 1 , wherein the maximum through-thickness gradient is less than or equal to 9% per mm for 111//ND. 3. The refractory metal plate of claim 1 , wherein the maximum through-thickness gradient is less than or equal to 8% per mm for 111//ND. 4. The refractory metal plate of claim 1 , wherein the average through-thickness gradient is less than or equal to 4% per mm for 111//ND. 5. The refractory metal plate of claim 1 , wherein the average through-thickness gradient is less than or equal to 3% per mm for 111//ND. 6. The refractory metal plate of claim 1 , wherein the refractory metal plate has a grain size that is less than 60 μm. 7. The refractory metal plate of claim 1 , wherein the metal plate is at least 99.95% pure refractory metal. 8. The refractory metal plate of claim 1 , wherein the refractory metal comprises tantalum. 9. The refractory metal plate of claim 1 , wherein the refractory metal comprises niobium. 10. A refractory metal plate having a center, a thickness, an edge, a top surface, and a bottom surface, the refractory metal plate having a crystallographic texture as characterized by through thickness gradient, banding severity, and variation across the plate for at least one of the texture components 100//ND or 111//ND, using electron back-scatter diffraction with a 15 μm step in both the horizontal and vertical directions for each measurement, wherein an average banding severity is less than or equal to 6% per mm for 111//ND. 11. The refractory metal plate of claim 10 , wherein the average banding severity is less than or equal to 5% per mm for 111//ND. 12. The refractory metal plate of claim 10 , wherein the average banding severity is less than or equal to 4% per mm for 111//ND. 13. The refractory metal plate of claim 10 , wherein the refractory metal plate has a grain size that is less than 60 μm. 14. The refractory metal plate of claim 10 , wherein the metal plate is at least 99.95% pure refractory metal. 15. The refractory metal plate of claim 10 , wherein the refractory metal comprises tantalum. 16. The refractory metal plate of claim 10 , wherein the refractory metal comprises niobium. 17. A refractory metal plate having a center, a thickness, an edge, a top surface, and a bottom surface, the refractory metal plate having a crystallographic texture as characterized by through thickness gradient, banding severity, and variation across the plate for at least one of the texture components 100//ND or 111//ND, using electron back-scatter diffraction with a 15 μm step in both the horizontal and vertical directions for each measurement, wherein a maximum banding severity is less than or equal to 8% per mm for 111//ND. 18. The refractory metal plate of claim 17 , wherein the average banding severity is less than or equal to 7% per mm for 111//ND. 19. The refractory metal plate of claim 17 , wherein the average banding severity is less than or equal to 5% per mm for 111//ND. 20. The refractory metal plate of claim 17 , wherein the refractory metal plate has a grain size that is less than 60 μm. 21. The refractory metal plate of claim 17 , wherein the metal plate is at least 99.95% pure refractory metal. 22. The refractory metal plate of claim 17 , wherein the refractory metal comprises tantalum. 23. The refractory metal plate of claim 17 , wherein the refractory metal comprises niobium.

Assignees

Inventors

Classifications

  • having metal particles · CPC title

  • Top and bottom roll have different diameters; Asymmetrical rolling · CPC title

  • Lifting or lowering work for conveying purposes, e.g. tilting tables arranged immediately in front of or behind the pass (turn-over or like manipulating means as such B21B39/20) · CPC title

  • All metal or with adjacent metals · CPC title

  • by using pressure rollers · CPC title

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What does patent US10236164B2 cover?
A refractory metal plate is provided. The plate has a center, a thickness, an edge, a top surface and a bottom surface, and has a crystallographic texture (as characterized by through thickness gradient, banding severity; and variation across the plate, for each of the texture components 100//ND and 111//ND, which is substantially uniform throughout the plate.
Who is the assignee on this patent?
Starck H C Inc
What technology area does this patent fall under?
Primary CPC classification H01J37/3426. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 19 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).