Lifting device

Patent metadata

Field	Value
Publication number	US-11424151-B2
Application number	US-201916680791-A
Country	US
Kind code	B2
Filing date	Nov 12, 2019
Priority date	Oct 31, 2019
Publication date	Aug 23, 2022
Grant date	Aug 23, 2022

Abstract

A lifting device includes a base body. The base body includes a supporting surface and defines a cavity. The cavity extends through the supporting surface. The lifting device further includes a magnetic bar, a spring, and a coil in the cavity. The spring includes a first end fixed to an end of the magnetic bar away from the supporting surface and a second end fixed on a wall of the cavity. The coil surrounds the magnetic bar. When the coil is applied with a voltage to generate an electromagnetic induction, the magnetic bar is driven to move out of the cavity from the supporting surface or move to compress the spring.

First claim

What is claimed is:

1. A lifting device, comprising:
a base body, the base body comprising a supporting surface and defining a cavity, the cavity extending through the supporting surface;
a magnetic bar in the cavity;
a spring in the cavity, the spring comprising a first end fixed to an end of the magnetic bar away from the supporting surface and a second end fixed on a wall of the cavity, the first end being opposite to the second end; and
a coil in the cavity and surrounding the magnetic bar;
wherein when the coil is applied with a voltage to generate an electromagnetic induction, the magnetic bar is driven to move out of the cavity from the supporting surface or move to compress the spring; and
wherein the lifting device is configured for loading a product to be plasma etched.

2. The lifting device of claim 1 , wherein when the coil is applied with a positive voltage, the magnetic bar moves to stretch the spring; and
when the coil is applied with a negative voltage, the magnetic bar moves to compress the spring.

3. The lifting device of claim 1 , wherein when the coil is applied with a negative voltage, the magnetic bar moves to stretch the spring; and
when the coil is applied with a positive voltage, the magnetic bar moves to compress the spring.

4. The lifting device of claim 1 , wherein the base body is made of a metal or an alloy.

5. The lifting device of claim 4 , further comprising an electro-static chuck on the supporting surface;
wherein the electro-static chuck is made of ceramic, and the electro-static chuck is configured for supporting the product.

6. The lifting device of claim 5 , wherein the electro-static chuck defines a through hole; and
the through hole aligns with the cavity.

7. The lifting device of claim 4 , further comprising a spacer in the cavity;
wherein the spacer is made of ceramic and configured to prevent plasma from contacting any wall of the cavity.

8. The lifting device of claim 7 , wherein the spacer has a hollow cylindrical shape; and
the spacer surrounds the magnetic bar and the spring.

9. The lifting device of claim 8 , wherein the spacer defines a channel;
the magnetic bar and the spring are in the channel;
when the coil is applied with a voltage, the magnetic bar moves along the channel;
the second end of the spring is fixed to the spacer.

10. The lifting device of claim 9 , wherein the coil surrounds the spacer.

11. The lifting device of claim 1 , further comprising an insulation layer completely covering the magnetic bar, the insulation layer is configured to prevent the plasma from contacting the magnetic bar.

12. The lifting device of claim 1 , wherein the spring is made of insulators and the spring is insulated from plasma.

13. A lifting device, comprising:
a base body, the base body comprising a supporting surface and defining a cavity, the cavity extending through the supporting surface, and the base body is made of a metal or an alloy;
a magnetic bar movably arranged in the cavity between a retracted position and a exerted positon;
a spring in the cavity, the spring comprising a first end fixed to an end of the magnetic bar away from the supporting surface and a second end fixed on a wall of the cavity, the first end being opposite to the second end, the spring being configured to apply a force on the magnetic bar;
a coil in the cavity and surrounding the magnetic bar; and
an electro-static chuck on the supporting surface configured for supporting the product, wherein the electro-static chuck is made of ceramic, and the electro-static chuck defines a through hole aligning with the cavity,
wherein when the coil is applied with a voltage, an electromagnetic induction is generated to drive the magnetic bar to move;
wherein when the magnetic bar is in the retracted position, the magnetic bar is completely in the cavity and the spring is compressed; when the magnetic bar is in the exerted position, at least a portion of the magnetic bar is outside the cavity and the spring is stretched;
wherein the lifting device is configured for loading a product to be plasma etched.

14. The lifting device of claim 13 , wherein when the coil is applied with a positive voltage, the magnetic bar moves to stretch the spring;
when the coil is applied with a negative voltage, the magnetic bar moves to compress the spring.

15. The lifting device of claim 13 , wherein when the coil is applied with a negative voltage, the magnetic bar moves to stretch the spring;
when the coil is applied with a positive voltage, the magnetic bar moves to compress the spring.

16. The lifting device of claim 13 , further comprising a spacer in the cavity;
wherein the spacer is made of ceramic and configured to prevent the plasma from contacting any wall of the cavity.

17. The lifting device of claim 16 , wherein the spacer is a hollow cylindrical shape;
the spacer surrounds the magnetic bar and the spring; and
the coil surrounds the spacer.

Assignees

• Xia Tai Xin Semiconductor Qing Dao Ltd

Inventors

• Jeong Woohyun

Classifications

• H10P50/242

  of Group IV materials · CPC title

• H10P72/722 Primary

  Details of electrostatic chucks · CPC title

• H10P72/7612 Primary

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/7618 Primary

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H01F7/0221

  Mounting means for PM, supporting, coating, encapsulating PM · CPC title