Compensation of creep effects in an imaging device

Patent metadata

Field	Value
Publication number	US-11415895-B2
Application number	US-202117354160-A
Country	US
Kind code	B2
Filing date	Jun 22, 2021
Priority date	Jun 29, 2020
Publication date	Aug 16, 2022
Grant date	Aug 16, 2022

Abstract

An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports at least one optical element of the imaging device via an active relative situation control device of a control device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another. Each supporting spring device defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device of the control device. The measuring device is connected to the relative situation control device. The measuring device outputs to the relative situation control device measurement information representative for the position and/or the orientation of the at least one optical element in relation to a reference in at least one degree of freedom in space.

First claim

What is claimed is:

1. An arrangement, comprising:
an optical element;
a control device comprising an active relative situation control device;
a supporting device;
a first supporting structure;
a second supporting structure; and
a measuring device,
wherein:
the first supporting structure supports the optical element via the active relative situation control device;
the first supporting structure supports the second supporting structure via the supporting device;
the second supporting structure supports the measuring device via the control device;
the measuring device is configured to output measurement information to the active relative situation control device;
the measurement information is representative of a position and/or an orientation of the optical element in relation to a reference in at least one degree of freedom in space;
in a first mode, the active relative situation control device is configured to adjust, based on the measurement information, a first target state of the position and/or the orientation of the optical element in relation to the reference in the at least one degree of freedom;
the control device is configured to detect relative situation change information representative of a change in a static relative situation between the first and second supporting structures in at least one degree of freedom;
in a compensation mode, the control device is configured to set, based on the relative situation change information, a second target state of the position and/or the orientation of the optical element in relation to the reference of the active relative situation control device to compensate the change in the static relative situation;
in a second mode, the control device is configured to use the second target state instead of the first target state; and
the arrangement is an arrangement of a microlithographic optical imaging device.

2. The arrangement of claim 1 , wherein:
the active relative situation control device has an initial first state in which the optical element is in the first target state;
in the second mode, the active relative situation control device has a second initial state in which the optical element is at least substantially in the second target state; and
the second initial state at least substantially corresponds to the first initial state.

3. The arrangement of claim 2 , wherein:
the active relative situation control device comprises a deflection detection device configured to detect deflection information representative of a deflection of the optical element from the first initial state in relation to the first supporting structure in at least one degree of freedom; and
the control device is configured to derive the relative situation change information from the deflection information.

4. The arrangement of claim 3 , wherein:
the active relative situation control device comprises a relative situation control actuator to actively adjust the optical element;
the arrangement further comprises a deflection detection device configured to detect adjustment information representative of an adjustment of the relative situation control actuator from the first initial state; and
the control device is configured to derive the relative situation change information from the adjustment information.

5. The arrangement of claim 4 , wherein:
the deflection detection device comprises an adjustment sensor assigned to the relative situation control actuator;
the adjustment sensor is configured to output adjustment sensor information representative of the positioning movement of the relative situation control actuator; and
the control device is configured to derive the adjustment information from the adjustment sensor information.

6. The arrangement of claim 1 , wherein:
the control device is configured to use a state change model of the supporting device to ascertain the relative situation change information; and
the state change model of the supporting device describes a relative situation change behavior.

7. The arrangement of claim 1 , wherein:
the control device comprises an imaging error detection device configured to generate an imaging error information representative of an imaging error of the imaging device; and
the control device is configured to derive the relative situation change information from the imaging error information.

8. The arrangement of claim 1 , wherein:
the control device comprises a relative situation detection device configured to generate relative situation information representative of the relative situation between the first and second supporting structures in at least one degree of freedom; and
the control device is configured to derive the relative situation change information from the relative situation information.

9. The arrangement of claim 1 , wherein at least one of the following holds:
the control device is configured to activate the compensation mode when the change in relative situation represented by the relative situation change information exceeds a limit value; and
the control device is configured to activate the compensation mode based on specifiable events.

10. The arrangement of claim 9 , wherein at least one of the following holds:
the control device has a control bandwidth of 10 Hz to 1000 Hz;
the at least one degree of freedom of the change in relative situation is a rotational degree of freedom, and the limit value is representative of a deviation of the relative situation between the first and second supporting structures from a target by from one μrad to 500 μrad; and
the at least one degree of freedom of the change in relative situation is a translational degree of freedom, and the specifiable limit value is representative of a deviation of the relative situation between the first and second supporting structures from a target by from one μm to 500 μm.

11. The arrangement of claim 1 , further comprising a vibration decoupling device which comprises a plurality of supporting spring devices,
wherein:
the first supporting structure supports the second supporting structure via the plurality of supporting spring devices;
the supporting spring devices act kinematically parallel to one another between the first and second supporting structures;
for each supporting spring device, the supporting spring device defines a supporting force direction along which it exerts a supporting force between the first and second supporting structures;
for each supporting spring device, the supporting spring device defines a supporting length along the supporting force direction of the supporting spring device;
the change in relative situation is caused by a change in length of a supporting spring device along its supporting force direction; and
the change in length of the supporting spring device is due to a creep process of the supporting spring device.

12. An optical imaging device, comprising:
an illumination device comprising a first optical element group; and
a projection device comprising a second optical element group,
wherein:
the illumination device is configured to illuminate an object;
the projection device is configured to project an image of the object onto a substrate; and
at least one member selected from the group consisting of the illumination device and the projection device comprises an arrangement according to claim 1 .

13. A method of using a microlithographic optical imaging device comprising an illumination device and a projection device, the illumination device comprising a first optical element group, and the projection device comprising a second optical element group, the method compris

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Nefzi Marwène
• Zweering Ralf
• Gruner Toralf

Classifications

• G03F7/70525

  Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure · CPC title

• G03F7/70258 Primary

  Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system · CPC title

• G03F7/70033

  by plasma extreme ultraviolet [EUV] sources · CPC title

• G03F7/70825

  Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707) · CPC title