Biphasic plasma microreactor and method of using the same

Patent metadata

Field	Value
Publication number	US-11388808-B2
Application number	US-201916976239-A
Country	US
Kind code	B2
Filing date	Feb 28, 2019
Priority date	Feb 28, 2018
Publication date	Jul 12, 2022
Grant date	Jul 12, 2022

Abstract

The present invention relates to a plasma reactor and more specifically to an plasma microreactor comprising a support, made at least partially of a dielectric material, the support comprising a gas inlet, a liquid inlet, at least a fluid outlet, a liquid microchannel in the support, a gas channel, at least a ground electrode, at least a high voltage electrode, separated from the gas channel by the dielectric material of the support, wherein said ground electrode and said high voltage electrode are arranged on opposite sides of the gas channel so as to be able to create an electric field inside the gas channel, wherein the liquid microchannel and the gas channel are contiguous and at least an opening is arranged between the liquid microchannel and the gas channel so as to form a fluid channel and to cause the liquid flow contact the gas flow and wherein the liquid flow is retained within the liquid microchannel by capillarity action.

First claim

The invention claimed is:

1. A plasma microreactor comprising:
a support, made at least partially of a dielectric material, the support comprising a gas inlet, adapted to be connected to a gas reservoir, a liquid inlet, adapted to be connected to a liquid reservoir and at least a fluid outlet adapted to be connected to a receiver containing gas and/or liquid,
a liquid microchannel in the support adapted to allow a liquid flow from the liquid inlet to the fluid outlet according to a liquid flowing direction,
a gas channel, in the support adapted to allow a gas flow from the gas inlet to the fluid outlet according to a gas flowing direction,
at least a ground electrode,
at least a high voltage electrode, separated from the gas channel by the dielectric material of the support,
wherein said ground electrode and said high voltage electrode are arranged on opposite sides of the gas channel so as to be able to create an electric field inside the gas channel,
wherein the plasma microreactor comprises a contact zone in which the liquid microchannel and the gas channel are contiguous, so that the liquid flowing direction and the gas flowing direction are parallel in the contact zone, at least one opening being arranged between the liquid microchannel and the gas channel in the contact zone so as to form a fluid channel and to cause the liquid flow to contact the gas flow and wherein the liquid flow is retained within the liquid microchannel by capillarity action.

2. The plasma microreactor of claim 1 , wherein the at least one opening is arranged between the liquid microchannel and the gas channel on at least 80% of a length of the fluid channel.

3. The plasma microreactor of claim 1 , wherein the at least one opening is partially defined by a convex bended portion of a wall of the fluid channel, the bended portion being arranged between the liquid microchannel and the gas channel and extending continuously along a length of the liquid microchannel and along a length of the gas channel.

4. The plasma microreactor of claim 3 , wherein the convex bended portion has a radius of curvature being less than 20 μm.

5. The plasma microreactor of claim 1 , comprising a high voltage source electrically connected to the ground electrode(s) and to the high voltage electrode(s).

6. The plasma microreactor of claim 1 , wherein a length of the liquid microchannel and a length of the gas channel are over 2 cm.

7. The plasma microreactor of claim 1 , wherein the support is made of a UV-cured polymer, a poly(tetramethylene succinate), a cyclic olefin copolymer (COC), glass, a ceramic material, or a combination thereof.

8. The plasma microreactor of claim 1 , wherein the fluid channel is arranged following a main plane, the design of the fluid channel allowing to have a surface density of the fluid channel in said plane higher than 0.3 over a square of 20 mm2 or more, said fluid channel being arranged in a serpentine pattern.

9. The plasma microreactor of claim 1 , wherein the liquid microchannel has a smaller height than the gas channel so as to form a step between the liquid microchannel and the gas channel.

10. The plasma microreactor of claim 1 , wherein two liquid microchannels are arranged on opposite sides of the gas channel, so that the fluid channel has a T-shaped section.

11. The plasma microreactor of claim 1 , wherein the support comprises glass or ceramic material or comprises a polymeric layer between two glass layers.

12. The plasma microreactor of claim 1 , wherein the height of the liquid microchannel is more than 1 μm and is less than 200 μm, and/or wherein the height of the gas channel is comprised between the height of the liquid microchannel and 1 mm.

13. A method for generating a plasma in a plasma microreactor, comprising the steps of:
(a) providing a plasma microreactor according to claim 1 ,
(b) providing a liquid flow through the liquid microchannel(s) in a given direction,
(c) providing a gas flow through the gas channel in said direction,
(d) applying a high voltage between the high voltage electrode(s) and the ground electrode(s) so as to generate a plasma in the gas channel.

14. The method of claim 13 , wherein the gas flow presents a gas flow rate through the gas channel, wherein the liquid flow presents a liquid flow rate through the liquid channel, the gas flow rate being higher than the liquid flow rate.

15. The method of claim 13 , wherein the gas flow comprises a gas selected from the group consisting of air, argon, helium, oxygen, hydrogen, nitrogen, water vapor, ammoniac, carbon dioxide, carbon monoxide, volatile hydrocarbons, volatile organic compounds and a mixture thereof and/or wherein the liquid flow comprises a liquid being an organic or aqueous solvent selected from the group consisting of water, an aliphatic hydrocarbon, an aromatic hydrocarbon, an alcohol, an ether, an ester, a ketone, a halogenated solvent, dimethylsulfoxide (DMSO), acetonitrile, dimethylformamide (DMF), an ionic liquid methyl methacrylate (MMA) and phenol; or a mixture thereof.

16. The method of claim 13 , wherein the high voltage is comprised between 250 V and 30 kV and wherein the high voltage is a variable high voltage with a frequency comprised between 100 Hz and 1 MHz or the high voltage is a pulsed voltage with a frequency comprised between 100 Hz and 1 MHz.

17. The method of claim 13 , wherein a compound present in the liquid is submitted to at least a chemical reaction such as cleaving, oxidation, hydrogenation, dehydrogenation, amination or carbonylation.

Assignees

• Paris Sciences Lettres Quartier Latin
• Centre Nat Rech Scient
• Univ Sorbonne
• Ecole Nat Superieure De Chimie De Paris
• Paris Sciences Et Lettres

Inventors

• Wengler Julien
• Ognier Stéphanie
• Al Ayoubi Safwan
• Tatoulian Michael

Classifications

• H01J37/20 Primary

  Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title

• H05H1/2406 Primary

  using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes · CPC title

• H01J37/32449

  Gas control, e.g. control of the gas flow · CPC title

• H05H1/2443

  the plasma fluid flowing through a dielectric tube · CPC title

• B01J2219/0894

  Processes carried out in the presence of a plasma · CPC title